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A new defect-control approach for mismatched heteroepitaxy semiconductors

A new defect-control approach for mismatched heteroepitaxy semiconductors
失配异质外延半导体的新缺陷控制方法
批准号:
DP160103433
负责人:
Prof Xiaojing Hao
金额:
$18.92万
依托单位国家:
澳大利亚
项目类别:
Discovery Projects
财政年份:
2016
资助国家:
澳大利亚
项目状态:
已结题
起止时间:
2016-01-05 至 2019-11-30

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中文摘要
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英文摘要
This project aims to develop a new defect-control approach for silicon-germanium heteroepitaxial semiconductor systems to provide a route for high-throughput, low-cost, high-efficiency silicon tandem solar cells. Mismatched heteroepitaxy of semiconductors is of considerable interest for fabricating novel devices. However, the use of highly-mismatched heteroepitaxial semiconductors has been limited due to the high densities of crystal defects which degrade the performance of both majority and minority carrier devices. This project aims to develop a new defect-control approach for heteroepitaxial semiconductors by continuous wavelength diode laser processing. With heteroepitaxial silicon-germanium as an example, the project will investigate the mechanism underlying defect-cleaning, optimised designs for best performance, and designs for high-efficiency tandem solar cells.
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