I-Corps: Real-time characterization using in-line angular scatterometry during high-speed roll-to-roll fabrication processes

I-Corps项目的广泛影响/商业潜力提供实时测量，以优化新型卷对卷（R2R）制造工艺的产量并减少浪费。提出的高速技术可以在不干扰高速R2R制造工艺的情况下进行关键的非接触实时测量。常用的分析工具采用统计分析程序；由于它们的大尺寸和真空条件，它们都不能在实时R2R制造系统中实现。提出的技术缩小了新的制造工艺和实时测量系统之间的差距。这个I-Corps项目的重点是将计量技术商业化，用于纳米技术产品的新型制造工艺（例如纳米压印、卷对卷和晶圆级）。所提出的直列光学角散射计提供实时测量而不干扰制造过程。光学角散射测量法提供了足够的分辨率来表征大约20 nm和24 nm（间距尺寸）的图案金属和光抗蚀剂纳米结构。灵敏度的投影显示出足够的分辨率和灵敏度，尺寸低至大约10纳米。所提出的散射计系统已在移动基板上以50厘米/秒的速度进行了演示，远远高于目前预计的卷对卷制造速度。各种1D， 2D和3D模式的研究与静态离线散射计和SEM测量结果一致。该奖项反映了美国国家科学基金会的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。

The broader impact/commercial potential of this I-Corps project provides real-time measurements to optimize yield and reduce waste in novel roll-to-roll (R2R) manufacturing processes. The proposed high-speed technology can perform the critical non-contact, real-time measurements without interfering with high-speed R2R fabrication processes. Commonly used analytical tools use statistical analysis procedures; none of them can be implemented during real-time R2R fabrication systems due to their large-size and vacuum conditions. The proposed technology closes the gap between new fabrication processes and systems that measure in real time. This I-Corps project focuses on the commercialization of metrology technology for novel fabrication processes used in nano-technology products (e.g. nano-imprint lithography, roll-to-roll, and wafer-scale). The proposed in-line optical angular scatterometer provides real-time metrology without interfering with fabrication processes. Optical Angular Scatterometry offers enough resolution to characterize structures down to approximately 20 nm and 24 nm (pitch size) for pattern metallic and photoresist nanostructures. Projections of sensitivity show enough resolution and sensitivity for dimensions down to approximately 10 nm. The proposed scatterometer system has been demonstrated on a moving substrate at a speed of 50 cm/s, well above currently projected roll-to-roll manufacturing speeds. Various 1D, 2D, and 3D patterns have been studied in good agreement with both static off-line scatterometers and SEM measurements.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.