Studies of Chromium alloy plating on steel

钢镀铬合金的研究

• 批准号: 06650800
• 负责人: AWAKURA Yasuhiro
• 金额: $ 1.28万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06650800/
• 关键词: Chromium plating; Electrodeposition; Chromous Chloride; Chromous Sulfate; Electrolytic Reduction

The electrodeposition of chromium and Cr-Zn alloy and Cr-Fe-Ni alloy was examined using a variety of divalent chromium baths. Divalent chromium baths were prepared by electrolytic reduction of aqueous Cr_2(SO_4)_3 solution using a titanium cathode. Lustrous deposits were obtained by electrodeposition using aqueous 0.8 kmol m^<-3> CrSO_4 -0.008 kmol m^<-3> ZnSO_4 -2.0 kmol m^<-3> KCl-0.3 kmol m^<-3> HCOOH (pH 2.4). The deposit contained Zn and Cr-Zn alloy phases. Lustrous Cr-Fe-Ni alloy deposits were obtained at cathode potentials from -1.0 to -1.1 V vs SHE,using aqueous 0.1-0.4 kmol m^<-3> CrSO_4 -0.1 kmol m^<-3> FeSO_4 -0.1 kmol m^<-3> NiSO_4 -1.0 kmol m^<-3> KCl -0.3 kmol m^<-3> HCOOH (pH 2.4). The chromium content in the deposit increased with an increase in the chromium concentration of a plating bath and with a decrease in the cathode potential. For 30 min of deposition, the average current efficiency for Cr-Fe-Ni deposition from divalent chromium baths was 15% to 25%, which was higher than that from conventional trivalent chromium baths.

采用不同的二价铬液，研究了铬与Cr-Zn合金和Cr-Fe-Ni合金的电沉积。采用钛阴极对Cr_2(SO_4)_3水溶液进行电解还原制备了二价铬浴。采用0.8 kmol m^<-3> CrSO_4 -0.008 kmol m^<-3> ZnSO_4 -2.0 kmol m^<-3> KCl-0.3 kmol m^<-3> HCOOH （pH为2.4）水溶液电沉积得到有光泽的镀层。镀层中含有Zn和Cr-Zn合金相。采用0.1 ~ 0.4 kmol m^<-3> CrSO_4 -0.1 kmol m^<-3> FeSO_4 -0.1 kmol m^<-3> NiSO_4 -1.0 kmol m^<-3> KCl -0.3 kmol m^<-3> HCOOH (pH 2.4)，在阴极电位为-1.0 ~ -1.1 V vs SHE的条件下获得了有光泽的Cr-Fe-Ni合金镀层。镀层中的铬含量随着镀液中铬浓度的增加和阴极电位的降低而增加。沉积30min时，二价铬浴沉积Cr-Fe-Ni的平均电流效率为15% ~ 25%，高于常规三价铬浴沉积的电流效率。

项目成果

粟倉泰弘: "複極式電解槽によるCr(III)のCr(II)への電解還元" 資源と素材. 111. 793-800 (1995)

Yasuhiro Awakura：“使用双极电解槽将 Cr(III) 电解还原为 Cr(II)”资源和材料。111. 793-800 (1995)

Yasuhiro Awakura: "Electrodeposition of Chromium from Divalent Chromium Baths Containing Formic Acid" J.of the Surface Finishing Society of Japan. Vol.47, No.3. 245-249 (1996)

Yasuhiro Awakura：“从含有甲酸的二价铬浴中电镀铬”，日本表面处理协会杂志。

粟倉泰弘: "ギ酸を含む2価クロム電解浴からのクロム電析" 表面技術. 47. 245-249 (1996)

Yasuhiro Awakura：“含甲酸的二价铬电解槽中的铬电沉积”表面技术 47. 245-249 (1996)。

Yasuhiro Awakura: "Electrolytic Reduction of Cr (III) to Cr (II) with a Bipolar Electrolytic Cell" J.of The Mining and Materials Processing Institute of Japan. Vol.111, No.11. 793-800 (1995)

Yasuhiro Awakura：“使用双极电解池将 Cr (III) 电解还原为 Cr (II)”，日本采矿和材料加工研究所杂志。

粟倉泰弘: "ギ酸を含む2価クロム電解浴からのクロム電析" 表面技術. 47. (1996)

Yasuhiro Awakura：“含甲酸的二价铬电解槽中的铬电沉积”表面技术 47。（1996）