MRI: Acquisition of a Next Generation Nanofabrication Dual-beam Platform

MRI：获取下一代纳米加工双光束平台

• 批准号: 2117609
• 负责人: James LeBeau
• 金额: $ 69.9万
• 依托单位: Massachusetts Institute of Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2021
• 资助国家: 美国
• 起止时间: 2021-09-01 至 2023-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2117609&HistoricalAwards=false
• 关键词: MRI; Acquisition; Next; Generation; Nanofabrication

Nontechnical description:This Major Research Instrumentation award supports the acquisition of a next-generation dual-beam nanofabrication platform for rapid prototyping of materials and devices that enable quantum computing, next-generation electronics, and the study of novel soft/hard matter systems. This instrument enhances intellectual output by empowering researchers to make new nanoscale devices and to modify materials, with greatly improved fidelity and reproducibility, which are needed to bridge the gap between fundamental science and engineering. The tool enables research through its novel ability to fabricate structures with various liquid metals and is paired with scanning electron microscopy for dynamic inspection of the fabrication process. Furthermore, the integration of an ultra-precise stage will provide wafer scale stitching-error-free continuous writing of large-device structures that was previously not possible. Also, the equipped nanomanipulator can be used to test circuits immediately after fabrication and adjust the patterning process accordingly. The instrument will be included in several ongoing activities, where K-12 students can experience scientific instrumentation first-hand. For example, because traditional approaches to bring new students into science have only been partially successful, the centerpiece of the educational outreach program targets young students and the public by stimulating interest in science through the visual arts using nanofabrication inspired by morpho butterflies. With the broad spectrum of materials and systems that can be studied with the instrument, the acquisition will impact research across departments at MIT and the New England region.Technical Description:Direct nanoscale fabrication methods have led to dramatic advancements in the development of new devices, modification of surfaces, and the integration of novel or dissimilar materials. Advances in focused ion beams (FIBs) formed from liquid metal alloy ion sources (LMAIS), in particular, have great expanded direct-write capacities, and can now be exploited for the nanofabrication of nanoplasmonics, fiber-tip optics, quantum devices, electron/x-ray optics. In contrast with Ga-only FIB instruments, the LMAIS provides Si, Ge, or Au beams, which can be used for milling of material with the smallest possible linewidth as well as implanting qubits at targeted locations without the need for masks or pre-processing. This patterning precision is enhanced by simultaneous field emission scanning electron microscopy imaging for in situ fabrication inspection, the inclusion of gas injection sources (Pt, C) for patterning and sample protection, a laser interferometer stage for ultra-precise positioning, wafer scale stitching-error-free continuous writing, a nanomanipulator, and electron beam lithography capabilities. This instrument will thus accelerate intellectual output by empowering researchers to make new, nanoscale devices and modify materials, with greatly improved fidelity and reproducibility, which are needed to bridge the gap between fundamental science and engineering. In terms of research accessibility, the microscopy will be managed by Characterization.nano, a shared experimental facility, which is part of the newly built MIT.nano center. This centrally located facility functions as a cross pollination hub and brings together expertise in nanofabrication, electron microscopy, teaching, and maintenance. This open access center serves local internal and external users, providing training and hands-on usage of the instruments, and is open to researchers across the nation.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

非技术描述：该主要研究仪器奖支持采购下一代双光束纳米制造平台，用于材料和器件的快速原型设计，从而实现量子计算、下一代电子产品和新型软/硬物质系统的研究。这台仪器通过使研究人员能够制造新的纳米级设备和修改材料来提高智力产出，大大提高了保真度和可重复性，这是弥合基础科学和工程之间差距所需要的。该工具通过其新颖的能力来制造各种液态金属的结构，并与扫描电子显微镜配对，用于动态检查制造过程，从而实现研究。此外，超精密平台的集成将提供晶圆级缝合-无错误连续写入大型器件结构，这在以前是不可能的。此外，所配备的纳米机械臂可以在制作完成后立即对电路进行测试，并相应地调整图案工艺。该仪器将包括在几个正在进行的活动中，在那里K-12学生可以亲身体验科学仪器。例如，由于传统的引导新生进入科学领域的方法只取得了部分成功，教育推广计划的核心目标是年轻学生和公众，通过视觉艺术激发他们对科学的兴趣，这种视觉艺术使用的是受大翅蝶启发的纳米制造。由于该仪器可以研究广泛的材料和系统，此次收购将影响麻省理工学院和新英格兰地区各部门的研究。技术描述：直接的纳米级制造方法在新设备的开发、表面的修饰以及新颖或不同材料的集成方面取得了巨大的进步。特别是由液态金属合金离子源（LMAIS）形成的聚焦离子束（FIBs）的进展，具有极大的扩展直接写入能力，现在可以用于纳米等离子体、光纤尖端光学、量子器件、电子/x射线光学的纳米制造。与纯ga FIB仪器相比，LMAIS提供Si， Ge或Au光束，可用于铣削具有最小线宽的材料，以及在目标位置植入量子比特，而无需掩模或预处理。通过同步场发射扫描电子显微镜成像，用于原位制造检查，包含气体注入源（Pt， C），用于图案和样品保护，用于超精确定位的激光干涉仪平台，晶圆尺度缝合无误差连续写入，纳米操纵器和电子束光刻功能，可以提高这种图案的精度。因此，这台仪器将加速知识产出，使研究人员能够制造新的纳米级设备和修改材料，并大大提高保真度和可重复性，这是弥合基础科学和工程之间差距所必需的。在研究可及性方面，显微镜将由表征管理。这是一个共享的实验设施，是新建的麻省理工学院的一部分。纳米中心。这个位于中心的设施作为一个交叉授粉中心，汇集了纳米制造、电子显微镜、教学和维护方面的专业知识。这个开放访问中心为当地的内部和外部用户服务，提供仪器的培训和实际使用，并向全国的研究人员开放。该奖项反映了美国国家科学基金会的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。