DFG-RSF: Beryllium based multilayer optics for the EUV spectral range

DFG-RSF:适用于 EUV 光谱范围的铍基多层光学器件

基本信息

项目摘要

At our synchrotron radiation facility BESSY-II recently a new At-Wavelength Metrology Station has been set into operation with which optical components for soft x-ray radiation can be measured at their design wavelength. This station incorporates our 20 years of expertise in soft x-ray optics and technology and it has a cutting-edge performance with respect to its measuring capabilities. The At-Wavelength characterization technique is indispensable in particular for multilayer optical elements of which the optical performance is strongly wavelength-dependent. Such information cannot be obtained by any other method. We want to use this facility to develop a novel kind of multilayer optics with promising performance in the range of EUV radiation and beyond. In this project we want to cooperate with one of the world's largest multilayer facility at the Institute for Physics of Microstructure in Nizhny Novgorod (IPM-RAS) with which we have cooperated successfully since more than two decades. This institute will produce Beryllium-containing multilayers (Al/Be, Ru/Be, Mo/Be, Mg/Be,...) applying various sputter- and ion-beam assisted techniques of atomic engineering to provide smooth layers and sharp interfaces with negligible interdiffusion. Laboratory techniques such as AFM, Cu k-alpha diffractometry etc. will be applied for standard performance tests, while their final performance is characterized with synchrotron radiation by At-Wavelength Metrology, Resonant Reflectivity and Reflection-NEXAFS at the absorption edges of the constituting atoms for depth-selected chemical and elemental analysis. There are many applications of such multilayer structures, which will exceed the performance of existing ones (Mo/Si), for instance for the next generation of EUV nanolithography or for solar astronomy. Our interest in such a multilayer optics is twofold: (1) We want to develop new Be-ML optics with high reflectivity for polarization steering and control. (2) Since we are able to manufacture high-precision blazed gratings, we want to apply a multilayer coating on top of a grating. The diffraction efficiency then can be increased considerably. After successful demonstration of the Be-multilayer performance a large grating is planned to be coated with such a novel multilayer and implemented into a beamline at BESSY II.
在我们的同步辐射设施BESSY-II,最近一个新的波长计量站已经投入使用,可以在其设计波长处测量软X射线辐射的光学元件。该工作站结合了我们在软X射线光学和技术方面20年的专业知识,在测量能力方面具有领先的性能。在波长表征技术是必不可少的,特别是多层光学元件的光学性能是强烈的波长依赖性。这些信息无法通过任何其他方法获得。我们希望利用该设备开发一种新型的多层光学器件,在EUV辐射范围内及更远的范围内具有良好的性能。在这个项目中,我们希望与下诺夫哥罗德微观结构物理研究所(IPM-RAS)的世界上最大的多层膜设备之一合作,我们已经成功合作了二十多年。该研究所将生产含铍多层膜(Al/Be,Ru/Be,Mo/Be,Mg/Be,.)应用原子工程的各种溅射和离子束辅助技术以提供具有可忽略的相互扩散的光滑层和尖锐界面。原子力显微镜(AFM)、铜k-alpha衍射法等实验室技术将用于标准性能测试,而其最终性能将通过同步辐射波长计量、共振反射率和反射-NEXAFS在组成原子的吸收边缘进行表征,用于深度选择化学和元素分析。这种多层结构有许多应用,其性能将超过现有结构(Mo/Si),例如用于下一代EUV纳米光刻或太阳天文学。我们对这种多层膜光学器件的兴趣是双重的:(1)我们希望开发新的具有高反射率的Be-ML光学器件,用于偏振转向和控制。(2)由于我们能够制造高精度闪耀光栅,我们希望在光栅顶部应用多层涂层。这样,衍射效率可以显著提高。在成功演示了Be多层膜的性能之后,计划在BESSY II上用这种新型多层膜涂覆一个大光栅,并将其应用到光束线中。

项目成果

期刊论文数量(9)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films
  • DOI:
    10.1016/j.surfcoat.2017.01.023
  • 发表时间:
    2017-02-15
  • 期刊:
  • 影响因子:
    5.4
  • 作者:
    Chkhalo, N. I.;Mikhailenko, M. S.;Zuev, S. Yu.
  • 通讯作者:
    Zuev, S. Yu.
Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
  • DOI:
    10.1364/oe.26.033718
  • 发表时间:
    2018-12
  • 期刊:
  • 影响因子:
    3.8
  • 作者:
    M. Svechnikov;N. Chkhalo;S. A. Gusev;A. N. Nechay;D. E. Pariev;A. Pestov;V. Polkovnikov;D. Tatarskiy;N. Salashchenko;F. Schäfers;M. Sertsu;A. Sokolov;Y. Vainer;M. Zorina
  • 通讯作者:
    M. Svechnikov;N. Chkhalo;S. A. Gusev;A. N. Nechay;D. E. Pariev;A. Pestov;V. Polkovnikov;D. Tatarskiy;N. Salashchenko;F. Schäfers;M. Sertsu;A. Sokolov;Y. Vainer;M. Zorina
Study of oxidation processes in Mo/Be multilayers
Mo/Be多层膜氧化过程的研究
  • DOI:
    10.1063/1.5007008
  • 发表时间:
    2018
  • 期刊:
  • 影响因子:
    1.6
  • 作者:
    A. N. Nechay;N. I. Chkhalo;M. N. Drozdov;S. A. Garakhin;D. E. Pariev;V. N. Polkovnikov;N. N. Salashchenko;M. V. Svechnikov;Yu. A. Vainer;E. Meltchakov;F. Delmotte
  • 通讯作者:
    F. Delmotte
Mo/Si Multilayer Mirrors with B4C and Be Barrier Layers
具有 B4C 和 Be 势垒层的 Mo/Si 多层反射镜
Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range.
适用于极紫外范围的铍基多层反射镜和滤光片
  • DOI:
    10.1166/jnn.2019.16474
  • 发表时间:
    2019
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Chkhalo Nikolay;Lopatin Alexey;Nechay Andrey;Pariev Dmitriy;Pestov Alexey;Polkovnikov Vladimir;Salashchenko Nikolay;Schäfers Franz;Sertsu Mewael;Sokolov Andrey;Svechnikov Mikhail;Tsybin Nikolay;Zuev Sergey
  • 通讯作者:
    Zuev Sergey
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Dr. Andrey Sokolov其他文献

Dr. Andrey Sokolov的其他文献

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