Improvement of Strength and Reliability of Structural Ceramics Through Ion Implantations

通过离子注入提高结构陶瓷的强度和可靠性

基本信息

项目摘要

The objective of this program is to achieve strength and reliability improvements in structural ceramics through ion implantation. The approach is to produce precipitable phases by high dose ion implantation and subsequent annealing. The strength increase is expected from the localized volume expansion of the implanted region due to the presence of these precipitates resulting in the generation of compressive surface stresses. If thermodynamically stable precipitates are formed, then a temperature independent increase in strength and reliability is expected. If the precipitate phase is harder than the matrix, a surface hardening should result. In Phase I, it is proposed to co-implant silicon and carbon, and titanium and carbon into silicon nitride to study the formation of silicon carbide and titanium carbide precipitates. Characterization is performed by using transmission electron microscopy. Four-point-bend testing provides strength and reliability data.
该计划的目标是实现实力和 通过离子注入提高结构陶瓷的可靠性 置入 该方法是通过以下步骤产生可沉淀相: 高剂量离子注入和随后退火。 的 局部体积膨胀可使强度增加 由于这些沉淀物的存在, 导致产生压缩表面应力。 如果 形成结晶稳定的沉淀物, 与温度无关强度和可靠性的增加, 预期 如果沉淀相比基体硬, 将导致表面硬化。 在阶段I中,提出共注入硅和碳, 钛和碳转化成氮化硅来研究 形成碳化硅和碳化钛沉淀物。 表征是通过使用透射电子 显微镜 四点弯曲测试提供强度和 可靠性数据

项目成果

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Rabi Bhattacharya其他文献

Rejoinder To: Problems of Ruin and Survival in Economics: Applications of Limit Theorems in Probability
Random iterates of monotone maps
  • DOI:
    10.1007/s10058-008-0064-5
  • 发表时间:
    2008-12-20
  • 期刊:
  • 影响因子:
    0.500
  • 作者:
    Rabi Bhattacharya;Mukul Majumdar
  • 通讯作者:
    Mukul Majumdar
Sustainability in the Stochastic Ramsey Model
  • DOI:
    10.1007/s40953-015-0020-5
  • 发表时间:
    2015-12-10
  • 期刊:
  • 影响因子:
    0.600
  • 作者:
    Rabi Bhattacharya;Hyeonju Kim;Mukul Majumdar
  • 通讯作者:
    Mukul Majumdar

Rabi Bhattacharya的其他文献

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{{ truncateString('Rabi Bhattacharya', 18)}}的其他基金

STTR Phase II: A New Process for Boride Coatings for Manufacturing Applications
STTR 第二阶段:用于制造应用的硼化物涂层的新工艺
  • 批准号:
    0822598
  • 财政年份:
    2008
  • 资助金额:
    $ 4.99万
  • 项目类别:
    Standard Grant
STTR Phase I: A New Process for Boride Coatings for Manufacturing Applications
STTR 第一阶段:用于制造应用的硼化物涂层的新工艺
  • 批准号:
    0637621
  • 财政年份:
    2007
  • 资助金额:
    $ 4.99万
  • 项目类别:
    Standard Grant
SBIR Phase II: Novel Wafer Fabrication Technology for Semiconductor Sensors
SBIR 第二阶段:半导体传感器的新型晶圆制造技术
  • 批准号:
    0522039
  • 财政年份:
    2005
  • 资助金额:
    $ 4.99万
  • 项目类别:
    Standard Grant
SBIR Phase I: Novel Wafer Fabrication Technology for Semiconductor Sensors
SBIR 第一阶段:半导体传感器的新型晶圆制造技术
  • 批准号:
    0339747
  • 财政年份:
    2004
  • 资助金额:
    $ 4.99万
  • 项目类别:
    Standard Grant
Modifications of Solid Lubricating Coatings by MeV Ion Beams
MeV离子束对固体润滑涂层的改性
  • 批准号:
    9200078
  • 财政年份:
    1993
  • 资助金额:
    $ 4.99万
  • 项目类别:
    Standard Grant
Modifications of Solid Lubricating Coatings by MeV Ion Beams
MeV离子束对固体润滑涂层的改性
  • 批准号:
    9060513
  • 财政年份:
    1991
  • 资助金额:
    $ 4.99万
  • 项目类别:
    Standard Grant

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