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Modifications of Solid Lubricating Coatings by MeV Ion Beams

Modifications of Solid Lubricating Coatings by MeV Ion Beams
MeV离子束对固体润滑涂层的改性
批准号:
9060513
负责人:
Rabi Bhattacharya
金额:
$5.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1991
资助国家:
美国
项目状态:
已结题
起止时间:
1991-01-01 至 1991-09-30

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中文摘要
翻译
固体润滑二硫化物(如二硫化钼)的溅射涂层受到了相当大的关注,特别是由于真空和空间应用。这些材料在大多数表面上的传统磁控溅射膜具有较短的滑动寿命。通过高能离子辐照溅射沉积薄膜,可以显著提高薄膜在滑动下的耐久性。该项目的目的是通过高能(MeV)轻离子和重离子辐照,研究和优化蓝宝石、M50钢和氮化硅上溅射的二硫化物涂层的滑动寿命。MeV离子辐照优于keV光束,因为目前和潜在使用的薄膜厚度在微米范围内。第一阶段的实验计划旨在优化条件并了解MeV离子辐照蓝宝石钼dis涂层的滑动寿命。本研究使用轻离子(H+, He+)和重离子(Ni+, Ag+),剂量范围为1x1015至1x1016 cm_2。在第一阶段中获得的见解将用于开发第二阶段的项目,以进一步优化和潜在的应用。
英文摘要
Sputtered coatings of solid lubricating dichalcogenides such as molybdenum di have received considerable attention, particularly due to vacuum and space applications. Conventional magnetron sputtered films of these materials on most surfaces have short sliding life. A significant enhancement of durability of these films under sliding can be attained by high energy ion irradiation of the sputter deposited films. The objective of the program will be to study and optimize the enhancement of sliding life of sputtered dichalcogenides coatings on sapphire, M50 steel and silicon nitride by high energy (MeV) light and heavy ion irradiations. MeV ion irradiation is preferred over keV beams because of the current and potential use of films with thicknesses in the micron range. The experimental program in Phase I is directed toward optimizing the conditions and gaining understanding of sliding life enhancement of molybdenum dis coating on sapphire by MeV ion irradiations. Both light (H+, He+) and heavy (Ni+, Ag+) ions at doses in the range of 1x1015 to 1x1016 cm_2 are used for this study. The insight gained in Phase I will be used in developing a Phase II program that will address further optimization and potential applications.
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STTR Phase II: A New Process for Boride Coatings for Manufacturing Applications
  • 批准号:
    0822598
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2008
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
STTR Phase I: A New Process for Boride Coatings for Manufacturing Applications
  • 批准号:
    0637621
  • 项目类别:
    Standard Grant
  • 资助金额:
    $14.99万
  • 财政年份:
    2007
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
SBIR Phase II: Novel Wafer Fabrication Technology for Semiconductor Sensors
  • 批准号:
    0522039
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2005
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
SBIR Phase I: Novel Wafer Fabrication Technology for Semiconductor Sensors
  • 批准号:
    0339747
  • 项目类别:
    Standard Grant
  • 资助金额:
    $9.99万
  • 财政年份:
    2004
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
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