Dusty plasmas with high electron depletion:Investigation of fundamental mechanisms and properties through particle and plasma diagnostics

该项目致力于研究纳米尘埃等离子体，其粒子数密度足够高，足以显著影响整个等离子体的性质。由于粒子的高负电荷，电子被强烈耗尽，等离子体从三组分的尘埃-离子-电子等离子体转变为两组分的尘埃-离子等离子体。纳米粒子在等离子体中的带电是关键特性--全面了解所涉及的过程对于基础等离子体物理研究和等离子体技术都是至关重要的。Havnes参数P提供了介于P=0(未耗尽)和P→∞(完全电子耗尽)之间的电子耗尽程度的量度。在这个项目中，我们将·创建具有非常高Havnes参数的纳米尘埃实验室等离子体(P&gT；100)·使用尘埃密度波诊断技术来表征这些等离子体·通过光学薄云和厚云的光散射技术开发纳米颗粒尺寸和密度分布的原位诊断方法·通过非原位显微镜验证原位诊断方法，以及·为技术应用开发新的光散射诊断方法第一次，具有高Havnes参数的实验室等离子体将被深入表征。对纳米粒子生长的新认识，以及对纳米粒子在等离子体中生长和限制机制的认识，将对基础等离子体物理和未来的等离子体技术应用都具有重要意义。

This project is dedicated to the investigation of a nanodusty plasma with a particle number density that is sufficiently high to significantly affect the properties of the whole plasma. Due to the high negative charging of the particles, electrons are strongly depleted and the plasma changes its state from a three-component dust-ion-electron plasma to a two-component dust-ion plasma. The charging of the nanoparticles in the plasma is the key property – a comprehensive understanding of the processes involved is essential for both fundamental plasma physics research and plasma technology. The Havnes parameter P provides a measure for the degree of electron depletion between P = 0 (no depletion) and P → ∞ (complete electron depletion). In this project we will• Create nanodusty laboratory plasmas with very high Havnes-Parameter ( P > 100)• Characterize these plasmas using the dust-density wave diagnostics• Develop in-situ diagnostics of the nanoparticle size and density profile by means of light scattering techniques for both optically thin and thick clouds• Verify the in-situ diagnostics by ex-situ microscopy, and• Develop new light scattering diagnostics for technical applicationsFor the first time, laboratory plasmas with a high Havnes parameter will be characterized in depth. The new insight into the growth of nanoparticles and the knowledge about the mechanisms of growth and confinement of nanoparticles in a plasma will be of importance for both basic plasma physics and future plasma technological applications.