Study of PDP Micro-Discharges Using Laser Thomson Scattering

利用激光汤姆逊散射研究 PDP 微放电

• 批准号: 14350190
• 负责人: UCHINO Kiichiro
• 金额: $ 9.28万
• 依托单位: KYUSHU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2004
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-14350190/
• 关键词: plasma; display; PDP; discharge; Thomson scattering; Laser; electron density; electron temperature

In this research, the laser Thomson scattering(LTS) method has been developed as a diagnostic method of plasma display panel(PDP)-like micro-discharge plasmas and detailed structure of the plasmas have been investigated by the method. Results are outlined as follows.(1)A new electrode substrate which simulated the sustain electrodes of PDP and had a width of 2 mm was developed. Also, the laser spot size was adjusted to be below 50 μm by controlling the beam divergence of the laser. These allowed us to detect LTS signals at points as close as 60 μm from the electrode surface. Then, two-dimensional profiles of electron density n_e and electron temperature T_e of micro-discharge plasmas were successfully measured.(2)The LTS method was used to measure n_e and T_e profiles of a striated plasmas in the PDP like discharge. Measurements were performed for the discharge produced in the gas mixture of Ne/Ar (10%) at a pressure of 200 Torr. A modulation in ne was clearly observed on the anode side of the electrode substrate, which agreed with the total integrated emission images measured by an ICCD camera. Also, a modulation in T_e was observed and it was found to be out of phase from the modulation in n_e.(3)The visible LTS system using the second harmonics of the YAG laser (wavelength 532 nm) as the light source was found to be not applicable to discharges in Ne/Xe gas mixtures because Xe atoms were ionized by the multi-photon absorption of the 532nm light. In order to avoid such perturbation phenomenon, the infrared LTS system using the fundamental output of the YAG laser (wavelength 1064 nm) as the light source was newly developed. We applied the infrared LTS to discharges in a Ne/Xe gas mixture and proved that the discharge plasmas were not disturbed. Also, we showed that the measured profiles of n_e and T_e of the Ne/Xe plasmas were similar to those observed for the Ne/Ar plasmas produced under the similar discharge conditions.

在这项研究中，激光汤姆逊散射（LTS）的方法已被开发为诊断方法的等离子体显示板（PDP）类的微放电等离子体和详细的结构的等离子体的方法进行了研究。结果概述如下。(1)A研制了一种模拟PDP维持电极的宽度为2 mm的新型电极基板。同时，通过控制激光束的发散角，将激光光斑尺寸调整到50 μm以下。这使我们能够在距离电极表面60 μm的点处检测LTS信号。在此基础上，成功地测量了微放电等离子体电子密度n_e和电子温度T_e的二维分布。（2）用LTS方法测量了PDP类放电中条纹等离子体的n_e和T_e分布。在200托的压力下对在Ne/Ar（10%）的气体混合物中产生的放电进行测量。在电极衬底的阳极侧上清楚地观察到ne的调制，这与ICCD相机测量的总积分发射图像一致。此外，还观察到了T_e的调制，并且发现它与n_e的调制是异相的。（3）用YAG激光的二次谐波（波长532 nm）作光源的可见光LTS系统不适用于Ne/O2混合气体的放电，因为O2原子被532 nm光的多光子吸收电离。为了避免这种扰动现象，新开发了使用YAG激光器（波长1064 nm）的基波输出作为光源的红外LTS系统。我们将红外LTS应用于Ne/O2混合气体放电，证明了放电等离子体不受干扰。实验还表明，Ne/Ar等离子体的n_e和T_e的测量结果与在类似放电条件下产生的Ne/Ar等离子体的测量结果相似。

项目成果

K.Muraoka, K.Uchino, Y.Yamagata, Y.Noguchi, et al.: "Laser Thomson scattering studies of glow discharge plasmas"Plasma Sources Science and Technology. Vol. 11, No. 3A. 143-149 (2002)

K.Muraoka、K.Uchino、Y.Yamagata、Y.Noguchi 等人：“辉光放电等离子体的激光汤姆逊散射研究”等离子体源科学与技术。

Application of Laser-induced Fluorescence and Laser scattering to Discharge Plasmas

激光诱导荧光和激光散射在等离子体放电中的应用

• 发表时间: 2004
• 期刊: Journal of the Institute of Electrostatics Vol.28, No.6
• 作者: K.Muraoka;K.Uchino;Y.Yamagata
• 通讯作者: Y.Yamagata

放電プラズマ計測へのレーザー散乱および蛍光法の適用

激光散射和荧光方法在放电等离子体测量中的应用

• 发表时间: 2004
• 期刊: 静電気学会誌 Vol.28,No.6
• 作者: 内田 諭;杤久保 文嘉;渡辺 恒雄;T.Ichitsubo;Safwat Hassaballa;Safwat Hassaballa;Safwat Hassaballa;Safwat Hassaballa;村岡克紀
• 通讯作者: 村岡克紀

村岡克紀, 内野喜一郎, 山形幸彦: "レーザーによるプラズマ計測"応用物理. 第73巻・第2号. 220-223 (2004)

Katsunori Muraoka、Kiichiro Uchino、Yukihiko Yamagata：“使用激光进行等离子体测量”应用物理学，第 73 卷，第 220-223 期（2004 年）。

Laser Thomson Scattering Measurements of Electron Density and Temperature Profiles of a Striated Plasma in a Plasma Display Panel (PDP)-Like Discharge

• DOI: 10.1143/jjap.44.l442
• 发表时间: 2005-03
• 期刊: Japanese Journal of Applied Physics
• 影响因子: 1.5
• 作者: S. Hassaballa;K. Tomita;Young Kee Kim;K. Uchino;H. Hatanaka;Young Mo Kim;Chung‐Hoo Park;K. Muraoka