STTR Phase II: A New Process for Boride Coatings for Manufacturing Applications
STTR Phase II: A New Process for Boride Coatings for Manufacturing Applications
批准号:
0822598
负责人:
Rabi Bhattacharya
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2008
资助国家:
美国
项目状态:
已结题
起止时间:
2008-07-01 至 2011-06-30
中文摘要
这个小型企业技术转让(STTR)二期项目旨在寻求一种用于硼化物涂层的新型低温金属有机化学气相沉积(LT-MOCVD)技术的转让、进一步开发和商业化。该项目将致力于开发具有附着力、微观结构、形貌、成分和硬度特征的涂层。选定的涂层将在实验室测试条件下对各种常见工程基板材料进行摩擦、磨损和耐腐蚀性测试。前驱体制备工艺将按比例放大,沉积将在工业规模的沉积系统中进行。涂层工艺将优化为硬度高、附着力好。优化后的涂层将应用于最终用户设备在生产条件下的组件测试。耐磨损和耐腐蚀涂料由于其高硬度和良好的化学稳定性而具有更广泛的影响/商业潜力,并且在美国的制造业中具有许多应用潜力。该项目开发的硼化物沉积工艺将实现广泛的应用,包括切削工具,压铸模具和镶件,平板玻璃的转移辊,化学工艺部件,武器工业,汽车和航空航天工业。
英文摘要
This Small Business Technology Transfer (STTR) Phase II project is seeking the transfer and further development and commercialization of a new low temperature metal-organic chemical vapor deposition (LT-MOCVD) technology for boride coatings. The project will work to develop coatings for characterizations of adhesion, microstructure, morphology, composition and hardness. Selected coatings will be tested for friction and wear and corrosion resistance under laboratory test conditions on various common engineering substrate materials. The precursor preparation process will be scaled up and deposition will be done in an industrial scale deposition system. The coating process will be optimized for high hardness and good adhesion. Optimized coatings will be applied to components for testing at end users' facilities under production conditions.The broader impact/commercial potential of wear and corrosion resistant coatings are very attractive for their high hardness and good chemical stability, and have potential for many applications in the manufacturing sector in United States. The process developed in this project, of deposition of borides, will enable a wide spectrum of applications including cutting tools, die casting dies and inserts, transfer rolls for flat glass, components for chemical processes, armament industries, automotive and aerospace industries.
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STTR Phase I: A New Process for Boride Coatings for Manufacturing Applications
-
批准号:0637621
-
项目类别:Standard Grant
-
资助金额:$14.99万
-
财政年份:2007
-
负责人:Rabi Bhattacharya
-
依托单位:
SBIR Phase II: Novel Wafer Fabrication Technology for Semiconductor Sensors
-
批准号:0522039
-
项目类别:Standard Grant
-
资助金额:$0.0万
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财政年份:2005
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负责人:Rabi Bhattacharya
-
依托单位:
SBIR Phase I: Novel Wafer Fabrication Technology for Semiconductor Sensors
-
批准号:0339747
-
项目类别:Standard Grant
-
资助金额:$9.99万
-
财政年份:2004
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负责人:Rabi Bhattacharya
-
依托单位:
Modifications of Solid Lubricating Coatings by MeV Ion Beams
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批准号:9200078
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项目类别:Standard Grant
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资助金额:$25.0万
-
财政年份:1993
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负责人:Rabi Bhattacharya
-
依托单位:
Improvement of Strength and Reliability of Structural Ceramics Through Ion Implantations
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批准号:9160355
-
项目类别:Standard Grant
-
资助金额:$4.99万
-
财政年份:1992
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负责人:Rabi Bhattacharya
-
依托单位:
Modifications of Solid Lubricating Coatings by MeV Ion Beams
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批准号:9060513
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项目类别:Standard Grant
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资助金额:$5.0万
-
财政年份:1991
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负责人:Rabi Bhattacharya
-
依托单位:
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