CAREER: Fundamental Electronic Device Performance and Reliability Investigation on Chalcogenide- and Oxide-based N- and P-type Materials for Large Area/Flexible Electronics
职业:用于大面积/柔性电子产品的硫族化物和氧化物基 N 型和 P 型材料的基础电子器件性能和可靠性研究
基本信息
- 批准号:1653343
- 负责人:
- 金额:$ 50万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2017
- 资助国家:美国
- 起止时间:2017-03-01 至 2023-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Large area/flexible electronics presents new opportunities for applications benefiting society, such as low- cost, flexible and self-powered sensors, wearable, and even biocompatible electronics. These systems may include "smart" medical bandages that monitor the healing of wounds and medical triage patches that monitor vital signs. Also, light-weight and rugged flexible decals are a potential application for inventory tracking, pollution monitoring, structural reliability of buildings/bridges in urban areas, etc. Currently, a typical fabrication approach to enable circuitry for these applications will use organic materials in a complex integration scheme with inorganic materials "hybrid approach" that will be more costly compared to the proposed work. In addition, a serious limitation of the hybrid approach is device and circuit performance limitations due to exposure of organics to the ambient. To enable high performance systems applications for large area electronics such as "smart" bio monitoring patches, flexible sensors, RFIDs, and microcontrollers, the incorporation of low cost, non-silicon thin-film transistor materials compatible with mechanically flexible properties is essential. Moreover, the flexible application requires substrates processed at relatively low temperatures ( 180°C) compared to conventional silicon-based chip manufacturing. To address this performance gap at low cost, this research proposes exploring an entirely inorganic, non-hybrid semiconductor technology using chalcogenides (sulfur- and tellurium-based materials) and oxides (zinc oxide-based, nickel oxide and tin oxide materials). Using these semiconducting materials will result in a revolution of large-area/flexible electronics by enabling straightforward integration of multiple components (i.e., energy storage/harvesting, displays, and sensors) on a single substrate. Furthermore, they will have a resounding impact on the Internet of Things, medical, defense, and sensors by enabling technologies where it may not be practical and cost effective for silicon. Finally, the education/outreach objectives include engaging with middle school STEM educators for on-campus research in the PI"s lab and incorporating the experience into innovative curriculum plans to take back to their students. In addition, there will be implementation of "units of learning" that incorporate large-area/flex technology into advanced-level courses while also providing undergraduate research opportunities.The objective of this proposal is to fundamentally explore the use of inorganic, low temperature ( 180ºC) chalcogenide- and oxide-based n-type and p-type thin-film semiconductors for low-cost, large-area/flex- compatible devices and circuits. The research plan consists of four (4) phases: (I) materials evaluation; (II) device fabrication; (III) device characterization; and (IV) device simulation/modeling. Using physical and electrical characterization along with modeling/simulation, a comprehensive investigation will provide fundamental device performance and reliability understanding. This work will provide the opportunity to have Cd- and Pb-free materials for p- and n-type semiconductors with high carrier mobility and electrical stability for implantable or wearable electronics. Furthermore, the demonstration of large-area/flex- compatible p/n junctions, junction field effect transistors, and thin-film transistors will truly take large- area/flex processing to new heights and permit complementary circuit capabilities, such as thin film amplifiers and logic circuitry, that have not been demonstrated using appropriate processing conditions (i.e., low temp) for integration into sensors, smart bandages, detectors, RFIDs, etc. This work addresses current challenges in large-area/flex-compatible circuitry where all-inorganic, n- and p-type semiconductor devices, and circuits are vital because an organic-only or a partially organic hybrid approach has more pronounced long-term degradation of organic-based devices. Therefore, inorganic materials and devices are preferred in order to create the needed circuitry. Using these semiconducting materials will result in a revolution of large-area and flexible electronics by enabling straightforward integration of multiple components such as energy storage/harvesting, displays, and sensors on a single substrate. Furthermore, they will have a resounding impact on the Internet of Things, medical, defense, and sensors by enabling technologies where it may not be practical and cost effective for silicon.
