Applied Study on Ion Absorption Pump for Oxygen by a Reactive Cathode Sputter Discharge
Applied Study on Ion Absorption Pump for Oxygen by a Reactive Cathode Sputter Discharge
批准号:
11555008
负责人:
FUNATO Yasuyuki
金额:
$2.82万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B).
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
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英文摘要
1. Basic experiment for production and improvement of the LaB6 cathode sputtering ion pump was carried out. In pump container of diameter of 6 cm and made of SUS-304 of the 200mm length, LaB6 disk of 5 mm thickness and 50mm diameter is installed as a cathode electrode.2. The experimental device consists of trial manufacture LaB6 ion pump, traditional-model titanium pump, and differential evacuation pump sysytem. The measurement system was made to be satisfactory by using ultrahigh-vacuum ionization gauge, mass filter type analyzer and Pirani vacuum system.3. The detailed experiment was carried out on the correlation of discharge parameters and pumping characteristic (Pump-down characteristics, exhaust velocity, partial pressure dynamics), and the experimental verification of high exhaust speed of oxygen and water for boron and LaB6 film was got.4. The measurement of plasma parameters. In respect of electron density, electron temperature and space potential of glow-discharge plasma, Langmuir probe was used. The relation of pump exhaust characteristic and sputter discharge became the evidence, and the condition for getting the more high-efficient exhaust was pursued Gas release, absorption behavior during the discharge, recycling behavior with the wall, partial pressure characteristics were analyzed numerically and the results were repored everywhere in the conferences.5. Image diagnostic. The shape of the sputter plasma column was pursued by photographing of the cross sectional photograph and the image processing. These are necessary for the optimization of the plasma production condition for application of the plasma.6. The precise measurement of the residual gas analysis. Especially, each exhaust speed for the partial pressure was measured, and the relation between partial pressure pattern and arrival degree of vacuum was pursued.
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Y. Funato: "Studies on a Magnetic Field Configuration for Plasma Processing"MEMOIRS of Suzuka National College of Technology. 32. 43-48 (1999)
Y. Funato:“等离子体处理的磁场配置的研究”铃鹿国立工业大学回忆录。
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南条徹: "ボロン化合物陰極を用いたN2/O2混合ガスグロー放電プラズマの特性"鈴鹿工業高等専門学校紀要. 33. 63-66 (2000)
Toru Nanjo:“使用硼化合物阴极的 N2/O2 混合气体辉光放电等离子体的特性”国立工业大学通报,铃鹿 33. 63-66 (2000)。
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Y. FUNATO: "Effects of Cathode Material on DC-Glow Discharge in N2/O2 Mixtures"Proc. Int. Conference Phenomena in Ionized Gases; 11-16, July, Warsaw. III. 27-28 (1999)
Y. FUNATO:“阴极材料对 N2/O2 混合物中直流辉光放电的影响”Proc。
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Y. Funato: "Dynamics of Nox Gases during a Glow Discharge with Sputter Discharge"BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, Vol. 44. 1・II. 1096-1096 (1999)
Y. Funato:“溅射放电辉光放电期间的氮氧化物气体动力学”,美国物理学会公报,第 44 卷,1・II。
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清岡千晶: "スパッタ放電のプラズマ密度、電位分布の測定"鈴鹿工業高等専門学校紀要. 31. 65-70 (1998)
Chiaki Kiyooka:“溅射放电的等离子体密度和电势分布的测量”国立技术学院通报,铃鹿31. 65-70 (1998)。
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共 11 条
System Construction and Execution for the expansive upgrading of the practice Education in the College of Technology
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批准号:13680214
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.18万
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财政年份:2001
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负责人:FUNATO Yasuyuki
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依托单位:
System Development for Practical Education of Specialized Subjects, Research and Graduation Thesis Research in a College of Technology
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批准号:10680207
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.7万
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财政年份:1998
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负责人:FUNATO Yasuyuki
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依托单位:
EXPERIMENTAL STUDY ON SPUTTER ION PUMP FOR WIDE PRESSURE RANGE
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批准号:05555011
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$1.47万
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财政年份:1993
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负责人:FUNATO Yasuyuki
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依托单位: