MRI: Acquisition of a Maskless Lithography Tool for the Brown Nanofabrication Central Facility
MRI:为布朗纳米加工中心设施采购无掩模光刻工具
基本信息
- 批准号:1827453
- 负责人:
- 金额:$ 28.7万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2018
- 资助国家:美国
- 起止时间:2018-09-01 至 2020-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This award from the Major Research Instrumentation program supports Brown University with the acquisition of a modern maskless lithography system (Heidelberg Instruments MLA-150). Maskless lithography, where the pattern is transferred to the substrate by rapidly scanning a laser beam over the photoresist-covered substrate, under computer control overcomes many of the limitations of current photolithography techniques. The instrument will be located within the Nanofabrication Central Facility (NCF) and will support the research by some 25 research groups at Brown University including faculty from Engineering to Physics to Chemistry to Biomedical Engineering as well as local research community and industry. The MLA-150 will enable high-speed and flexible optical lithography down to micron-sized features at low cost and over large areas, without the constraints of pre-existing mask sets. In the immediate future, it will enable research in a range of funded or planned research projects in electronic and microfluidic devices. The flexibility of the system would help expand the range of laboratory courses currently supported by the NCF (three Engineering fabrication courses, currently focused on diode, transistor and solar cell fabrication) to encompass e.g. microfluidic devices. Postdoctoral scholars, graduate and undergraduate students will have an opportunity to be trained in this versatile fabrication technique. This Major Research Instrumentation award supports the acquisition of a Heidelberg Instruments MLA-150 maskless lithography tool, with ~1 micrometer achievable feature size over a 150 mm field of exposure, with fast computer-controlled high-accuracy (0.5 micrometer) alignment and short (minutes-long) exposure times. The instrument includes two laser illumination modules and integrated cameras for high-accuracy alignment to pre-existing structures. The system will be integrated in a new Nanofabrication Central Facility (NCF) cleanroom at Brown University. This state-of-the-art instrument will foster interdisciplinary research at the intersection between diverse research fields in electronic and optoelectronic devices: fabrication of Ge quantum-dot based photodetectors; nitride vertical current flow transistors; piezoelectric energy harvesting devices; and magnetic tunnel junction-based memory elements and arrays. In the advanced materials area, it will contribute to: large-area surface patterning for THz emission spectroscopy; ultra-thin layered materials for structural coloration; templated surfaces for self-assembled nanoparticle arrays; 3D photocatalytic structures; and adaptive meta-surfaces based on phase-change materials. In the rapidly expanding bio-engineering area, the MLA-150 will permit large-area microfluidic structures to study spatially confined cell migration; DNA manipulation; and geometrically-constrained stem cell migration and differentiation. The instrument will be made available to other local academic institutions and local industry.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
主要研究仪器项目的这一奖项支持布朗大学购买现代无掩模光刻系统(海德堡仪器公司的MLA-150)。无掩模光刻技术是在计算机控制下,通过在覆盖有光刻胶的衬底上快速扫描激光束,将图案转移到衬底上,克服了当前光刻技术的许多局限性。该仪器将设在纳米制造中心设施(NCF)内,并将支持布朗大学约25个研究小组的研究,这些研究小组包括从工程到物理、化学到生物医学工程的教职员工以及当地研究社区和行业。MLA-150将使高速和灵活的光学光刻以低成本和大面积实现微米级的特征,而不受现有掩模组的限制。在不久的将来,它将使电子和微流控设备的一系列资助或计划研究项目的研究成为可能。该系统的灵活性将有助于扩大NCF目前支持的实验室课程的范围(三门工程制造课程,目前侧重于二极管、晶体管和太阳能电池制造),以涵盖例如微流控器件。博士后学者、研究生和本科生将有机会接受这种多功能制造技术的培训。这一重大研究仪器奖支持收购海德堡仪器公司的MLA-150无掩模光刻工具,该工具在150 mm的曝光范围内具有~1微米的可实现特征尺寸,具有快速的计算机控制的高精度(0.5微米)对准和短(几分钟长)的曝光时间。该仪器包括两个激光照明模块和集成摄像头,可高精度对准预先存在的结构。该系统将集成在布朗大学的一个新的纳米制造中心(NCF)洁净室中。这一最先进的仪器将促进电子和光电设备不同研究领域之间的交叉学科研究,这些领域包括:基于Ge量子点的光电探测器的制造;氮化物垂直电流流动晶体管;压电能量采集设备;以及基于磁隧道结的存储元件和阵列。在先进材料领域,它将有助于:用于太赫兹发射光谱的大面积表面图案化;用于结构着色的超薄层状材料;用于自组装纳米颗粒阵列的模板化表面;三维光催化结构;以及基于相变材料的自适应亚表面。在迅速扩大的生物工程领域,MLA-150将允许大面积微流控结构研究空间受限的细胞迁移、DNA操作以及几何约束的干细胞迁移和分化。该工具将提供给其他当地学术机构和当地行业。这一奖项反映了NSF的法定使命,并通过使用基金会的学术价值和更广泛的影响审查标准进行评估,被认为值得支持。
项目成果
期刊论文数量(1)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Nonhysteretic Vortex Magnetic Tunnel Junction Sensor with High Dynamic Reserve
- DOI:10.1103/physrevapplied.14.034051
- 发表时间:2020-09-18
- 期刊:
- 影响因子:4.6
- 作者:He, Guanyang;Zhang, Yiou;Xiao, Gang
- 通讯作者:Xiao, Gang
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Alexander Zaslavsky其他文献
Significance of Tumor Growth Modeling in the Behavior of Homogeneous Cancer Cell Populations: Are Tumor Growth Models Applicable to Both Heterogeneous and Homogeneous Populations?
