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New Topological Insulators based on ternary chalcogenides of Bi, Pb and TI

New Topological Insulators based on ternary chalcogenides of Bi, Pb and TI
基于 Bi、Pb 和 TI 三元硫属化物的新型拓扑绝缘体
批准号:
237558034
负责人:
Professor Juri Grin
金额:
$0.0万
依托单位国家:
德国
项目类别:
Priority Programmes
财政年份:
2013
资助国家:
德国
项目状态:
已结题
起止时间:
2012-12-31 至 2016-12-31

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中文摘要
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英文摘要
The aim of the proposal is the preparation and characterization of novel TI based on ternary chalcogenides of Bi, Pb, and Tl. This leads to third generation TI in line with the first (Bi1-xSbx) and second generation TI (Bi2Te3, Bi2Se3, Sb2Te3). As a promising material for topologically protected surface states Bi2Si2Te6 was recently investigated. Like Bi2Te3 it shows a layered crystal structure and a very small direct band gap with inversion of s- and p-states upon spin-orbit-coupling (SOC). It allows for studies of isoelectronic substitution effects by Ge, Sb and Se. Further, compounds of composition A2Rh3S2 are investigated. With the choice of A = Tl, Pb, Bi band structures indicate TI properties that again can be design upon substitution effects.
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Preparation of intermetallic phases in ionic liquids
Thermoelectric properties of antimonide intermetallics and oxides: Nanoparticles and nano-sized segregations in bulk samples
Chemical bonding in complex metallic alloys
Electron density and chemical bonding in intermetallic borides and structural analogues
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