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74th Device Research Conference 2016, June 19 to 22, 2016, University of Delaware, Newark,DE

74th Device Research Conference 2016, June 19 to 22, 2016, University of Delaware, Newark,DE
2016 年第 74 届设备研究会议,2016 年 6 月 19 日至 22 日,特拉华大学,纽瓦克,特拉华州
批准号:
1632758
负责人:
Aaron Franklin
金额:
$1.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2016
资助国家:
美国
项目状态:
已结题
起止时间:
2016-06-15 至 2017-05-31

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中文摘要
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英文摘要
The 74th Device Research Conference (DRC) has a University setting and will take place at the University of Delaware, Newark, DE from June 19 to 22, 2016. Topics to be addressed include biological devices, emerging Electronic device materials (graphene, MoS2), devices for energy scavenging power, memory, nanoscale applications, including Terahertz and spin-based approaches. The Conference seeks financial support to underrepresented minorities as invited speakers as well as students, It has a strong tradition of student involvement, with strong student attendance to its short courses, poster session and oral presentations. The DRC also has a tradition of offering discounted student registration fees, not only for general attendance but also for its short courses, in order to encourage student participation and attendance from additional students who are not presenting an abstract. Support will allow offering 50% discount for student registration to the general conference and the day-long short course "Device Fundamentals You Were Never Taught: Interpreting Your Device Data" held just prior to the beginning of the conference.
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LEAP-HI: All-Carbon Recyclable Electronics (ACRE): Realizing a Sustainable Electronics Lifecycle
  • 批准号:
    2245265
  • 项目类别:
    Standard Grant
  • 资助金额:
    $50.0万
  • 财政年份:
    2023
  • 负责人:
    Aaron Franklin
  • 依托单位:
Exploring the Limits of Scaling and 3D-integration for Edge-contacted Nanomaterial-based Transistors
  • 批准号:
    2227175
  • 项目类别:
    Standard Grant
  • 资助金额:
    $39.87万
  • 财政年份:
    2022
  • 负责人:
    Aaron Franklin
  • 依托单位:
1D Edge Contacts to 2D Devices for Scalability and 3D Integration with Via-formed Junctions
  • 批准号:
    1915814
  • 项目类别:
    Standard Grant
  • 资助金额:
    $39.07万
  • 财政年份:
    2019
  • 负责人:
    Aaron Franklin
  • 依托单位:
EAGER: Exploring the Negative Capacitance Effect from Hf-Based Ferroelectrics and 2D Nanomaterials for Low-Voltage Transistors
  • 批准号:
    1656240
  • 项目类别:
    Standard Grant
  • 资助金额:
    $15.0万
  • 财政年份:
    2016
  • 负责人:
    Aaron Franklin
  • 依托单位:
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