Electron Quantum Correlation in in Semiconductor Quantum-Dot lattice Structures
Electron Quantum Correlation in in Semiconductor Quantum-Dot lattice Structures
批准号:
14350170
负责人:
HORIKOSHI Yoshiji
金额:
$7.62万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2004
中文摘要
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英文摘要
Important quantum correlation effects such as quantum Hall effect and fractional quantum Hall effect have been revealed using the semiconductor two-dimensional electron system. In this system, applications to practical devices such as high speed FETs and lasers have also been achieved. In the lower dimensional systems, however, no prominent progress has been achieved in both fundamental research and device applications. A major reason to this lies on their poor geometrical accuracy. In the two-dimensional structures, the thickness of each layer has atomic size accuracy. However, in one- and zero-dimensional structures, side walls are quite rough. Moreover, structures produced by bottom-up.self-assembly process suffer from inhomogeneity and random distribution. In the present research, therefore, we adopted area-selective epitaxy by combining with e-beam lithograph and migration-enhanced epitaxy(MEE). We have succeeded in fabricating high quality one-dimensional electron wires and quantum dot lattices with AlGaAs/GaAs, InAs/GaAs, and InGaAs/GaAs. Atomically flat side walls of nano-structures are formed by utilizing micro-facet structures. To fabricate accurately the structures with designed ones, lateral growth should be minimized. This has been accomplished by optimizing the MEE deposition sequence. One dimensional wires exhibit ballistic transport characteristics. Two dimensional quantum dot lattices show unique transport characteristics. They have proved useful also for two-dimensional photonic crystals.
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Photoluminescence characteristics of GaAs quantum wells embedded in AlAs/GaAs-SPS barriers under two wavelength excitation
两种波长激发下嵌入 AlAs/GaAs-SPS 势垒中的 GaAs 量子阱的光致发光特性
DOI:
--
发表时间:
2004
期刊:
影响因子:
--
作者:
[T.Chavanapranee, Y.Horikoshi]
通讯作者:
Y.Horikoshi
Molecular Beam Epitaxial Growth of ZnO on Si Substrate by Using Ozoneas an Oxygen Source
以臭氧为氧源在硅衬底上分子束外延生长ZnO
DOI:
--
发表时间:
2003
期刊:
Jpn.J.Appl.Phys. 42
影响因子:
--
作者:
[M.Fujita, N.Kawamoto, T.Tatsumi, K.Yamagishi, Y.Horikoshi]
通讯作者:
Y.Horikoshi
High quality GaN epitaxial layers grown by modulated beam growth method
调制束生长法生长高质量GaN外延层
DOI:
--
发表时间:
2004
期刊:
Materials Chemistry and Physics 86/1
影响因子:
--
作者:
[K.T.Liu, T.Tezuka, S.Sugita, Y.Watari, Y.Horikoshi, Y.K.Su, S.J.Chang]
通讯作者:
S.J.Chang
フォトルミネッセンス測定によるZnOの欠陥スペクタクル解析
通过光致发光测量对 ZnO 的缺陷进行分析
DOI:
--
发表时间:
2002
期刊:
影响因子:
--
作者:
[辰巳知彦, 藤田実樹, 川本典明, 笹島正則, 堀越佳治]
通讯作者:
堀越佳治
Growth of H-doped ZnO films by using RF-MBE
使用 RF-MBE 生长 H 掺杂 ZnO 薄膜
DOI:
--
发表时间:
2003
期刊:
影响因子:
--
作者:
[M.Sasajima, Y.Horikoshi]
通讯作者:
Y.Horikoshi
共 118 条
Development of solar cells with high stability at elevated temperatures
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批准号:23360163
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$12.73万
-
财政年份:2011
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负责人:HORIKOSHI Yoshiji
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依托单位:
海外基金