Fundamentals of Block Copolymer Directed Assembly

嵌段共聚物定向组装的基础知识

• 批准号: 0704539
• 负责人: Edward Kramer
• 金额: $ 47.4万
• 依托单位: University of California-Santa Barbara
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2007
• 资助国家: 美国
• 起止时间: 2007-08-01 至 2012-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0704539&HistoricalAwards=false
• 关键词: Fundamentals; Block; Copolymer; Directed; Assembly

TECHNICAL SUMMARY:An experimental program is proposed aimed at discovering both new directed assembly methods and their limitations for achieving good translational and orientational order in 2D arrays of block copolymer domains, methods that could ultimately lead to nanopatterns that could be transferred to underlying substrates. Directed self-assembly techniques are proposed for investigation whereby the edges of regions defined by optical and electron beam lithography serve to register and template the order. Emphasis will be placed on understanding the ordering and disordering processes in melts of both single layer and multilayer films of spherical domain block copolymers and their blends with homopolymers in such regions. State-of-the art scanning force microscopy and grazing incidence small angle X-ray diffraction will be used in a complementary fashion to precisely define the order in these layers. Directed self-assembly is also of interest for cylindrical domain block copolymer films with cylinders parallel to the film surface. Here controlling the equilibrium concentration of dislocations and the thermal unbinding of their component disclinations using nearby channel edges is the primary challenge. These experiments will be supplemented with field theoretic numerical simulations of 2D block copolymer ordering in collaboration with Glenn Fredrickson at UCSB. NON-TECHNICAL SUMMARY:Patterning of regular features on the scale of 10 nanometers can enable applications such as ultrahigh density magnetic storage, ultraregular nanoporous filtration membranes and quantum dot arrays. Such patterning is well beyond what is possible directly using light (optical lithography) but this project aims to explore the possibilities of using optical lithography to create larger scale features that can direct the assembly of highly perfect arrays of much smaller block copolymer domains to create the desired patterns. Understanding the causes of imperfections in such arrays and the overall limits of the method are major goals. Undergraduates will be involved in the research both during the academic year and the summer. The research group will continue to host visiting graduate students from foreign countries for periods up to one year to promote international awareness. Major emphasis will be placed on developing graduate student communication and presentation skills, especially in the context of national and even international meetings. Interactions will be developed with nanotechnology groups at various industrial concerns interested in utilizing the results of this research.

技术概述：提出了一个实验程序，旨在发现新的定向组装方法及其在嵌段共聚物域的二维阵列中实现良好的平移和取向顺序的局限性，这些方法最终可能导致纳米图案可以转移到底层基质上。定向自组装技术被提出用于研究，其中由光学和电子束光刻定义的区域边缘用于登记和模板的顺序。重点将放在理解球面嵌段共聚物单层和多层膜及其在这些区域与均聚物共混物的熔体中的有序和无序过程。最先进的扫描力显微镜和掠入射小角度x射线衍射将以互补的方式使用，以精确地定义这些层中的顺序。定向自组装也对圆柱体平行于膜表面的圆柱域嵌段共聚物膜感兴趣。在这里，主要的挑战是控制位错的平衡浓度，并利用附近的通道边缘热解其组成的偏斜。这些实验将与UCSB的Glenn Fredrickson合作，辅以二维嵌段共聚物排序的场论数值模拟。非技术概述：10纳米尺度上的规则特征图案可以实现超高密度磁存储、超规则纳米孔过滤膜和量子点阵列等应用。这种图案远远超出了直接使用光（光学光刻）的可能性，但该项目旨在探索使用光学光刻来创建更大规模特征的可能性，这些特征可以指导更小的嵌段共聚物域的高度完美阵列的组装，以创建所需的图案。主要目标是了解这种阵列不完美的原因以及该方法的总体限制。本科生将在学年和夏季参与研究。研究小组将继续接待来自外国的访问研究生，为期一年，以提高国际意识。重点将放在培养研究生的沟通和演讲技巧，特别是在国内甚至国际会议的背景下。将与对利用本研究成果感兴趣的不同工业领域的纳米技术小组开展互动。