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I-Corps: Real-time characterization using in-line angular scatterometry during high-speed roll-to-roll fabrication processes

I-Corps: Real-time characterization using in-line angular scatterometry during high-speed roll-to-roll fabrication processes
I-Corps:在高速卷对卷制造过程中使用在线角散射测量进行实时表征
批准号:
2041676
负责人:
Juan Faria-Briceno
金额:
$5.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2021
资助国家:
美国
项目状态:
已结题
起止时间:
2021-01-01 至 2021-10-31

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中文摘要
翻译
该I-Corps项目的更广泛影响/商业潜力提供了实时测量,以优化新型卷对卷(R2 R)制造工艺中的产量并减少浪费。所提出的高速技术可以在不干扰高速R2 R制造工艺的情况下执行关键的非接触式实时测量。常用的分析工具使用统计分析程序;由于它们的大尺寸和真空条件,它们都不能在实时R2 R制造系统中实现。所提出的技术缩小了新制造工艺和真实的测量系统之间的差距。这个I-Corps项目的重点是将计量技术商业化,用于纳米技术产品(例如纳米压印光刻、卷对卷和晶圆级)中使用的新型制造工艺。所提出的在线光学角散射仪提供实时计量而不干扰制造过程。光学角散射法提供了足够的分辨率,以表征图案金属和光刻胶纳米结构的结构低至约20 nm和24 nm(间距大小)。灵敏度的投影显示出足够的分辨率和灵敏度的尺寸下降到约10 nm。所提出的散射仪系统已被证明在移动基板上的速度为50厘米/秒,远高于目前预计的卷到卷的制造速度。各种1D、2D和3D图案的研究结果与静态离线散射仪和SEM测量结果吻合良好。该奖项反映了NSF的法定使命,并通过使用基金会的知识价值和更广泛的影响审查标准进行评估,被认为值得支持。
英文摘要
The broader impact/commercial potential of this I-Corps project provides real-time measurements to optimize yield and reduce waste in novel roll-to-roll (R2R) manufacturing processes. The proposed high-speed technology can perform the critical non-contact, real-time measurements without interfering with high-speed R2R fabrication processes. Commonly used analytical tools use statistical analysis procedures; none of them can be implemented during real-time R2R fabrication systems due to their large-size and vacuum conditions. The proposed technology closes the gap between new fabrication processes and systems that measure in real time. This I-Corps project focuses on the commercialization of metrology technology for novel fabrication processes used in nano-technology products (e.g. nano-imprint lithography, roll-to-roll, and wafer-scale). The proposed in-line optical angular scatterometer provides real-time metrology without interfering with fabrication processes. Optical Angular Scatterometry offers enough resolution to characterize structures down to approximately 20 nm and 24 nm (pitch size) for pattern metallic and photoresist nanostructures. Projections of sensitivity show enough resolution and sensitivity for dimensions down to approximately 10 nm. The proposed scatterometer system has been demonstrated on a moving substrate at a speed of 50 cm/s, well above currently projected roll-to-roll manufacturing speeds. Various 1D, 2D, and 3D patterns have been studied in good agreement with both static off-line scatterometers and SEM measurements.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
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