STTR Phase I: A New Process for Boride Coatings for Manufacturing Applications

STTR 第一阶段：用于制造应用的硼化物涂层的新工艺

• 批准号: 0637621
• 负责人: Rabi Bhattacharya
• 金额: $ 14.99万
• 依托单位: UES, Inc.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2007
• 资助国家: 美国
• 起止时间: 2007-01-01 至 2007-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0637621&HistoricalAwards=false
• 关键词: STTR; Phase; New; Process; Boride

This Small Business Technology Transfer (STTR) Phase I project is directed toward development and commercialization of a new low temperature metal-organic chemical vapor deposition technology for boride coatings. Diborides of transition metals are very attractive for their high hardness and good chemical stability, and have potentials for many applications in the manufacturing sector in United States as wear and corrosion resistant coatings. Current technologies of physical and chemical vapor deposition do not provide a viable method of good adherent boride coating at low substrate temperature. University of Illinois at Urbana-Champaign (UIUC) and UES, Inc. will work together to develop single-source precursors for transition metal boride coatings for deposition at low substrate temperatures. The proposed method is cost-effective and environmentally friendly, thus enabling applications in many different industries that include cutting tools, die casting dies and inserts, transfer rolls for flat glass, component for chemical processes, armament industries such as gun tubes, automotive and aerospace.

这个小型企业技术转移（STTR）第一阶段项目旨在开发和商业化一种用于硼化物涂层的新型低温金属有机化学气相沉积技术。过渡金属二硼化物具有很高的硬度和良好的化学稳定性，在美国制造业中作为耐磨损和耐腐蚀涂层具有广泛的应用前景。目前的物理气相沉积技术和化学气相沉积技术还没有提供一种在低基底温度下获得良好附着力的硼化物涂层的可行方法。伊利诺伊大学厄巴纳-香槟分校（UIUC）和UES公司将合作开发用于在低温下沉积过渡金属硼化物涂层的单源前驱体。所提出的方法具有成本效益和环境友好性，因此可以应用于许多不同的行业，包括切削工具，压铸模具和镶件，平板玻璃的转移辊，化学过程的组件，武器工业，如炮管，汽车和航空航天。