GOALI: Electrohydrodynamic Force Assisted Nanoimprint Lithography for Defect-Free Nanomanufacturing

GOALI：用于无缺陷纳米制造的电流体动力辅助纳米压印光刻

• 批准号: 1636132
• 负责人: Xiaogan Liang
• 金额: $ 20万
• 依托单位: Regents of the University of Michigan - Ann Arbor
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2016
• 资助国家: 美国
• 起止时间: 2016-09-01 至 2020-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1636132&HistoricalAwards=false
• 关键词: GOALI; Electrohydrodynamic; Force; Assisted; Nanoimprint

Cost-effective nanolithography technologies are increasingly needed for realizing scalable manufacturing of commercially-viable devices based on emerging nanostructures, such as nanoelectronic components in computer chips, nanoscale memory cells (or media) that can result in improved data storage capability, and photonic nanostructures for improving the power efficiency of solar cells. Recently, nanoimprint lithography has been adopted by the industry as an important candidate nanomanufacturing technology for patterning such nanostructures. Despite its advantages such as low processing cost, high patterning resolution, and high throughput, the current nanoimprinting systems suffer from nanoscale defects, which have seriously limited process yields and significantly hindered industrial applications. This Grant Opportunity for Academic Liaison with Industry (GOALI) award will seek to establish new nanomanufacturing methods capable of reducing or eliminating such defects. The research topics span over multiple disciplines of science and engineering including nanomanufacturing, electrostatics, hydrodynamics, simulation, and process characterization. These disciplines will be integrated to provide interdisciplinary knowledge to a broad range of people including K-12 students and educators, undergraduates, graduates, and students from underrepresented groups. This project will also involve collaboration with industry to ensure the technologies developed are scalable and commercially relevant. Currently, nanoscale gas bubbles trapped in imprint resist films are one of the most serious defects that affect the yields of manufacturing-grade nanoimprint systems. The research team's preliminary study demonstrates that the formation of such nanoscale defects is mainly attributed to surface pinning of resist spreading edges at the nanostructures or contaminants on the mold-substrate interfaces. However, there is still a lack of effective methods to eliminate such detrimental pinning effects and resulting gas defects. In this project, the research team aims to close this knowledge gap by creating and investigating a new light-curable nanoimprint technology based on nanoscopic electrohydrodynamic effects, which is anticipated to improve resist filling characteristics, significantly reduce or eliminate nanoscale gas defects, and therefore greatly enhance the yields of imprinted nanostructures over large areas. In particular, they will construct molecular dynamics models for investigating the effects of electrohydrodynamic forces on the dynamic evolution of nanoscale gas defects; build an electrohydrodynamic force-assisted nanoimprint system for determining and testing defect-free nanomanufacturing mechanisms; and combine modeling and experimental data to refine the simulation models.

为了实现基于新兴纳米结构的商业可行器件的可扩展制造，越来越需要具有成本效益的纳米光刻技术，例如计算机芯片中的纳米电子元件、可以导致改善数据存储能力的纳米级存储单元(或介质)，以及用于提高太阳能电池功率效率的光子纳米结构。近年来，纳米压印光刻技术已被业界采用为构图此类纳米结构的重要候选纳米制造技术。尽管目前的纳米印迹系统具有加工成本低、图案化分辨率高、产量高等优点，但其存在的纳米级缺陷严重限制了制程产量，严重阻碍了工业应用。这项学术与工业联系机会(GOALI)奖将寻求建立能够减少或消除此类缺陷的新的纳米制造方法。研究课题涉及多个科学和工程学科，包括纳米制造、静电学、流体力学、模拟和过程表征。这些学科将被整合，以向包括K-12学生和教育工作者、本科生、毕业生和代表性不足群体的学生在内的广泛人群提供跨学科知识。该项目还将涉及与业界的合作，以确保开发的技术具有可伸缩性和商业相关性。目前，压印抗蚀剂薄膜中捕获的纳米气泡是影响制造级纳米压印系统成品率的最严重缺陷之一。研究小组的初步研究表明，这种纳米级缺陷的形成主要归因于抗蚀剂扩散边缘在纳米结构处的表面钉扎或模具-基板界面上的污染物。然而，仍然缺乏有效的方法来消除这种有害的钉扎效应和由此产生的气体缺陷。在这个项目中，研究小组的目标是通过创造和研究一种基于纳米电流体效应的新的光固化纳米压印技术来弥合这一知识差距，该技术有望改善抗蚀剂填充特性，显著减少或消除纳米级气体缺陷，从而大大提高大面积压印纳米结构的产量。特别是，他们将构建分子动力学模型，以研究电动流体动力力对纳米级气体缺陷动态演化的影响；建立电动流体动力力辅助纳米印迹系统，以确定和测试无缺陷纳米制造机制；并将建模和实验数据相结合，以完善模拟模型。

项目成果

Nanofluidic/nanoelectronic study on solvent-processed nanoscale organic transistors

溶剂处理纳米级有机晶体管的纳米流体/纳米电子研究

• DOI: 10.1116/1.4991743
• 发表时间: 2017
• 期刊: and Phenomena
• 作者: Li, Da;Ryu, Byunghoon;Cui, Qingyu;Chen, Mikai;Jay Guo, Lingjie;Ma, Biwu;Liang, Xiaogan
• 通讯作者: Liang, Xiaogan

Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide

• DOI: 10.1038/micronano.2017.53
• 发表时间: 2017-09-11
• 期刊: MICROSYSTEMS & NANOENGINEERING
• 影响因子: 7.9
• 作者: Chen, Mikai;Rokni, Hossein;Liang, Xiaogan
• 通讯作者: Liang, Xiaogan

Inkjet-defined site-selective (IDSS) growth for controllable production of in-plane and out-of-plane MoS 2 device arrays

喷墨定义的位点选择性 (IDSS) 生长，用于平面内和平面外 MoS 2 器件阵列的可控生产

• DOI: 10.1039/d0nr04012f
• 发表时间: 2020
• 期刊: Nanoscale
• 影响因子: 6.7
• 作者: Ryu, Byunghoon;Yoon, Jeong Seop;Kazyak, Eric;Chen, Kuan-Hung;Park, Younggeun;Dasgupta, Neil P.;Liang, Xiaogan
• 通讯作者: Liang, Xiaogan

A nanofluidics study on nanoscale gas bubble defects in dispensing-based nanoimprint lithography

基于分配的纳米压印光刻中纳米级气泡缺陷的纳米流体学研究

• DOI: 10.1109/nano.2017.8117426
• 发表时间: 2017
• 期刊: Proceedings of the 17th IEEE International Conference on Nanotechnolog
• 作者: Li, Da;Ma, Xiaobai;Li, Nan;Hossein, Rokbi;Lu, Wei;Yu, Zhaoning;Liang, Xiaogan
• 通讯作者: Liang, Xiaogan