Controlling of Single Photon Source in Silicon Carbide

碳化硅中单光子源的控制

基本信息

  • 批准号:
    24656025
  • 负责人:
  • 金额:
    $ 2.58万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
  • 财政年份:
    2012
  • 资助国家:
    日本
  • 起止时间:
    2012-04-01 至 2014-03-31
  • 项目状态:
    已结题

项目摘要

In order to find new defects which act as single photon sources in Silicon Carbide (SiC), semi-insulating SiC wafers were irradiated with 2 MeV electrons and subsequently annealed in Argon at temperature ranges between 300 and 500 C. As a results, in addition to luminescence from Si vacancies (Vsi) which have been reported as single photon source in SiC, the very strong luminescence at wavelength regions between 670 and 700 nm were observed even at room temperature. By the photo luminescence measurements at low temperature, it was concluded that the origin of those luminescence is positively charged carbon antisite – carbon vacancy pair (CsiVc). Also, it was revealed from antibunching measurements using a confocal microscope that CsiVc act as single photon source in SiC.
In order to find new defects which act as single photon sources in SiC, semi-insulating SiC wavers were irradiated with 2 MeV electrons and subsequently annealed in Argon at temperature ranges between 300 and 500 C. As a result, in addition to luminescence from Sivacancies (Vsi) which have been reported as single photon source in SiC, the very strong luminescence at wavelength regions between 670 and 700 nm They were即使在室温下也观察到。通过在低温下的照片发光测量结果,可以得出结论,这些发光的起源是带正电荷的碳反岩 - 碳空位对(CSIVC)。同样,使用共聚焦显微镜从抗挑战测量中揭示了它,即CSIVC充当SIC中的单个光子源。

项目成果

期刊论文数量(5)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Optically Active Defect Centres in Silicon Carbide Devices
碳化硅器件中的光学活性缺陷中心
  • DOI:
  • 发表时间:
    2014
  • 期刊:
  • 影响因子:
    0
  • 作者:
    B.C. Johnson;N. Iwamoto;S. Castelletto;S. Onoda;T. Ohshima;T. Karle and J. C. McCallum
  • 通讯作者:
    T. Karle and J. C. McCallum
Fabrication of Single Photon Centres in Silicon Carbide
碳化硅中单光子中心的制造
A silicon carbide room-temperature single-photon source
  • DOI:
    10.1038/nmat3806
  • 发表时间:
    2014-02-01
  • 期刊:
  • 影响因子:
    41.2
  • 作者:
    Castelletto, S.;Johnson, B. C.;Ohshima, T.
  • 通讯作者:
    Ohshima, T.
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OHSHIMA Takeshi其他文献

OHSHIMA Takeshi的其他文献

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{{ truncateString('OHSHIMA Takeshi', 18)}}的其他基金

Control of Photons and Spins of High-Brightness Single Photon Center in Silicon Carbide
碳化硅中高亮度单光子中心的光子和自旋控制
  • 批准号:
    26286047
  • 财政年份:
    2014
  • 资助金额:
    $ 2.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Mechanism of the Destruction of Oxide on Silicon Carbide due to ChargeInduced by Ion Beams
离子束诱导电荷破坏碳化硅氧化物的机理
  • 批准号:
    21360471
  • 财政年份:
    2009
  • 资助金额:
    $ 2.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Induced Charge Evaluation for the Development of Particle Detectors Fabricated on Silicon Carbide
碳化硅颗粒探测器开发的感应电荷评估
  • 批准号:
    18360458
  • 财政年份:
    2006
  • 资助金额:
    $ 2.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)

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S-adic平铺的绝对连续衍射和动力学光谱研究
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用于半导体量子位形成的纳米级确定性单离子注入
  • 批准号:
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  • 财政年份:
    2022
  • 资助金额:
    $ 2.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
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