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Modifications of Solid Lubricating Coatings by MeV Ion Beams

Modifications of Solid Lubricating Coatings by MeV Ion Beams
MeV离子束对固体润滑涂层的改性
批准号:
9060513
负责人:
Rabi Bhattacharya
金额:
$5.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1991
资助国家:
美国
项目状态:
已结题
起止时间:
1991-01-01 至 1991-09-30

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中文摘要
翻译
固体润滑二硫属化物的溅射涂层, 钼模具 受到了相当大的关注, 特别是由于真空和空间应用。 常规 大多数表面上磁控溅射这些材料的薄膜 滑动寿命短。 耐久性的显著增强 这些薄膜的滑动下,可以获得高能量离子 溅射沉积膜的辐照。 的目的 方案将研究和优化滑动增强 蓝宝石、M50钢上溅射二硫属化物涂层的寿命 用高能(MeV)轻、重离子轰击氮化硅 辐射 MeV离子辐照优于keV束 由于目前和潜在使用的薄膜 厚度在微米范围内。 实验计划在 第一阶段的目标是优化条件, 提高钼盘滑动寿命的认识 通过MeV离子辐照在蓝宝石上形成涂层。 两种光(H+, He+)和重离子(Ni+,Ag+),剂量范围为1 × 1015至 本研究使用1x1016 cm_2。 在阶段中获得的见解 我将用于开发第二阶段计划, 进一步优化和潜在的应用。
英文摘要
Sputtered coatings of solid lubricating dichalcogenides such as molybdenum di have received considerable attention, particularly due to vacuum and space applications. Conventional magnetron sputtered films of these materials on most surfaces have short sliding life. A significant enhancement of durability of these films under sliding can be attained by high energy ion irradiation of the sputter deposited films. The objective of the program will be to study and optimize the enhancement of sliding life of sputtered dichalcogenides coatings on sapphire, M50 steel and silicon nitride by high energy (MeV) light and heavy ion irradiations. MeV ion irradiation is preferred over keV beams because of the current and potential use of films with thicknesses in the micron range. The experimental program in Phase I is directed toward optimizing the conditions and gaining understanding of sliding life enhancement of molybdenum dis coating on sapphire by MeV ion irradiations. Both light (H+, He+) and heavy (Ni+, Ag+) ions at doses in the range of 1x1015 to 1x1016 cm_2 are used for this study. The insight gained in Phase I will be used in developing a Phase II program that will address further optimization and potential applications.
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STTR Phase II: A New Process for Boride Coatings for Manufacturing Applications
  • 批准号:
    0822598
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2008
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
STTR Phase I: A New Process for Boride Coatings for Manufacturing Applications
  • 批准号:
    0637621
  • 项目类别:
    Standard Grant
  • 资助金额:
    $14.99万
  • 财政年份:
    2007
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
SBIR Phase II: Novel Wafer Fabrication Technology for Semiconductor Sensors
  • 批准号:
    0522039
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2005
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
SBIR Phase I: Novel Wafer Fabrication Technology for Semiconductor Sensors
  • 批准号:
    0339747
  • 项目类别:
    Standard Grant
  • 资助金额:
    $9.99万
  • 财政年份:
    2004
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
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