Development of an Infrared Thomson Scattering System for Diagnostics of Processing Plasmas
Development of an Infrared Thomson Scattering System for Diagnostics of Processing Plasmas
批准号:
10680462
负责人:
UCHINO Kiichiro
金额:
$1.92万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 1999
中文摘要
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英文摘要
When laser Thomson scattering is applied to discharges using reactive gases, there is a strong possibility that the laser pulse may perturb the discharges. Most of the reactions that a laser might induce, such as photo-detachment of electrons from negative ions and photo-dissociation of molecules, have a photon energy threshold. This project aimed to develop a new Thomson scattering system based on an infrared (low photon energy) laser for diagnostics of reactive plasmas and to examine conditions that the laser pulse disturbs the discharges. Also, the improvement of the lower detection limit for electron density was performed. Following results were obtained.(1) A Thomson scattering measurement system based on a 1.064 μm wavelength YAG laser was constructed. Scattering measurements showed that the results were comparable with those obtained using previous Thomson scattering systems that used visible lasers.(2) No evidence of laser perturbation was observed of ICP discharges using CFィイD24ィエD2 gas. However, the laser perturbation was observed at a wavelength 532 nm for a microwave discharge plasma produced in CHィイD24ィエD2 gas at a pressure of 20 Torr. These phenomena should be investigated in detail hereafter.(3) The lower detection limit of electron density was improved down to 5x10ィイD115 ィエD1 mィイD1-3ィエD1. This was achieved mainly by maximizing the detection solid angle, increasing shot numbers for data accumulation, and using a monochromator which has a specific characteristic of high stray light rejection.
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M.D. Bowden, M. Kogano, Y. Suetome, T. Hori, K. Uchino, et al.: "Comparison of electron property measurements in an inductively coupled plasma made by Langmuir probe and laser Thomson scattering techniques"Journal of Vacuum Science & Technology A. Vol. 17
M.D. Bowden、M. Kogano、Y. Suetome、T. Hori、K. Uchino 等人:“朗缪尔探针和激光汤姆逊散射技术制造的感应耦合等离子体中电子特性测量的比较”真空科学杂志
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K.Muraoka,K.Uchino,M.D.Bowden: "Diagnosties of Low-Density Glow Discharge Plasmas Using Thomson Scattering" Plasma Physics and Controlled Fusion. 40. 1221-1239 (1998)
K.Muraoka、K.Uchino、M.D.Bowden:“利用汤姆逊散射诊断低密度辉光放电等离子体”等离子体物理和受控聚变。
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M.D. Bowden, M. Kogano, Y. Suetome, T. Hori, K. Uchino 他: "A Thomson scattering diagnostic system for measurement of electron properties of processing plasmas"Plasma Sources Science & Technology. 8・2. 203-209 (1999)
M.D. Bowden、M. Kogano、Y. Suetome、T. Hori、K. Uchino 等人:“用于测量处理等离子体的电子特性的汤姆森散射诊断系统”Plasma Sources Science & Technology 8・2。 (1999)
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K. Muraoka, K. Uchino, M.D. Bowden: "Diagnostics of Low-Density Glow Discharge Plasmas Using Thomson Scattering"Plasma Physics and Controlled Fusion. 40. 1221-1239 (1998)
K. Muraoka、K. Uchino、M.D. Bowden:“利用汤姆逊散射进行低密度辉光放电等离子体的诊断”等离子体物理和受控聚变。
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M.D. Bowden, H. Kudo, K. Uchino, K. Muraoka, et al.: "A Thomson scattering measurement system based on an infrared laser"Japanese Journal of Applied Physics Part. 1. Vol. 38, No. 8. 4924-4925 (1999)
M.D. Bowden、H. Kudo、K. Uchino、K. Muraoka 等人:“基于红外激光的汤姆逊散射测量系统”日本应用物理杂志部分。
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Development of plasma processing methods for the metallic oxide thin films having an electricity storage function
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批准号:26390098
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.33万
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财政年份:2014
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负责人:UCHINO Kiichiro
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依托单位:
Studies on the efficient emission mechanism of plasma display panels
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批准号:21360042
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$11.81万
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财政年份:2009
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负责人:UCHINO Kiichiro
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依托单位:
Study of PDP Micro-Discharges Using Laser Thomson Scattering
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批准号:14350190
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.28万
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财政年份:2002
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负责人:UCHINO Kiichiro
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依托单位:
Laser scattering measurements of electric field, electron density and electron temperature in a plasma-display discharge
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批准号:11650350
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.18万
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财政年份:1999
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负责人:UCHINO Kiichiro
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依托单位:
海外基金