Study on the growth of large scale bulk group III nitrides on silicon substrates

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In this study, (1) large scale GaN will be grown on Si substrate by OMVPE or MBE,and (2) thick GaN will be grown on these GaN by HVPE.Results of this study can be summarized as follows,(1)Growth of GaN on Si by OMVPEAIN inititation layr before the growth of GaN should be grown at high temperature of about 1,100ﾟC.Transition due to the exciton can be clearly observed by modulation spectroscopy even at room temperature for the first time. GaN on si is found to be stressed under tensile strain.(2)HVPE/OMVPE Hybrid systemHVPE/OMVPE hybrid growth system has been established. At first, thin GaN was grown on sapphire by OMVPE using low temperature deposited GaN buffer layr. Then, thick GaN was grown on these OMVPE-grown GaN by HVPE.By using this sequence, high quality GaN can be reproducibly grown.