Development of vacuum-ultraviolet photo-induced cleaning device by use of a rare-gas excimer lamp
Development of vacuum-ultraviolet photo-induced cleaning device by use of a rare-gas excimer lamp
批准号:
13555202
负责人:
KUBODERA Shoichi
金额:
$7.49万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2003
中文摘要
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英文摘要
Main objective of this research was the development of a photo-induced cleaning device by use of a vacuum ultraviolet (VUV) rare gas excimer lamp. I have made the following accomplishments during last three-year research term.[1]Development of high-power raregas excimer lamps : This is a heart of present research. By optimizing the electrode configuration and power supply of a rare gas excimer lamp device, I have obtained an output power density of more than 1 mW/cm^2 126 nm, which is a champion data at such a short wavelength emission source. I was also successful to simplify vacuum handling system for the device.[2]Super dry, process : By use of the device developed in [1], I was successful to make a photo-induced etching of an oxidized layer on a silicon wafer without using any reactive gases. This device was also useful to make photo-induced cleaning of metal-coated. optics and surface alteration of various polymers.[3]VUV F2 lamp : In addition to the Ar2* excimer lamp at 126 nm, I … More have studied an F2 lamp at 157 nm. In spite of reactive nature of the F2, stable long-term operation was made possible by optimizing gas handling and impurity analysis.[4]Dry process : To increase the etching process rate, I have used a reactive gas for the oxidized layer etching. By use of this gas, the rate increased more than one order of magnitude, which would give this method reality.[5]Development of coherent VIJY emission source : As described above, the photo-induced process by use of incoherent lamps is very effective, but inevitably slow. High-power VUV light source would increase the rate orders of magnitude. I have thus developed a high-power coherent 126 nm emission by use of electrons produced by optical field induced ionization process. I. observed a small-signal gain coefficient of 0.05/cm for the first time.[6]Production of a photo-induced cleaning device : Based on the above scientific and engineering knowledge, I have designed a compact photo-induced cleaning device. With a help of a venture company originated from University of Miyazaki (Nano Tech Photon Corp.), a design became a real device. Less
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Masanori Kaku, Takeshi Higashiguchi, Shoichi Kubodera, Wataru Sasaki: "Observation of vacuum-ultraviolet Ar2* radiation gain at 126 nm produced by an ultrashort high-intensity laser pulse propagating in a hollow fiber"Opt. Lett.. vol. 28, no. 10. 804-806
Masanori Kaku、Takeshi Higashiguchi、Shoichi Kubodera、Wataru Sasaki:“观察超短高强度激光脉冲在中空光纤中传播产生的 126 nm 真空紫外 Ar2* 辐射增益”
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通讯作者:
Takeshi Ohtsubo, Makoto Takaura, Teppei Azuma, Takeshi Higashiguchi, Shoichi Kubodera, Wataru Sasaki: "Removal of oxygen atoms from a SiO2 surface by incoherent vacuum ultraviolet excimer irradiation"Applied Physics A. vol. 76. 139-141 (2003)
Takeshi Ohtsubo、Makoto Takaura、Teppei Azuma、Takeshi Higashiguchi、Shoichi Kubodera、Wataru Sasaki:“通过非相干真空紫外准分子照射从 SiO2 表面去除氧原子”应用物理 A. 卷。
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Masanori Kaku, Takahiro Yamaura, Hidenori Kodama, Shoichi Kubodera, Wataru Sasaki: "Vacuum ultraviolet spectroscopic system using a laser-produced plasma"Proceedings of the Second Symposium on Advanced Photon Research (Kansai Establishment, Japan Atomic E
Masanori Kaku、Takahiro Yamaura、Hidenori Kodama、Shoichi Kubodera、Wataru Sasaki:“使用激光产生等离子体的真空紫外光谱系统”第二届高级光子研究研讨会论文集(关西机构、日本原子能研究中心)
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Takahiro Shirai: "Oscillation characteristics of discharge pumped VUV Kr excimer laser"Proceedings of SPIE. 5120. 227-230 (2003)
Takahiro Shirai:“放电泵浦 VUV Kr 准分子激光器的振荡特性”SPIE 论文集。
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Takahiro Shirai: "Oscillation characteristics of the discharge-pumped vacuum ultraviolet laser"Proceedings of APLS. 506-509 (2003)
Takahiro Shirai:“放电泵浦真空紫外激光器的振荡特性”APLS 论文集。
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共 67 条
Vacuum ultraviolet micro-laser produced in photo-excited high-pressure Kr
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批准号:24651103
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
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财政年份:2012
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负责人:KUBODERA Shoichi
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依托单位:
Development of a compact vacuum ultraviolet laser using a hollow fiber for plasma regulation and applications to photo-materials processing
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批准号:18360040
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$5.9万
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财政年份:2006
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负责人:KUBODERA Shoichi
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依托单位:
Soft X-ray Laser by Hybrid Excitation Method Using Laser Produced Multiple Charged Ions
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批准号:08650054
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.15万
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财政年份:1996
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负责人:KUBODERA Shoichi
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依托单位:
海外基金