SNM: Development of Ink-Jet Based Low Cost Roll-to-Roll Nanopatterning (i-R2R Nano) with Demonstration in Thin Film Photovoltaics

SNM：开发基于喷墨的低成本卷对卷纳米图案（i-R2R Nano）并在薄膜光伏中进行演示

• 批准号: 1120823
• 负责人: S. Sreenivasan
• 金额: $ 130万
• 依托单位: University of Texas at Austin
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2011
• 资助国家: 美国
• 起止时间: 2011-09-15 至 2016-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1120823&HistoricalAwards=false
• 关键词: SNM; Development; Ink; Jet; Based

Research Objectives and Approaches: The overall research objective of this Scalable NanoManufacturing (SNM) award is to develop high speed, ink-jet based roll-to-roll nanopatterning (i-R2R Nano) for cost-sensitive applications such as thin film photovoltaics (PVs). The specific objectives include: (i) Investigation of top-down (nanoimprint) and bottom-up (nanoparticle or block co-polymer) R2R nanopatterning; (ii) Development of enabling technologies for high throughput R2R processes (50 ft/min) with a total patterning cost target of $2/m2; and (iii) Optimization of broadband light trapping in nanostructured a-Si PVs on flex substrates using aperiodic plasmonic structures to obtain significantly enhanced efficiencies. Intellectual Merit: The basic scientific contributions will include: (i) Nano-fluidics, material rheology, multi-scale mechanics modeling, and real-time sensing/control for high-speed i-R2R systems and processes (ii) Design of imprint materials, solvent based self-assembly materials, and interfaces for rapid pattern formation in TD and BU processes; and (iii) Novel material integration and device design for optimum light trapping in thin film PVs on flex substrates. Broader Impacts: This interdisciplinary program will create fundamental knowledge in the areas of high-speed R2R nanopatterning with low material usage, and in the design of controlled nano-structures for high efficiency PVs. Thin film PVs is representative of the most demanding nano-scale requirements and cost constraints among the various potential applications of R2R nanopatterning. The outreach activities will promote innovation/entrepreneurship; and synergistic activities at the undergraduate level through the UT-Austin Equal Opportunity in Engineering T-REX program.

研究目标和方法：这个可扩展纳米制造（SNM）奖的总体研究目标是开发高速，基于喷墨的卷对卷纳米图案（i-R2R Nano），用于成本敏感的应用，如薄膜光伏（pv）。具体目标包括：(i)自上而下（纳米压印）和自下而上（纳米颗粒或嵌段共聚物）R2R纳米图案的研究；（ii）开发高通量R2R工艺（50英尺/分钟）的使能技术，总模式成本目标为2美元/平方米；（iii）利用非周期等离子体结构优化柔性衬底上纳米结构a-Si光伏的宽带光捕获，以获得显著提高的效率。智力价值：基础科学贡献将包括：(i)纳米流体学，材料流变学，多尺度力学建模，以及高速i- r2r系统和过程的实时传感/控制；（ii）印迹材料，溶剂基自组装材料的设计，以及TD和BU过程中快速图案形成的界面；（iii）柔性基板上薄膜pv的最佳光捕获新材料集成和器件设计。更广泛的影响：这个跨学科项目将在低材料使用量的高速R2R纳米图案领域创造基础知识，并在设计用于高效率pv的受控纳米结构方面。在R2R纳米图形的各种潜在应用中，薄膜pv是最苛刻的纳米尺度要求和成本限制的代表。外联活动将促进创新/创业；并通过UT-Austin工程机会均等项目在本科阶段开展协同活动。