大面积/柔性电子器件为有益于社会的应用提供了新的机会,例如低成本、柔性和自供电的传感器、可穿戴、甚至生物相容性电子器件。这些系统可以包括监测伤口愈合的“智能”医疗绷带和监测生命体征的医疗分诊贴片。此外,重量轻,坚固耐用的柔性贴花是一个潜在的应用库存跟踪,污染监测,在城市地区的建筑物/桥梁的结构可靠性等,目前,一个典型的制造方法,使这些应用的电路将使用有机材料在一个复杂的集成方案与无机材料的“混合方法”,这将是更昂贵的相比,拟议的工作。此外,混合方法的严重限制是由于有机物暴露于环境而导致的器件和电路性能限制。为了实现大面积电子设备的高性能系统应用,如“智能”生物监测贴片、柔性传感器、RFID和微控制器,必须采用与机械柔性特性兼容的低成本非硅薄膜晶体管材料。此外,与传统的硅基芯片制造相比,灵活的应用需要在相对较低的温度(180°C)下处理基板。为了以低成本解决这一性能差距,本研究提出探索一种完全无机的非混合半导体技术,使用硫族化物(硫和碲基材料)和氧化物(氧化锌基,氧化镍和氧化锡材料)。使用这些半导体材料将通过实现多个组件的直接集成(即,能量存储/收集、显示器和传感器)。此外,它们将对物联网、医疗、国防和传感器产生深远的影响,因为它们可以实现对硅来说可能不实用和不具成本效益的技术。最后,教育/推广目标包括与中学STEM教育工作者在PI的实验室进行校园研究,并将经验纳入创新课程计划,以带回给学生。此外,还将实施“学习单元”,将大面积/柔性技术纳入高级课程,同时也提供本科生研究机会。该提案的目标是从根本上探索使用无机、低温(180ºC)硫属化物和氧化物基n型和p型薄膜半导体,用于低成本、大面积/柔性兼容的器件和电路。研究计划包括四(4)个阶段:(I)材料评价;(II)器件制造;(III)器件表征;(IV)器件模拟/建模。使用物理和电气特性沿着建模/仿真,全面的调查将提供基本的器件性能和可靠性的理解。这项工作将为p型和n型半导体提供无Cd和Pb材料的机会,这些材料具有高载流子迁移率和电稳定性,适用于可植入或可穿戴电子产品。此外,大面积/柔性兼容p/n结、结型场效应晶体管和薄膜晶体管的演示将真正地将大面积/柔性处理带到新的高度,并且允许互补电路能力,诸如薄膜放大器和逻辑电路,其尚未使用适当的处理条件(即,这项工作解决了大面积/柔性兼容电路中的当前挑战,其中全无机,n型和p型半导体器件和电路至关重要,因为仅有机或部分有机混合方法对有机基器件具有更明显的长期退化。因此,无机材料和器件是优选的,以便产生所需的电路。使用这些半导体材料将导致大面积和柔性电子产品的革命,使多个组件(如能量存储/收集,显示器和传感器)能够直接集成在单个基板上。此外,它们将对物联网、医疗、国防和传感器产生深远的影响,因为它们可以实现对硅来说可能不实用和不具成本效益的技术。
项目成果
期刊论文数量(16)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Positive Bias Instability in ZnO TFTs with Al 2 O 3 Gate Dielectric
具有 Al 2 O 3 栅极电介质的 ZnO TFT 的正偏压不稳定性
- DOI:10.1109/irps.2019.8720547
- 发表时间:2019
- 期刊:
- 影响因子:0
- 作者:Bolshakov, Pavel;Rodriguez-Davila, Rodolfo A.;Quevedo-Lopez, Manuel;Young, Chadwin D.
- 通讯作者:Young, Chadwin D.
Introduction of a Reset MOSFET to Mitigate the Influence of Ionic Movement in Perovskite MOSFET Photodetector Measurements
- DOI:10.1109/icmts50340.2022.9898238
- 发表时间:2022-03
- 期刊:
- 影响因子:0
- 作者:Jinbo Liu;R. Haroldson;Grigorii Verkhogliadov;Dayang Lin;Q. Gu;A. Zakhidov;W. Hu;C. D. Young
- 通讯作者:Jinbo Liu;R. Haroldson;Grigorii Verkhogliadov;Dayang Lin;Q. Gu;A. Zakhidov;W. Hu;C. D. Young
Schottky Barrier Height Tuning on Platinum-gated ZnO Metal-Semiconductor Field Effect Transistors by In-Situ Surface Modification
通过原位表面改性对铂栅 ZnO 金属半导体场效应晶体管进行肖特基势垒高度调节
- DOI:
- 发表时间:2018
- 期刊:
- 影响因子:0
- 作者:Rodriguez-Davila, R. A.;Chapman, R. A.;Mejia, I.;Quevedo-Lopez, M. A.;Young, C. D.
- 通讯作者:Young, C. D.
Electrical characterization of process induced effects on non-silicon devices
非硅器件工艺诱发效应的电气特性
- DOI:10.1109/icicdt.2018.8399784
- 发表时间:2018
- 期刊:
- 影响因子:0
- 作者:Young, Chadwin D.;Bolshakov, Pavel;Rodriguez-Davila, Rodolfo A.;Zhao, Peng;Khosravi, Ava;Mejia, Israel;Quevedo-Lopez, Manuel;Hinkle, Christopher L.;Wallace, Robert M.
- 通讯作者:Wallace, Robert M.
Deconvolution of Hot Carrier and Cold Carrier Injection in ZnO TFTs
ZnO TFT 中热载流子和冷载流子注入的解卷积
- DOI:10.1109/snw50361.2020.9131625
- 发表时间:2020
- 期刊:
- 影响因子:0
- 作者:Bolshakov, P.;Rodriguez-Davila, R.A.;Quevedo-Lopez, M.;Young, C.D.
- 通讯作者:Young, C.D.
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Chadwin Young其他文献
Chadwin Young的其他文献
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{{ truncateString('Chadwin Young', 18)}}的其他基金
REU Site: Electronic Materials Evaluation Research for Greater Exposure to Future Technology Careers (EMERGE)
REU 网站:电子材料评估研究,以更好地接触未来技术职业 (EMERGE)
- 批准号:
2150281 - 财政年份:2022
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
US-Ireland R&D Partnership: Ga2O3: Understanding Growth, Interfaces and Defects to enable next generation Electronics (GUIDE)
美国-爱尔兰 R
- 批准号:
2154535 - 财政年份:2022
- 资助金额:
$ 50万 - 项目类别:
Standard Grant
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