Emergent Phenomena at Flat Interfaces between Nitrides and Oxides
氮化物和氧化物之间平面界面处的突现现象
基本信息
- 批准号:1508191
- 负责人:
- 金额:$ 46.8万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2015
- 资助国家:美国
- 起止时间:2015-08-01 至 2019-01-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This project is supported by the Electronic and Photonic Materials Program and by the Ceramics Program, both in the Division of Materials Research.Nontechnical Description: The NCSU (North Carolina State University) research team of Maria and Sitar explores the junction of nitride and oxide semiconductors with specific attention to the interfaces that bond them. When correctly prepared, these interfaces can host a high concentration of high-speed electrons that are confined to a two-dimensional layer. This new type of material is designed to have controllable electron density at the interface and opens new possibilities for future electronic devices. The research project involves graduate undergraduate students. The team disseminates the research findings through various educational outreach activities. For example, the annual NCSU Science and Mathematics Interactive Learning Experience (SMILE) camp engages middle-school and advanced fifth grade students to explore the principles of materials science in the PIs' research labs.Technical Description: The Maria and Sitar research team explores semiconductor-grade heteroepitaxial interfaces between complex oxides (e.g., MgO-CaO) and GaN. The properties and performance of these heterostructures are regulated by the electronic structure of the constituent crystals as opposed to unwanted defects, structural imperfections, or undesired chemical interactions. Seamless integration across two classes of materials is expected to create pathways to intimately couple their properties. To accomplish these goals, the team combines two advanced materials synthesis methods: surfactant-assisted film growth and confined epitaxy. Surfactant assisted growth overcomes the challenges of oxide faceting, while confined epitaxy creates step-free surfaces and thus perfectly flat interfaces. Using these approaches, the team is positioned to superimpose high room-temperature carrier mobility in compound semiconductors with nonlinear property responses of electronic oxides. This unique oxide/nitride heterostructure provides access to a new frontier of electronic, magnetic, optical, and interface physics.
非技术性描述:NCSU(北卡罗来纳州州立大学)的Maria和Sitar研究小组探索了氮化物和氧化物半导体的结,特别关注了将它们结合在一起的界面。当正确准备时,这些界面可以容纳高浓度的高速电子,这些电子被限制在二维层中。这种新型材料被设计为在界面处具有可控的电子密度,为未来的电子设备开辟了新的可能性。这个研究项目涉及研究生和本科生。该小组通过各种教育推广活动传播研究结果。例如,一年一度的NCSU科学与数学互动学习体验(SMILE)营吸引中学和高五年级学生在PI研究实验室中探索材料科学原理。技术描述:Maria和Sitar研究团队探索半导体级复杂氧化物之间的异质外延界面(例如,MgO-CaO)和GaN。这些异质结构的性质和性能由组成晶体的电子结构调节,而不是不需要的缺陷,结构缺陷或不需要的化学相互作用。两类材料的无缝集成有望创造出将其特性紧密结合的途径。为了实现这些目标,该团队结合了两种先进的材料合成方法:表面辅助薄膜生长和限制外延。表面活性剂辅助生长克服了氧化物刻面的挑战,而受限外延产生无台阶表面,从而形成完美平坦的界面。使用这些方法,该团队将利用电子氧化物的非线性特性响应在化合物半导体中实现高室温载流子迁移率。这种独特的氧化物/氮化物异质结构提供了进入电子,磁性,光学和界面物理学的新前沿。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Jon-Paul Maria其他文献
