MRI2009:Acquisition of a Next Generation Electron Beam Lithography System with Molecular Scale Precision for Research and Education

MRI2009：采购具有分子级精度的下一代电子束光刻系统，用于研究和教育

• 批准号: 0922836
• 负责人: Donald Tennant
• 金额: $ 77万
• 依托单位: Cornell University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-09-15 至 2013-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0922836&HistoricalAwards=false
• 关键词: MRI2009; Acquisition; Next; Generation; Electron

The objective of this research is to provide enabling instrumentation for controlled patterning of nanostructures at dimensions comparable to molecular length scales. The approach is to acquire a next generation high voltage electron beam lithography instrument that exceeds the current limits of precision and accuracy.Electron beam lithography equipment employs a digitally controlled beam of electrons to directly shape nanoscale patterns. The new level of speed, placement accuracy, overlay, and stability will allow resolution and control on the sub-10 nm length scale enabling scientific and technological breakthroughs in sectors that include: communications, high density computer storage, health care diagnostic, low cost electronics, and energy research and products. This award will place advanced patterning equipment at the Cornell NanoScale Science and Technology Facility where it will be openly accessed by hundreds of researchers annually. Broader impacts of this award devolve from CNF?s active and committed role in nanotechnology education, mentorship, human resources and economic development. CNF staff conduct over a thousand group training sessions on individual equipment for over 700 users annually. CNF staff teach semi-annual nanotechnology laboratory courses, organize workshops specifically for practitioners of e-beam lithography and will develop an advanced e-beam training module. CNF sponsors and hosts over 20 undergraduate researchers each summer focusing on nanotechnology research. The CNF REU program particularly targets women, underrepresented minorities, and students with little or no prior research experience. In addition, CNF provides significant technology support to small innovative companies with limited laboratory resources, resulting in significant economic development opportunities.

这项研究的目的是提供能够在与分子长度尺度相当的维度上控制纳米结构图案化的仪器。方法是获得超过目前精密度和准确度极限的新一代高压电子束曝光仪。电子束曝光机利用数字控制的电子束直接成形纳米级图案。速度、贴装精度、覆盖和稳定性的新水平将允许在10 nm以下的长度范围内进行分辨率和控制，从而在通信、高密度计算机存储、医疗诊断、低成本电子以及能源研究和产品等领域实现科技突破。该奖项将在康奈尔纳米科学和技术设施中放置先进的图形设备，每年将有数百名研究人员公开访问该设备。这一奖项的广泛影响来自CNF？S在纳米技术教育、导师、人力资源和经济发展方面积极而坚定地发挥作用。CNF员工每年为700多名用户举办一千多次关于个人设备的小组培训。CNF的工作人员每半年教授一次纳米技术实验室课程，专门为电子束光刻从业者组织讲习班，并将开发高级电子束培训模块。CNF每年夏天都会赞助和接待20多名专注于纳米技术研究的本科生研究人员。CNF REU计划特别针对女性、代表性不足的少数族裔以及以前几乎没有研究经验的学生。此外，CNF为实验室资源有限的小型创新公司提供了重要的技术支持，从而带来了重大的经济发展机会。