Development of vacuum-ultraviolet photo-induced cleaning device by use of a rare-gas excimer lamp
稀有气体准分子灯真空紫外光致清洗装置的研制
基本信息
- 批准号:13555202
- 负责人:
- 金额:$ 7.49万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (B)
- 财政年份:2001
- 资助国家:日本
- 起止时间:2001 至 2003
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Main objective of this research was the development of a photo-induced cleaning device by use of a vacuum ultraviolet (VUV) rare gas excimer lamp. I have made the following accomplishments during last three-year research term.[1]Development of high-power raregas excimer lamps : This is a heart of present research. By optimizing the electrode configuration and power supply of a rare gas excimer lamp device, I have obtained an output power density of more than 1 mW/cm^2 126 nm, which is a champion data at such a short wavelength emission source. I was also successful to simplify vacuum handling system for the device.[2]Super dry, process : By use of the device developed in [1], I was successful to make a photo-induced etching of an oxidized layer on a silicon wafer without using any reactive gases. This device was also useful to make photo-induced cleaning of metal-coated. optics and surface alteration of various polymers.[3]VUV F2 lamp : In addition to the Ar2* excimer lamp at 126 nm, I … More have studied an F2 lamp at 157 nm. In spite of reactive nature of the F2, stable long-term operation was made possible by optimizing gas handling and impurity analysis.[4]Dry process : To increase the etching process rate, I have used a reactive gas for the oxidized layer etching. By use of this gas, the rate increased more than one order of magnitude, which would give this method reality.[5]Development of coherent VIJY emission source : As described above, the photo-induced process by use of incoherent lamps is very effective, but inevitably slow. High-power VUV light source would increase the rate orders of magnitude. I have thus developed a high-power coherent 126 nm emission by use of electrons produced by optical field induced ionization process. I. observed a small-signal gain coefficient of 0.05/cm for the first time.[6]Production of a photo-induced cleaning device : Based on the above scientific and engineering knowledge, I have designed a compact photo-induced cleaning device. With a help of a venture company originated from University of Miyazaki (Nano Tech Photon Corp.), a design became a real device. Less
本研究的主要目的是利用真空紫外线(VUV)稀有气体准分子灯开发光致清洁装置。在过去三年的研究期间,我取得了以下成绩:b[1]大功率稀有气体准分子灯的研制:这是当前研究的核心。通过对稀有气体准分子灯器件的电极配置和电源进行优化,我获得了超过1 mW/cm^2 126 nm的输出功率密度,这是在这种短波长的发射源中获得的冠军数据。我还成功地简化了真空处理系统的设备。超干燥工艺:利用[1]开发的装置,我成功地在硅片上进行了氧化层的光致蚀刻,而不使用任何反应气体。该装置也可用于金属涂层的光诱导清洗。各种聚合物的光学和表面变化。[3]VUV F2灯:除126nm的Ar2*准分子灯外,还研究了157nm的F2灯。尽管F2具有反应性,但通过优化气体处理和杂质分析,可以实现稳定的长期运行。[4]干法:为了提高蚀刻工艺速度,我使用了反应气体进行氧化层蚀刻。通过使用这种气体,速率提高了一个数量级以上,这将使该方法成为现实。相干VIJY发射源的开发:如上所述,使用非相干灯的光诱导过程非常有效,但不可避免地很慢。大功率VUV光源可使速率提高几个数量级。因此,我利用光场诱导电离过程产生的电子,开发了一种高功率的126nm相干发射。第一次观察到小信号增益系数为0.05/cm。[6]光致清洁装置的制作:基于以上的科学和工程知识,我设计了一个紧凑的光致清洁装置。在来自宫崎大学的风险投资公司(纳米科技光子公司)的帮助下,一个设计变成了一个真正的设备。少
项目成果
期刊论文数量(152)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Masanori Kaku, Takeshi Higashiguchi, Shoichi Kubodera, Wataru Sasaki: "Observation of vacuum-ultraviolet Ar2* radiation gain at 126 nm produced by an ultrashort high-intensity laser pulse propagating in a hollow fiber"Opt. Lett.. vol. 28, no. 10. 804-806
Masanori Kaku、Takeshi Higashiguchi、Shoichi Kubodera、Wataru Sasaki:“观察超短高强度激光脉冲在中空光纤中传播产生的 126 nm 真空紫外 Ar2* 辐射增益”
- DOI:
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- 影响因子:0
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- 通讯作者:
Takeshi Ohtsubo, Makoto Takaura, Teppei Azuma, Takeshi Higashiguchi, Shoichi Kubodera, Wataru Sasaki: "Removal of oxygen atoms from a SiO2 surface by incoherent vacuum ultraviolet excimer irradiation"Applied Physics A. vol. 76. 139-141 (2003)
Takeshi Ohtsubo、Makoto Takaura、Teppei Azuma、Takeshi Higashiguchi、Shoichi Kubodera、Wataru Sasaki:“通过非相干真空紫外准分子照射从 SiO2 表面去除氧原子”应用物理 A. 卷。
- DOI:
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- 影响因子:0
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Masanori Kaku, Takahiro Yamaura, Hidenori Kodama, Shoichi Kubodera, Wataru Sasaki: "Vacuum ultraviolet spectroscopic system using a laser-produced plasma"Proceedings of the Second Symposium on Advanced Photon Research (Kansai Establishment, Japan Atomic E
Masanori Kaku、Takahiro Yamaura、Hidenori Kodama、Shoichi Kubodera、Wataru Sasaki:“使用激光产生等离子体的真空紫外光谱系统”第二届高级光子研究研讨会论文集(关西机构、日本原子能研究中心)
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- 影响因子:0
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Takahiro Shirai: "Oscillation characteristics of discharge pumped VUV Kr excimer laser"Proceedings of SPIE. 5120. 227-230 (2003)
Takahiro Shirai:“放电泵浦 VUV Kr 准分子激光器的振荡特性”SPIE 论文集。
- DOI:
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- 影响因子:0
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Takahiro Shirai: "Oscillation characteristics of the discharge-pumped vacuum ultraviolet laser"Proceedings of APLS. 506-509 (2003)
Takahiro Shirai:“放电泵浦真空紫外激光器的振荡特性”APLS 论文集。
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KUBODERA Shoichi其他文献
KUBODERA Shoichi的其他文献
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{{ truncateString('KUBODERA Shoichi', 18)}}的其他基金
Vacuum ultraviolet micro-laser produced in photo-excited high-pressure Kr
光激发高压氪产生的真空紫外微激光器
- 批准号:
24651103 - 财政年份:2012
- 资助金额:
$ 7.49万 - 项目类别:
Grant-in-Aid for Challenging Exploratory Research
Development of a compact vacuum ultraviolet laser using a hollow fiber for plasma regulation and applications to photo-materials processing
开发使用中空光纤进行等离子体调节的紧凑型真空紫外激光器及其在光材料加工中的应用
- 批准号:
18360040 - 财政年份:2006
- 资助金额:
$ 7.49万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Soft X-ray Laser by Hybrid Excitation Method Using Laser Produced Multiple Charged Ions
使用激光产生多带电离子的混合激发方法的软 X 射线激光器
- 批准号:
08650054 - 财政年份:1996
- 资助金额:
$ 7.49万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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