Formation of oxidation-resistant film on niobium based alloy using molten salt electrolysis

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The purpose of this study is determining optimum electrolytic condition by investigating the electrochemical behavior of ions in molten salt in order to form an oxidation-resistant silicide film on Nb based alloy using molten salt electrolysis. As a result, it is found that thick film forms with lower current density (10 mA cm-2 is the best in this study) at higher temperature (1173 K is the best in this study). The concentration of solute (silicone source) does not show significant effect. NbSi2 film with a thickness of 55 to 70 micron was successfully obtained in a certain condition.