Development of vacuum-ultraviolet photo-induced cleaning device by use of a rare-gas excimer lamp

本研究的主要目的是利用真空紫外线(VUV)稀有气体准分子灯研制一种光致清洁装置。在过去三年的研究中，我取得了以下成果。[1]大功率雷加斯准分子灯的发展：这是本研究的核心。通过对稀有气体准分子灯器件的电极结构和电源进行优化，获得了大于1 mW/cm2126 nm的输出功率密度，这是在如此短的波长发射源中的领先数据。我还成功地简化了设备的真空处理系统。[2]超干工艺：利用[1]中开发的设备，我成功地在硅片上进行了光诱导腐蚀氧化层，而不使用任何反应气体。该装置还可用于金属涂层的光诱导清洗。各种聚合物的光学和表面变化。[3]VUV F2灯：除了Ar2*准分子灯在126 nm处，I…更多的人研究了157 nm的F2灯。尽管F2具有反应性，但通过优化气体处理和杂质分析，使稳定的长期运行成为可能。[4]干法：为了提高刻蚀处理速度，我使用了反应气体进行氧化层刻蚀。通过使用这种气体，速率增加了一个数量级以上，这将使这种方法成为现实。[5]相干VIJY发射源的开发：如上所述，使用非相干灯的光诱导过程非常有效，但不可避免地很慢。高功率的VUV光源会使速率提高几个数量级。因此，我利用光场诱导电离过程中产生的电子，开发了一种高功率相干126 nm发射。首次观测到小信号增益系数为0.05/cm。[6]光诱导清洁装置的研制：基于上述科学和工程知识，我设计了一种紧凑型光诱导清洁装置。在宫崎骏大学(Nano Tech Photon Corp.)一家风险投资公司的帮助下，一个设计变成了一个真正的设备。较少

Main objective of this research was the development of a photo-induced cleaning device by use of a vacuum ultraviolet (VUV) rare gas excimer lamp. I have made the following accomplishments during last three-year research term.[1]Development of high-power raregas excimer lamps : This is a heart of present research. By optimizing the electrode configuration and power supply of a rare gas excimer lamp device, I have obtained an output power density of more than 1 mW/cm^2 126 nm, which is a champion data at such a short wavelength emission source. I was also successful to simplify vacuum handling system for the device.[2]Super dry, process : By use of the device developed in [1], I was successful to make a photo-induced etching of an oxidized layer on a silicon wafer without using any reactive gases. This device was also useful to make photo-induced cleaning of metal-coated. optics and surface alteration of various polymers.[3]VUV F2 lamp : In addition to the Ar2* excimer lamp at 126 nm, I … More have studied an F2 lamp at 157 nm. In spite of reactive nature of the F2, stable long-term operation was made possible by optimizing gas handling and impurity analysis.[4]Dry process : To increase the etching process rate, I have used a reactive gas for the oxidized layer etching. By use of this gas, the rate increased more than one order of magnitude, which would give this method reality.[5]Development of coherent VIJY emission source : As described above, the photo-induced process by use of incoherent lamps is very effective, but inevitably slow. High-power VUV light source would increase the rate orders of magnitude. I have thus developed a high-power coherent 126 nm emission by use of electrons produced by optical field induced ionization process. I. observed a small-signal gain coefficient of 0.05/cm for the first time.[6]Production of a photo-induced cleaning device : Based on the above scientific and engineering knowledge, I have designed a compact photo-induced cleaning device. With a help of a venture company originated from University of Miyazaki (Nano Tech Photon Corp.), a design became a real device. Less