Making device functions on microtrench sidewall through three-dimensional photolithograpy

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A novel micro-electro-mechanical systems (MEMS) device was fabricated through three-dimensional (3D) photolithography. The MEMS device in the present study was a particle sorter. The sorter uses electrostatic force and fluid flow for separating particles in a liquid. To enhance the electrostatic force, the working electrodes were designed on the microtrench sidewall. Since the sidewalls have not been used to exhibit device functions, the approach here would be a great step to expand the possibility of MEMS devices. The 3D photolithography consists of photoresist spray-coating for uniform photoresist deposition on the microtrench and angled exposure for patterning the trench sidewall. Through the numerical simulation, the uniformity of spray-coated photoresist film was improved. The numerical simulation was also applied to designing the microfluidics channels. With the careful device design and the 3D photolithography, the particle sorter devices were fabricated on a glass substrate.