VACUUM ULTRAVIOLET LASERS BY RARE GAS CLUSTERS EXCITATION

稀有气体团簇激发真空紫外激光器

• 批准号: 06452205
• 负责人: SASAKI Wataru
• 金额: $ 4.29万
• 依托单位: MIYAZAKI UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06452205/
• 关键词: VUV light source; Rare gas excimer; Rare gas cluster; Discharge excitation; Lithography light source

We have proposed that a method for formation of rare gas excimers by a discharge excitation of rare gas clusters which were generated in super sonic gas jet. This method has been proved experimentally by our research group in 1993, which was supported by Grant-in-Acid for Scientific Research (C).Purposes of this project is to establish further progresses of VUV light sources using supper sonic gas jet discharges. Obtained results are as follows :1. High output power of 9.1 mW at 126 nm for Ar, 300 mW at 147 nm for Kr and 500 mW at 172 nm for Xe were obtained, respectively.2. The output power was increased by 2.4 times with applying magnetic fields parallel to electric field in the discharge.3. Very wide VUV spectral region from 100 nm to 200 nm can be covered by using three kinds of rare gases, Ar, Kr and Xe.4. Jet excimer lamps would be suitable as a lithography light source of for semiconductor processing.5. Jet excimer lamps can be used for optical machining of some plastic materials.As a consequence jet excimer lamps have potentialities for many practical applications such as semiconductor processing, photo-chemical processing of plastic meterials and so on.

提出了一种利用超音速气体射流中产生的稀有气体团簇放电激发形成稀有气体准分子的方法。本课题组在1993年获得了国家科学研究基金（C）的资助，并在实验上验证了这种方法。主要研究结果如下：1.在126 nm、147 nm和172 nm分别获得了9.1 mW、300 mW和500 mW的高功率输出.在放电过程中施加平行于电场方向的磁场，输出功率提高了2.4倍.采用Ar、Kr和Xe三种稀有气体可以覆盖100 ~ 200 nm的宽光谱范围.射流准分子灯适合作为半导体加工的光刻光源.射流准分子灯可用于塑料材料的光学加工，因此在半导体加工、塑料材料的光化学加工等方面有着广泛的应用前景。

项目成果

Masahito Katto: "Electron beam pumped argon-excimer laser using an unstable resonator" IEEE J. Select. Topics Quantum Electron.Vol.1,♯3. 924-930 (1995)

Masahito Katto：“使用不稳定谐振器的电子束泵浦氩准分子激光器”IEEE J. Selectics Quantum Electron.Vol.1，♯3 (1995)。

Junji Kawanaka: "New xenon excimer lamps excited by quasi-cw jet discharges" IEEE J.Select.Topics Quantum Electron.1. 852-858. (1995)

Junji Kawanaka：“由准连续射流放电激发的新型氙准分子灯”IEEE J.Select.Topics Quantum Electron.1。

佐々木 亘: "新しいエキシマ光源とその将来" レーザー研究. 23. 1056-1067. (1995)

Wataru Sasaki：“新准分子光源及其未来”激光研究。23。1056-1067（1995）。

Kazuo Nakamae: "Surface alternation of amorphous Si_3N_4 films by ArF excimer laser irradiation" Jpn.J.Appl.Phys.34. L1482-L1485. (1995)

Kazuo Nakamae：“通过 ArF 准分子激光照射非晶 Si_3N_4 薄膜的表面交替”Jpn.J.Appl.Phys.34。

M.Honnda,S.Kubodera,J.Kawanaka,W.Sasaki: "無声放電励起真空紫外希ガスエキシマランプの開発" 宮崎大学工学部研究報告. 41(印刷中). (1995)

M.Honnda、S.Kubodera、J.Kawanaka、W.Sasaki：“静音放电激发真空紫外稀有气体准分子灯的开发”宫崎大学工程学院研究报告（1995 年）。