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Excellence in Research: Multi-Charge Ion Implantation of Ultra-Wide Bandgap beta-Ga2O3 Semiconductor Grown by Magnetron Sputtering

Excellence in Research: Multi-Charge Ion Implantation of Ultra-Wide Bandgap beta-Ga2O3 Semiconductor Grown by Magnetron Sputtering
卓越研究:磁控溅射生长的超宽带隙 β-Ga2O3 半导体的多电荷离子注入
批准号:
2000174
负责人:
Adetayo Adedeji
金额:
$40.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2020
资助国家:
美国
项目状态:
已结题
起止时间:
2020-07-15 至 2023-06-30

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中文摘要
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英文摘要
Nontechnical DescriptionThis Excellence in Research (EiR) project at a minority-serving institution will support faculty research on materials, build the institutional research capacity, and train underrepresented and underserved students in materials research. This research project includes developing a reliable technique for depositing thin layers of gallium oxide, a semiconductor. This material is interesting because it has shown promise for many special defense and civilian electronic device applications, including high power microelectronic devices and harsh environment sensors. Undergraduate students with very little or no prior research experience will learn technological skills by conducting research during the regular academic year and in the summer. Five talented High School students from neighboring schools in rural northeastern North Carolina will be introduced to materials research careers each year during the summer research internship supported with this grant. Undergraduate students from a minority-serving institution will have the opportunity to conduct research with, and interact and learn from graduate students and faculty from Old Dominion University, a collaborating partner on this project.Technical DescriptionThe growth of beta-gallium oxide epilayers by the relatively inexpensive magnetron sputtering method on electrically insulating (iron-doped) and conducting (tin-doped) gallium oxide substrates is being investigated. Their structures will be characterized with various high-resolution X-ray diffraction scans. Doping of the gallium oxide layers is attained via co-sputtering with different dopant targets. Low energy laser Multi-Charge Ion (MCI) implantation used to heavily dope the top layer of the material at selected spatial locations will also be investigated. The principal investigator and student researchers will work with the co-investigator and graduate students at Old Dominion University to study MCI implantation and efficient dopant activation processes. The ultra-wide energy gap of this material implies high breakdown field strength and high tolerance for extreme conditions and harsh environments. Beta-gallium oxide semiconductor is a good candidate for high power electronic devices, solar-blind UV photodetectors, photocatalysts, gas sensors, and solar cells.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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DOI: 10.1557/s43579-021-00127-8
发表时间: 2021
期刊: MRS Communications
影响因子: 1.9
作者: [Harmon, Alexis, Robertson, Darnell, Elahi, Mehran, Kumar, Bijandra, Adedeji, Adetayo]
通讯作者: Adedeji, Adetayo
MRI: Acquisition of a Portable SEM with EDS to Investigate Damages to Metallization Structure and its Interface with WBG Semiconductor in Harsh Environments.
  • 批准号:
    1337141
  • 项目类别:
    Standard Grant
  • 资助金额:
    $23.74万
  • 财政年份:
    2013
  • 负责人:
    Adetayo Adedeji
  • 依托单位:
"Research Initiation Award: Fabrication and Characterization of Composite Contacts on Wide Band Gap Semiconductor for High Temperature Application in Air."
  • 批准号:
    1137470
  • 项目类别:
    Standard Grant
  • 资助金额:
    $20.0万
  • 财政年份:
    2011
  • 负责人:
    Adetayo Adedeji
  • 依托单位:
MRI: Acquisition of a sputtering system for contact metallization of WBG semiconductor for high temperature application in air ambient.
  • 批准号:
    1040200
  • 项目类别:
    Standard Grant
  • 资助金额:
    $20.47万
  • 财政年份:
    2010
  • 负责人:
    Adetayo Adedeji
  • 依托单位:
国内基金
海外基金
Research on Quantum Field Theory without a Lagrangian Description
  • 批准号:
    24ZR1403900
  • 项目类别:
    省市级项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    SATOSHI NAWATA
  • 依托单位:
Cell Research
Cell Research
Cell Research (细胞研究)