Alternative dielectrics to silicon dioxide for memory and logic devices
用于存储和逻辑器件的二氧化硅的替代电介质
- DOI:
10.1038/35023243 - 发表时间:
2000-08-31 - 期刊:
- 影响因子:48.500
- 作者:
Angus I. Kingon;Jon-Paul Maria;S. K. Streiffer - 通讯作者:
S. K. Streiffer
Hydroflux-assisted densification: applying flux crystal growth techniques to cold sintering
- DOI:
10.1007/s10853-020-04926-7 - 发表时间:
2020-06-17 - 期刊:
- 影响因子:3.900
- 作者:
Sarah Lowum;Richard Floyd;Jon-Paul Maria - 通讯作者:
Jon-Paul Maria
Processing-dependent chemical ordering in Cusub3/subAu characterized via non-destructive Bragg coherent diffraction imaging
通过无损布拉格相干衍射成像对 Cusub3/subAu 中与处理相关的化学有序性的表征
- DOI:
10.1016/j.scriptamat.2025.116820 - 发表时间:
2025-10-01 - 期刊:
- 影响因子:5.600
- 作者:
Nathaniel Warren;Chloe Skidmore;Katherine J. Harmon;Wonsuk Cha;Jon-Paul Maria;Stephan O. Hruszkewycz;Darren C. Pagan - 通讯作者:
Darren C. Pagan
Phase-field study of precipitate morphology in epitaxial high-entropy oxide films
外延高熵氧化物薄膜中析出物形态的相场研究
- DOI:
10.1016/j.actamat.2025.120721 - 发表时间:
2025-03-01 - 期刊:
- 影响因子:9.300
- 作者:
Yueze Tan;Jacob T. Sivak;Saeed S.I. Almishal;Jon-Paul Maria;Susan B. Sinnott;Yanzhou Ji;Long-Qing Chen - 通讯作者:
Long-Qing Chen
Alternative dielectrics to silicon dioxide for memory and logic devices
用于存储和逻辑器件的二氧化硅的替代电介质
- DOI:
10.1038/35023243 - 发表时间:
2000-08-31 - 期刊:
- 影响因子:48.500
- 作者:
Angus I. Kingon;Jon-Paul Maria;S. K. Streiffer - 通讯作者:
S. K. Streiffer
Jon-Paul Maria的其他文献
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{{ truncateString('Jon-Paul Maria', 18)}}的其他基金
Exotic Quantum Responses in Complex Oxide Thin Films
复合氧化物薄膜中的奇异量子响应
- 批准号:
1905861 - 财政年份:2019
- 资助金额:
$ 46.8万 - 项目类别:
Continuing Grant
DMREF: Collaborative Research: Materials design of correlated metals as novel transparent conductors
DMREF:协作研究:相关金属作为新型透明导体的材料设计
- 批准号:
1629477 - 财政年份:2016
- 资助金额:
$ 46.8万 - 项目类别:
Standard Grant
MRI: Acquisition of an extreme-resolution low-voltage scanning electron microscope
MRI:购买高分辨率低压扫描电子显微镜
- 批准号:
1337694 - 财政年份:2013
- 资助金额:
$ 46.8万 - 项目类别:
Standard Grant
Materials World Network: Science of Polar Homo- and Heterointerfaces
材料世界网络:极性同质和异质界面科学
- 批准号:
1108071 - 财政年份:2011
- 资助金额:
$ 46.8万 - 项目类别:
Continuing Grant
Student and Young Faculty Travel to the 2007 International Conference on Electroceramics; Arusha, Tanzania
学生和青年教师前往参加 2007 年国际电陶瓷会议;
- 批准号:
0733159 - 财政年份:2007
- 资助金额:
$ 46.8万 - 项目类别:
Standard Grant
CAREER: Structure Property Relationships in BiFeO3: A Defect Chemistry Approach
职业:BiFeO3 中的结构性质关系:缺陷化学方法
- 批准号:
0547134 - 财政年份:2006
- 资助金额:
$ 46.8万 - 项目类别:
Continuing Grant
MRI: Acquisition of Major Instrumentation: Deep Reactive Ion Etching
MRI:购置主要仪器:深度反应离子蚀刻
- 批准号:
0421088 - 财政年份:2004
- 资助金额:
$ 46.8万 - 项目类别:
Standard Grant
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