肿瘤生长模型在同质癌细胞群体行为中的意义:肿瘤生长模型是否适用于异质和同质群体?
- DOI:
10.59720/20-107 - 发表时间:
2021 - 期刊:
- 影响因子:0
- 作者:
Divya Reddy;Alexander Zaslavsky;Todd Morgan;Joe Rasmus - 通讯作者:
Joe Rasmus
PD71-06 CTC-BASED GENE EXPRESSION FOR PREDICTING RESISTANCE TO ABIRATERONE AND ENZALUTAMIDE IN MCRPC
- DOI:
10.1016/j.juro.2017.02.3173 - 发表时间:
2017-04-01 - 期刊:
- 影响因子:
- 作者:
Jae-Seung Chung;Yugang Wang;Henderson James;Udit Singhal;Yuanyuan Qiao;Alexander Zaslavsky;Dan Hovelson;Felix Feng;Ganesch Palapattu;Taichman Russell;Arul Chinnaiyan;Scott Tomlins;Todd Morgan - 通讯作者:
Todd Morgan
Sputter-Deposited copper iodide thin film transistors with low Operating voltage
- DOI:
10.1016/j.sse.2024.109014 - 发表时间:
2024-11-01 - 期刊:
- 影响因子:
- 作者:
Zachary C. Adamson;Rotem Zilberberg;Iryna Polishchuk;Natalia Thomas;Kyumin Kim;Alexander Katsman;Boaz Pokroy;Alexander Zaslavsky;David C. Paine - 通讯作者:
David C. Paine
Optimization of Discrete Parameters Using the Adaptive Gradient Method and Directed Evolution
使用自适应梯度法和定向进化优化离散参数
- DOI:
10.48550/arxiv.2401.06834 - 发表时间:
2024 - 期刊:
- 影响因子:0
- 作者:
Andrei Beinarovich;Sergey Stepanov;Alexander Zaslavsky - 通讯作者:
Alexander Zaslavsky
Full Two-Dimensional Markov Chain Analysis of Thermal Soft Errors in Subthreshold Nanoscale CMOS Devices
亚阈值纳米级 CMOS 器件热软错误的全二维马尔可夫链分析
- DOI:
10.1109/tdmr.2010.2069100 - 发表时间:
2011 - 期刊:
- 影响因子:2
- 作者:
P. Jannaty;F. C. Sabou;R. Iris Bahar;J. Mundy;William R. Patterson;Alexander Zaslavsky - 通讯作者:
Alexander Zaslavsky
Alexander Zaslavsky的其他文献
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{{ truncateString('Alexander Zaslavsky', 18)}}的其他基金
Advanced Research Workshop on Future Trends in Microelectronics: Journey Into the Unknown Future Trends in Microelectronics (FTM-2015)
微电子未来趋势高级研究研讨会:微电子未知未来趋势之旅(FTM-2015)
- 批准号:
1522997 - 财政年份:2015
- 资助金额:
$ 28.7万 - 项目类别:
Standard Grant
Advanced Research Workshop on Future Trends in Microelectronics: Into the Cross Currents. To be Held in Corsica, France , June 25-29,2012.
微电子未来趋势高级研究研讨会:进入交叉潮流。
- 批准号:
1239877 - 财政年份:2012
- 资助金额:
$ 28.7万 - 项目类别:
Standard Grant
Strained Axial Si/Ge Heteronanowire Devices: From Tunneling Transistors to Optical Sources
应变轴向硅/锗异质纳米线器件:从隧道晶体管到光源
- 批准号:
1068895 - 财政年份:2011
- 资助金额:
$ 28.7万 - 项目类别:
Standard Grant
GOALI: Germanium-on-insulator tunneling transistors
GOALI:绝缘体上锗隧道晶体管
- 批准号:
0701635 - 财政年份:2007
- 资助金额:
$ 28.7万 - 项目类别:
Standard Grant
NER: Exploring Nanodevices for Probabilistic Computing Architectures
NER:探索概率计算架构的纳米设备
- 批准号:
0403958 - 财政年份:2004
- 资助金额:
$ 28.7万 - 项目类别:
Standard Grant
Coulomb Blockade and Few-Electron Energy Spectra of Quantum Rings
量子环的库仑封锁和少电子能谱
- 批准号:
0302222 - 财政年份:2003
- 资助金额:
$ 28.7万 - 项目类别:
Standard Grant
CAREER: Strain Effects in Semiconductor Nanostructures
职业:半导体纳米结构中的应变效应
- 批准号:
9702725 - 财政年份:1997
- 资助金额:
$ 28.7万 - 项目类别:
Continuing Grant
Development and Contruction of an In-situ Processing Extension for Existing Molecular Beam Epitaxy System
现有分子束外延系统原位加工扩展的开发和构建
- 批准号:
9503708 - 财政年份:1995
- 资助金额:
$ 28.7万 - 项目类别:
Standard Grant
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