Making device functions on microtrench sidewall through three-dimensional photolithograpy

采用三维光刻技术制备了一种新型微机电系统（MEMS）器件。本研究的MEMS器件为颗粒分选器。该分选机利用静电力和流体流动来分离液体中的颗粒。为了提高静电强度，在微沟槽侧壁上设计了工作电极。由于侧壁尚未用于展示器件功能，因此这里的方法将是扩大MEMS器件可能性的重要一步。三维光刻包括用于在微沟槽上均匀沉积光刻胶的光刻胶喷涂涂层和用于在沟槽侧壁上进行图像化的角度曝光。通过数值模拟，提高了喷涂光刻胶膜的均匀性。数值模拟还应用于微流控通道的设计。通过精心的器件设计和三维光刻技术，在玻璃基板上制备了颗粒分选装置。

A novel micro-electro-mechanical systems (MEMS) device was fabricated through three-dimensional (3D) photolithography. The MEMS device in the present study was a particle sorter. The sorter uses electrostatic force and fluid flow for separating particles in a liquid. To enhance the electrostatic force, the working electrodes were designed on the microtrench sidewall. Since the sidewalls have not been used to exhibit device functions, the approach here would be a great step to expand the possibility of MEMS devices. The 3D photolithography consists of photoresist spray-coating for uniform photoresist deposition on the microtrench and angled exposure for patterning the trench sidewall. Through the numerical simulation, the uniformity of spray-coated photoresist film was improved. The numerical simulation was also applied to designing the microfluidics channels. With the careful device design and the 3D photolithography, the particle sorter devices were fabricated on a glass substrate.