Collaborative: Mechanisms of resonant IR photodesorption of adsorbates from surfaces

这项合作研究项目涉及明尼苏达大学和范德比尔特大学的一组研究人员。 利用范德比尔特的自由电子激光设备，他们正在系统地探索氢分子从硅和金刚石表面的模式特异性解吸的机制。 分析和表面化学计划的支持使这项合作研究成为可能。 这种解吸现象的机制的理解影响我们的化学反应动力学的基本理解，并可能对硅电子器件的生长和加工的影响。 解吸过程的系统研究，不同的自由电子激光波长，时间参数和表面条件，再加上隧道显微镜检查的表面，被用来整理这种不寻常的机制。

This collaborative research project involves a team of researchers from the University of Minnesota and Vanderbilt University. Using the free electron laser facility at Vanderbilt, they are systematically exploring the mechanism of mode specific desorption of hydrogen molecules from silicon and diamond surfaces. Support from the Analytical and Surface Chemistry Program enables this collaborative research. An understanding of the mechanism of this desorption phenomena impacts our fundamental understanding of chemical reaction dynamics, and may have implications for the growth and processing of silicon electronic devices. A systematic study of the desorption process, varying free electron laser wavelength, temporal parameters, and surface conditions, coupled with tunneling microscopy examination of the surface, is being used to sort out this unusual mechanism.