Fundamentals of plasma-surface interactions in complex materials processing

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As a newly hired professor in the physics department of Université de Montréal, I am planning to develop an ambitious research program on plasma-surface interactions in complex materials processing. The driving motivation of my research is related to the crucial needs for advancing the macro and microscopic level of understanding of physical and chemical phenomena involved in low-temperature plasma processing, as required for optimizing the characteristics of thin films and nanomaterials for a given technological application. A particular emphasis will be put on the growth, functionalization, and nanometer scale etching of amorphous and nanocrystalline semiconducting oxides such as zinc oxide, indium zinc oxide, indium gallium oxide, and indium gallium zinc tin oxide. These materials show promises for a wide variety of advanced electronic, optoelectronic, and photonic devices, including flexible and inexpensive thin film transistors, solar cells, gas and bio-sensors. Studies will be realized through an exhaustive, multi-disciplinary approach by correlating the plasma characteristics obtained using a wide variety of optical, electrical, and wave diagnostics, the properties of processed materials determined by both in-situ and ex-situ analysis, and the characteristics of micro- and nanofabricated devices. The basic knowledge generated from these fundamental studies is expected to play a crucial role in the optimization and development of plasma-based processing tools that will be needed to meet current and future challenges in micro and nanoscale device manufacturing. This program also represents an excellent complement to actual research efforts in Canada, in particular those associated with the implementation of the "Laboratoire en Science et Applications des Plasmas" recently awarded by the CFI and Quebec government. Moreover, since it deals simultaneously with the physics of low-temperature plasmas, the physics and chemistry of surfaces and interfaces, and the design, fabrication, and characterization of advanced micro and nanoscale devices, this program is expected to lead to the training of highly qualified researchers with unique intersciplinary skills that can easily be integrated in various Canadian high-technology sectors.