Negative Ion Source for the Measurement of Plasma Potential by a Heavy Ion Probe

用于通过重离子探针测量等离子体电势的负离子源

• 批准号: 01460249
• 负责人: FUJITA Junji
• 金额: $ 2.69万
• 依托单位: National Institute for Fusion Science (NIFS)
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1989
• 资助国家: 日本
• 起止时间: 1989 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-01460249/
• 关键词: negative ion source; negative ion; sputtering; gold; work function; plasma potential; heavy ion; ビ-ムプロ-ブ; ポテンシャル計測

A Heavy Ion Beam Probe (HIBP) has been used as a reliable method to determine the local plasma potential, and to study the potential and density fluctuations. However, the required beam energy increases up into the MeV region for recent big devices, such as the Large Helical Device. A HIBP based on a negative heavy ion source is attractive because of the possibility of neutral beam injection or Tandem beam acceleration. In this work, we have studied the production mechanism of negative ions in a plasma sputtering type source in order to get a continuous beam with a maximum current density. A new technique to measure the work function of the negative ion production surface has been developed and correlation of the work function to the production efficiency was investigated. We have measured the energy spectrum of the beam at the exit of the ion source, and the spread was less than 10 eV for the sputtering energy less than 300 eV. It is small enough for the high quality fluctuation measurement. A computer code to simulate the beam extraction and beam optic system was developed. A compact ion source was also constructed and the beam optics was studied experimentally.

重离子束探针（HIBP）作为一种可靠的测量等离子体局部电位的方法，研究了等离子体的电位和密度波动。然而，对于最近的大型装置，如大型螺旋装置，所需的光束能量增加到MeV区域。由于中性束注入或串联束加速的可能性，基于负重离子源的HIBP具有吸引力。在本工作中，我们研究了在等离子溅射型源中负离子的产生机制，以获得具有最大电流密度的连续光束。提出了一种测量负离子生产表面功函数的新方法，并对功函数与生产效率的关系进行了研究。我们测量了离子源出口激光束的能谱，当溅射能量小于300 eV时，扩散小于10 eV。它足够小，可以进行高质量的波动测量。开发了模拟光束提取和光束光学系统的计算机程序。构建了紧凑型离子源，并对光束光学进行了实验研究。

项目成果

Y.Okabe, M.Sasao, J.Fujita, M.Wada, H.Yamaoka,: "Energy Distribution of SelfーExtracted Au^ー beam from a PlasmaーSputter Type Negative Ion Source" Japanese Journal of Applied Physics.(1991)

Y.Okabe、M.Sasao、J.Fujita、M.Wada、H.Yamaoka，：“来自等离子体溅射型负离子源的自提取 Au^- 束的能量分布”日本应用物理学杂志。（1991 年） ）

Y.Okabe,M.Sasao,J.Fujita,M.Wada,H.Yamaoka,: "Energy Distribution of SelfーExtrcted Au^ー beam from a PlasmaーSputter Type Negative Ion Source" Japanese Journal of Applied Physics.(1991)

Y.Okabe、M.Sasao、J.Fujita、M.Wada、H.Yamaoka，：“来自等离子体溅射型负离子源的自提取 Au^- 束的能量分布”日本应用物理学杂志。（1991 年） ）

Y. OKABE, M. SASAO, J. FUJITA, M. WADA, and H. YAMAOKA: "Characteristics of Au^- Production in a Plasma sputter Negative Ion Source" Proceedings of 13-th and Symposium on Ion Sources and Ion-assisted Technology. 109-112 (1990)

Y. OKABE、M. SASAO、J. FUJITA、M. WADA 和 H. YAMAOKA：“等离子溅射负离子源中 Au^- 生产的特性”第 13 届会议论文集及离子源和离子辅助研讨会

Y. OKABE, M. SASAO, J. FUJITA, M. WADA, and H. YAMAOKA: "Dependence of Au^- Production upon the Target Work Function in a Plasma-Sputter Type Negative Ion Source" Japanese Journal of Applied Physics.

Y. OKABE、M. SASAO、J. FUJITA、M. WADA 和 H. YAMAOKA：“等离子溅射型负离子源中 Au^- 产生对目标功函数的依赖性”日本应用物理学杂志。

岡部、山岡、笹尾、藤田、和田、: "「Au^ー表面生成と引き出されたAu^ーエネルギ-幅測定」" プラズマ・核融合学会第6回秋季講演子稿集. 121-121 (1989)

Okabe、Yamaoka、Sasao、Fujita、Wada：“‘Au^-表面生成和提取的 Au^-能量宽度测量’”日本等离子体与聚变科学学会第六届秋季讲座论文集 121-121 (1989)。