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Mechanically tunable conductivity in piezoelectric semiconductors

Mechanically tunable conductivity in piezoelectric semiconductors
压电半导体中的机械可调电导率
批准号:
317658731
负责人:
Professor Dr. Hans-Joachim Kleebe
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2016
资助国家:
德国
项目状态:
已结题
起止时间:
2015-12-31 至 2020-12-31

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中文摘要
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英文摘要
The unique electrical properties in varistors and diodes rely on doping and interfacial potential barriers which are permanently implemented into the device. Here we provide a fundamentally new approach, geared towards piezoelectric semiconductors in which an interfacial electrostatic potential barrier can be reversibly tuned through external mechanical stress. The concept is related to piezotronics that so far has been focused, however, on Schottky barriers in nanofibers and yielded only small changes of potential barrier heights.This novel concept is fundamentally investigated using ZnO as semiconductor with high piezoelectric coefficient. The focus will be on single (ZnO/metal) and double (ZnO/ZnO) Schottky barriers with well determined orientations utilizing ZnO single crystals. Tailoring is then afforded using grain conductivity of the ZnO, work function of the metal and interface states determined by grain boundary misorientation and interface dopants. The additional flexibility arises due to the application of interfacial stresses during electric loading. Electrical characterisations in collaboration with other projects will be on density of electron states and electron mobility, in terms of impedance spectroscopy and I V curves at different frequency and temperature. A special challenge lies in the dichotomy of stress-tuned interfacial charge and semiconductor conductivity-enticed charge screening. At the same time, this project will provide polycrystalline ZnO to aid validation of modelling projects and affords electromechanical characterisation of polarisation texture of ZnO.
期刊论文(7)
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会议论文
DOI: 10.1063/1.5131003
发表时间: 2020-01
期刊: Journal of Applied Physics
影响因子: 3.2
作者: [Daniel Bremecker;P. Keil;M. Gehringer;Daniel Isaia;J. Rödel;T. Frömling]
通讯作者: Daniel Bremecker;P. Keil;M. Gehringer;Daniel Isaia;J. Rödel;T. Frömling
DOI: 10.1002/adma.201705573
发表时间: 2018-03-08
期刊: ADVANCED MATERIALS
影响因子: 29.4
作者: [Keil, Peter, Trapp, Maximilian, Roedel, Juergen]
通讯作者: Roedel, Juergen
DOI: 10.1063/1.5109666
发表时间: 2019-11
期刊: Journal of Applied Physics
影响因子: 3.2
作者: [Zi-Qi Zhou;K. A. Taylor;E. Gjonaj;T. Frömling;Bai-Xiang Xu]
通讯作者: Zi-Qi Zhou;K. A. Taylor;E. Gjonaj;T. Frömling;Bai-Xiang Xu
DOI: 10.1016/j.actamat.2018.10.008
发表时间: 2019-01-01
期刊: ACTA MATERIALIA
影响因子: 9.4
作者: [Novak, Nikola, Keil, Peter, Roedel, Juergen]
通讯作者: Roedel, Juergen
6
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    Design of Novel Buffer Layers for Excellent Performance UHTCs; Investigation of Diffusion Mechanisms
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    国内基金
    海外基金
    多带隙可调电磁带隙结构材料的制备与机理研究
    • 批准号:
      50572085
    • 项目类别:
      面上项目
    • 资助金额:
      26.0万元
    • 批准年份:
      2005
    • 负责人:
      汪宏
    • 依托单位: