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EXPERIMENTAL STUDY ON SPUTTER ION PUMP FOR WIDE PRESSURE RANGE

EXPERIMENTAL STUDY ON SPUTTER ION PUMP FOR WIDE PRESSURE RANGE
宽压力范围溅射离子泵的实验研究
批准号:
05555011
负责人:
FUNATO Yasuyuki
金额:
$1.47万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1995

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中文摘要
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英文摘要
The experimental investigation of a sputter ion pump were performed for wide pressure range. The vacuum chamber has a diameter of 6 inches and an length of 200mm. The Lanthanum hexaboride (LaB6) disk of 50mm diameter are used for sputter cathode. The experimental device consists of discharge section and analysis one. The measurements involves ionization gauge, partial pressure gauge, electro static probe for plasma parameters and XPS measurement. The experiment was done by using a glow discharge plasma' and to create boron like thin films on the chamber wall surface. The preliminary experiment showed that the boron film formed on the vacuum wall can pump effectively water vapor. The experiment investigate the correlations between partial pressures of H2O,H2, O2 and plasma parameters of density, temperature and sputter film characteristics during a sputter discharge. The application of LaB6 cathode is a characteristic point of the experiment for developing a new type of sputter vacuum pump. The plasma parameters were measured by Langumuir probe and were estimated to be (2-30) x10^9 of density and 3-5 eV of temperature. The partial pressure was measured by QMS.The most typical result of the experiment is that the water vapor is pumped effectively for wide pressure range by using the LaB6 sputter cathode. The pumping speed is estimated to be about 4m^3/ (m^2s). XPS was performed on the sample tip inserted in the sputter discharge. The signals of B,La, O and C were detected. And the depth profiles of their signals were also measured. The experiment indicated that the sputter discharge with LaB6 cathode can be used for a new type of sputter vacuum pump.
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N.Takagi: "Characteristics of a Cold Cathode Gauge for ATF" Proc.of the 20th Linear Accelerator Meeting in Japan,. Sep. 162-162 (1995)
N.Takagi:“ATF 冷阴极真空计的特性”,第 20 届日本直线加速器会议论文集。
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Y.Funato: "CHARACTERISTICS OF PENNING TYPE DISCHARGE WITH LaB_6 CATHODE FOR SPUTTER ION PUMP" Proc.of 21 the Int.Conf.on Phenomena in Ionized Gases. VOl.11. 317-318 (1993)
Y.Funato:“用于溅射离子泵的 LaB_6 阴极的彭宁型放电的特性”Proc.of 21 the Int.Conf.on Phenomena in ionized Gases。
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Y.Funato: "Distributions of Plasma Parameters in a Sputter Discharge" Proc.XXIII.Int.Conf.on Phenomena Ionized Gases,Toulouse(1997). (to be published). (1997)
Y.Funato:“溅射放电中等离子体参数的分布”Proc.XXIII.Int.Conf.on Phenomena Ionized Gases,图卢兹(1997)。
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D.Kawamura: "Experiments on the Reduction of Oxygen Pertial Pressure by Glow Discharge Plasma" Memoirs of Suzuka College of Technol.22.9. 195-199 (1996)
D.Kawamura:“通过辉光放电等离子体降低氧分压的实验”铃鹿工业大学回忆录.22.9。
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29
    System Construction and Execution for the expansive upgrading of the practice Education in the College of Technology
    • 批准号:
      13680214
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.18万
    • 财政年份:
      2001
    • 负责人:
      FUNATO Yasuyuki
    • 依托单位:
    Applied Study on Ion Absorption Pump for Oxygen by a Reactive Cathode Sputter Discharge
    • 批准号:
      11555008
    • 项目类别:
      Grant-in-Aid for Scientific Research (B).
    • 资助金额:
      $2.82万
    • 财政年份:
      1999
    • 负责人:
      FUNATO Yasuyuki
    • 依托单位:
    System Development for Practical Education of Specialized Subjects, Research and Graduation Thesis Research in a College of Technology
    • 批准号:
      10680207
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $0.7万
    • 财政年份:
      1998
    • 负责人:
      FUNATO Yasuyuki
    • 依托单位:
    海外基金