Heterojunctions as the Weakest Link: A Fundamental Investigation of Damage Evolution in Electronic Devices
Heterojunctions as the Weakest Link: A Fundamental Investigation of Damage Evolution in Electronic Devices
批准号:
2015795
负责人:
Md Haque
金额:
$37.51万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2020
资助国家:
美国
项目状态:
已结题
起止时间:
2020-05-01 至 2024-04-30
中文摘要
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英文摘要
PROJECT ABSTRACTProposal Title:Heterojunctions as the Weakest Link: A Fundamental Investigation of Damage Evolution in Electronic DevicesNon-technical AbstractReliability of microelectronic devices, such as transistors, is critical to applications. Typically, this is studied by loading the transistors to failure and then analyzing the electrical characteristics of the data. Post-mortem microscopy is also performed to visualize the damage inside the device. However, care must be taken to recreate the failure events. In this research, a novel concept is introduced where the transistor is tested inside microscopes that allow near-atomic resolution mapping of defect evolution and the role of local heat and current transport. Special consideration will be given to the interfaces between various layers inside a transistor, whose important role in device reliability has been difficult to study using conventional approaches. Such high-resolution access to mechanical, electrical and thermal domains will remove the existing challenge of identifying the local weak spots in the transistor and the fundamental mechanisms behind their impact on the global or device level failure. This unique approach will be applied to the study of high-power transistors that will be used in next generation all-electric transportation, energy storage and radio-frequency communication technologies. Success of this research will lead to transistors that will reduce the size and weight of relevant equipment in these applications while increasing power and reliability. In addition to the advancements in the fundamental science of high-power transistor reliability, the project will ensure training of the graduate and undergraduate students with cutting edge and multi-disciplinary science and technology. Outreach activities will be performed to attract K-12 students, who are the workforce of the next generation.Technical AbstractThe objective of this research is to investigate the role of heterojunctions in overall device reliability for power transistors. The research is motivated by the gap between the predicted and actual reliability of high power and high frequency devices touted to enable next generation all-electric transportation, energy storage and RF communication technologies. Gallium nitride based high electron mobility transistors (HEMT) will be studied to answer two fundamental questions: (a) what is the weakest component in a transistor in terms of defect nucleation and (b) is it defect nucleation or atomic diffusion that is more viral in device degradation. This research hypothesizes that diffusion across and along interfaces could be the answers and lays out a unique in-operando microscopy based validation approach. Transmission electron and thermo-reflectance microscopy will be used in real time to map and monitor the structural and transport characteristics of the devices during the onset of degradation. The high resolution, both spatially and temporally, shifts the current paradigm of looking for failure signatures in device data from the device-level to the atomic interface level. Realtime investigation of the atomic structure and chemistry of defects and interfaces, along with an understanding of their influence on electron-phonon interactions, will eliminate the roadblock of accurately identifying the dominant mechanism and quantifying its impact. The proposed research elaborately designs non-thermal experiments after isolating the various components of mechanical stress (residual, thermo-elastic and inverse piezo-electric). The outcome of this research will provide fundamental insights on GaN HEMT failure and suggest paths towards performance and reliability improvements. It will also train graduate and undergraduate students in both class and laboratory settings. The project will also reach out to the next generation workforce, the K-12 students, to attract them toward science and technology.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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Gamma radiation on gallium nitride high electron mobility transistors at ON, OFF, and prestressed conditions
氮化镓高电子迁移率晶体管在开、关和预应力条件下的伽马辐射
DOI:
10.1116/6.0002216
发表时间:
2022
期刊:
Journal of Vacuum Science & Technology B
影响因子:
1.4
作者:
[Rasel, Md Abu Jafar, Stepanoff, Sergei, Haque, Aman, Wolfe, Douglas E., Ren, Fan, Pearton, Stephen J.]
通讯作者:
Pearton, Stephen J.
Heuristic Detection of the Most Vulnerable Regions in Electronic Devices for Radiation Survivability
电子设备中最脆弱区域的启发式检测,以提高辐射生存能力
DOI:
10.1149/2162-8777/ac861a
发表时间:
2022
期刊:
ECS Journal of Solid State Science and Technology
影响因子:
2.2
作者:
[Stepanoff, Sergei P., Rasel, Md Abu, Haque, Aman, Wolfe, Douglas E., Ren, Fan, Pearton, Stephen J.]
通讯作者:
Pearton, Stephen J.
DOI:
10.1063/5.0109606
发表时间:
2022-07
期刊:
Journal of Applied Physics
影响因子:
3.2
作者:
[D. Pagan;M. Rasel;R. E. Lim;D. Sheyfer;Wenjun Liu;A. Haque]
通讯作者:
D. Pagan;M. Rasel;R. E. Lim;D. Sheyfer;Wenjun Liu;A. Haque
DOI:
10.1116/6.0002115
发表时间:
2022-12-01
期刊:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
影响因子:
2.9
作者:
[Modak, Sushrut, Lundh, James Spencer, Pearton, Stephen J.]
通讯作者:
Pearton, Stephen J.
Thermal Stability of Transparent ITO/n-Ga 2 O 3 /n+-Ga 2 O 3 /ITO Rectifiers
透明ITO/n-Ga 2 O 3 /n-Ga 2 O 3 /ITO整流器的热稳定性
DOI:
10.1149/2162-8777/ac3ace
发表时间:
2021
期刊:
ECS Journal of Solid State Science and Technology
影响因子:
2.2
作者:
[Xia, Xinyi, Xian, Minghan, Ren, Fan, Rasel, Md Abu, Haque, Aman, Pearton, S. J.]
通讯作者:
Pearton, S. J.
共 14 条
Defect-Electron Interaction at Ambient Temperature in Metallic Materials
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批准号:2103928
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项目类别:Standard Grant
-
资助金额:$22.0万
-
财政年份:2022
-
负责人:Md Haque
-
依托单位:
Nanomanufacturing of Atomically-Uniform Two-Dimensional Materials over Large Areas
-
批准号:1760931
-
项目类别:Standard Grant
-
资助金额:$32.5万
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财政年份:2018
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负责人:Md Haque
-
依托单位:
Vacancy Engineering for Enhanced Strength and Toughness of Metals
-
批准号:1609060
-
项目类别:Standard Grant
-
资助金额:$32.5万
-
财政年份:2016
-
负责人:Md Haque
-
依托单位:
An Integrated Lab-on-a-Chip for Nanoelectronic Materials
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批准号:1028521
-
项目类别:Standard Grant
-
资助金额:$28.4万
-
财政年份:2011
-
负责人:Md Haque
-
依托单位:
Mechanics of Materials at the Extreme Length-Scales
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批准号:1029935
-
项目类别:Standard Grant
-
资助金额:$30.02万
-
财政年份:2010
-
负责人:Md Haque
-
依托单位:
Nano-mechanical Properties of Grain Boundaries
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批准号:0625650
-
项目类别:Standard Grant
-
资助金额:$25.0万
-
财政年份:2007
-
负责人:Md Haque
-
依托单位:
Career: In-situ Monitoring of Opto-electro-mechanical Responses of Single Cells to External Stimuli using MEMS
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批准号:0545683
-
项目类别:Standard Grant
-
资助金额:$40.0万
-
财政年份:2006
-
负责人:Md Haque
-
依托单位:
Nano-mechanics of Carbon Nanotube-Polymer Interfaces
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批准号:0555420
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2006
-
负责人:Md Haque
-
依托单位:
Thermo-Mechanical Effects on Electrical Transport in Carbon Nanotubes
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批准号:0501436
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项目类别:Standard Grant
-
资助金额:$0.0万
-
财政年份:2005
-
负责人:Md Haque
-
依托单位:
SGER: Interfacial Mechanics of Carbon Nanotube-Polymer Composites
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批准号:0411603
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项目类别:Standard Grant
-
资助金额:$6.0万
-
财政年份:2004
-
负责人:Md Haque
-
依托单位:
海外基金