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High-tenperature SIM observation under ion irradiation in order to modify surfaces in namscale

High-tenperature SIM observation under ion irradiation in order to modify surfaces in namscale
离子辐照下的高温 SIM 观察,以纳米尺度修饰表面
批准号:
11450019
负责人:
ODOMARI Iwao
金额:
$9.22万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2001

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中文摘要
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英文摘要
1. A high-tenperature low-energy ion-gun/scanning-tunneling-microscope (STM) conbined system has been developed in order to clarify the microscopic aspects of annealing processes of ion-irradiated Si surfaces. This system enables us to perform atom-resolved high tenperature STM observation and ion beam irradiation simultaneously in ultrahigh vacuum conditions. Taking great advantage of this system, we have successfully obtained sequential STM images of high-temperature Si (111) surfaces irradiated with Ar' single ions. The STM results have shown that the surface defects induced by single ion irradiation show various changes in size and shape, which is considered to result from diffusion of vacancies and interstitial atoms in the substrates, diffusion of atoms on the surface, and from an anisotropic character of the surface atonic arrangement. And we succeed in real-time STM observation under 0^+ ion irradiation. Next target is dopant ion irradiation process.2. We have to simulate collision cascade inbulk and following annealing, because STM tipobserves surface information only. First principle calculation, molecular dynamics, Monte-Carlo simulation is applied to investigate the phenomenon we observed.
期刊论文(202)
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会议论文
Tanii T, Goto T, Iida, T, Koh-Masahara M, Ohdomari I: "Fabrication of adenosine triphosphate-molecule recognition chip by means of bioluminous enzyme luciferase"JJAP. Lett.. 40巻10B号. L1135-L1137 (2001)
Tanii T、Goto T、Iida、T、Koh-Masahara M、Ohdomari I:“利用生物发光酶荧光素酶制备腺苷三磷酸分子识别芯片”JJAP。第 40 卷,第 10B 期。 )
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通讯作者:
M.Koh: "Simple nanostructuring of Si surfaces by means of focused beam patterning and wet etching"Applied Surface Science. 162-163. 599-603 (2000)
M.Koh:“通过聚焦光束图案化和湿法蚀刻对硅表面进行简单的纳米结构”应用表面科学。
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通讯作者:
T.Tanii: "Nucleation and growth of Cu clusters on highly oriented pyrolytic graphite observed with an in situ electrochemical scanning tunneling microscope"Applied Surface Science. 162-163. 662-665 (2000)
T.Tanii:“用原位电化学扫描隧道显微镜观察到高度定向热解石墨上铜簇的成核和生长”应用表面科学。
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通讯作者:
M. Koh,: "Quantitative characterization of ion-induced Si0_2/Si interface traps by means of MeV He sinle-ion irradiation"Journal of Applied Physics. 85. 7814-7818 (1999)
M. Koh,:“通过 MeV He 单离子辐照对离子诱导的 SiO_2/Si 界面陷阱进行定量表征”应用物理学杂志。
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通讯作者:
82
    Novel semiconductors with controlled both single-atom number and position
    • 批准号:
      17201026
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $32.61万
    • 财政年份:
      2005
    • 负责人:
      ODOMARI Iwao
    • 依托单位:
    Study on suppression of fluctuation in semiconductor electrical characteristics by single ion inplantaticn
    • 批准号:
      12555092
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $8.64万
    • 财政年份:
      2000
    • 负责人:
      ODOMARI Iwao
    • 依托单位:
    海外基金