DFG-RSF: Beryllium based multilayer optics for the EUV spectral range
DFG-RSF: Beryllium based multilayer optics for the EUV spectral range
批准号:
310360704
负责人:
Dr. Andrey Sokolov
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2016
资助国家:
德国
项目状态:
已结题
起止时间:
2015-12-31 至 2019-12-31
中文摘要
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英文摘要
At our synchrotron radiation facility BESSY-II recently a new At-Wavelength Metrology Station has been set into operation with which optical components for soft x-ray radiation can be measured at their design wavelength. This station incorporates our 20 years of expertise in soft x-ray optics and technology and it has a cutting-edge performance with respect to its measuring capabilities. The At-Wavelength characterization technique is indispensable in particular for multilayer optical elements of which the optical performance is strongly wavelength-dependent. Such information cannot be obtained by any other method. We want to use this facility to develop a novel kind of multilayer optics with promising performance in the range of EUV radiation and beyond. In this project we want to cooperate with one of the world's largest multilayer facility at the Institute for Physics of Microstructure in Nizhny Novgorod (IPM-RAS) with which we have cooperated successfully since more than two decades. This institute will produce Beryllium-containing multilayers (Al/Be, Ru/Be, Mo/Be, Mg/Be,...) applying various sputter- and ion-beam assisted techniques of atomic engineering to provide smooth layers and sharp interfaces with negligible interdiffusion. Laboratory techniques such as AFM, Cu k-alpha diffractometry etc. will be applied for standard performance tests, while their final performance is characterized with synchrotron radiation by At-Wavelength Metrology, Resonant Reflectivity and Reflection-NEXAFS at the absorption edges of the constituting atoms for depth-selected chemical and elemental analysis. There are many applications of such multilayer structures, which will exceed the performance of existing ones (Mo/Si), for instance for the next generation of EUV nanolithography or for solar astronomy. Our interest in such a multilayer optics is twofold: (1) We want to develop new Be-ML optics with high reflectivity for polarization steering and control. (2) Since we are able to manufacture high-precision blazed gratings, we want to apply a multilayer coating on top of a grating. The diffraction efficiency then can be increased considerably. After successful demonstration of the Be-multilayer performance a large grating is planned to be coated with such a novel multilayer and implemented into a beamline at BESSY II.
期刊论文(9)
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DOI:
10.1016/j.surfcoat.2017.01.023
发表时间:
2017-02-15
期刊:
SURFACE & COATINGS TECHNOLOGY
影响因子:
5.4
作者:
[Chkhalo, N. I., Mikhailenko, M. S., Zuev, S. Yu.]
通讯作者:
Zuev, S. Yu.
DOI:
10.1364/oe.26.033718
发表时间:
2018-12
期刊:
Optics express
影响因子:
3.8
作者:
[M. Svechnikov;N. Chkhalo;S. A. Gusev;A. N. Nechay;D. E. Pariev;A. Pestov;V. Polkovnikov;D. Tatarskiy;N. Salashchenko;F. Schäfers;M. Sertsu;A. Sokolov;Y. Vainer;M. Zorina]
通讯作者:
M. Svechnikov;N. Chkhalo;S. A. Gusev;A. N. Nechay;D. E. Pariev;A. Pestov;V. Polkovnikov;D. Tatarskiy;N. Salashchenko;F. Schäfers;M. Sertsu;A. Sokolov;Y. Vainer;M. Zorina
Study of oxidation processes in Mo/Be multilayers
Mo/Be多层膜氧化过程的研究
DOI:
10.1063/1.5007008
发表时间:
2018
期刊:
AIP Advances
影响因子:
1.6
作者:
[A. N. Nechay, N. I. Chkhalo, M. N. Drozdov, S. A. Garakhin, D. E. Pariev, V. N. Polkovnikov, N. N. Salashchenko, M. V. Svechnikov, Yu. A. Vainer, E. Meltchakov, F. Delmotte]
通讯作者:
F. Delmotte
Mo/Si Multilayer Mirrors with B4C and Be Barrier Layers
具有 B4C 和 Be 势垒层的 Mo/Si 多层反射镜
DOI:
10.1134/s1027451019020216
发表时间:
2019
期刊:
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
影响因子:
--
作者:
[S. Yu. Zuyev, D. E. Pariev, R. S. Pleshkov, V. N. Polkovnikov, N. N. Salashchenko, M. V. Svechnikov, M. G. Sertsu, A. Sokolov, N. I. Chkhalo, F. Schäfers]
通讯作者:
F. Schäfers
Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range.
适用于极紫外范围的铍基多层反射镜和滤光片
DOI:
10.1166/jnn.2019.16474
发表时间:
2019
期刊:
Journal of nanoscience and nanotechnology
影响因子:
--
作者:
[Chkhalo Nikolay, Lopatin Alexey, Nechay Andrey, Pariev Dmitriy, Pestov Alexey, Polkovnikov Vladimir, Salashchenko Nikolay, Schäfers Franz, Sertsu Mewael, Sokolov Andrey, Svechnikov Mikhail, Tsybin Nikolay, Zuev Sergey]
通讯作者:
Zuev Sergey
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