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Modifications of Solid Lubricating Coatings by MeV Ion Beams

Modifications of Solid Lubricating Coatings by MeV Ion Beams
MeV离子束对固体润滑涂层的改性
批准号:
9200078
负责人:
Rabi Bhattacharya
金额:
$25.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-09-01 至 1996-02-29

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中文摘要
翻译
MoS_2、TaS_2和WS_2等固体润滑二卤化物的溅射涂层在空间/高真空润滑方面的应用受到了广泛的关注。这些化合物的传统溅射薄膜寿命短,特别是在滑动接触应用中。然而,通过用重的高能离子轰击这些薄膜,可以显著改善这些化合物与表面的附着力。这项研究的目的是研究这些薄膜对蓝宝石、氮化硅、氧化锆等衬底的附着力的改善。和MBA工具钢,这是由ME离子束轰击这些薄膜而产生的。
英文摘要
Sputtered coatings of solid lubricating dichalcogenides such as MoS2 , TaS2, and WS2 have received attention for space/high vacuum lubrication applications. Conventionally sputtered films of these compounds have a short lifetime, particularly for sliding contact applications. However, a significant improvement in the adhesion of these compounds to surfaces can be obtained by the bombardment of these films by heavy, high energy ions. The objective of the proposed research is to study the improvement of adhesion of these films to substrate such as sapphire, silicon nitride, zirconium oxide. and Mba tool steel resulting from the bombardment of these films by ME ion beams.
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STTR Phase II: A New Process for Boride Coatings for Manufacturing Applications
  • 批准号:
    0822598
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2008
  • 负责人:
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  • 依托单位:
STTR Phase I: A New Process for Boride Coatings for Manufacturing Applications
  • 批准号:
    0637621
  • 项目类别:
    Standard Grant
  • 资助金额:
    $14.99万
  • 财政年份:
    2007
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
SBIR Phase II: Novel Wafer Fabrication Technology for Semiconductor Sensors
  • 批准号:
    0522039
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2005
  • 负责人:
    Rabi Bhattacharya
  • 依托单位:
SBIR Phase I: Novel Wafer Fabrication Technology for Semiconductor Sensors
  • 批准号:
    0339747
  • 项目类别:
    Standard Grant
  • 资助金额:
    $9.99万
  • 财政年份:
    2004
  • 负责人:
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  • 依托单位:
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