Development of Ceramics Than Films Preparation Equipment by Electrostatic Spray Deposition Method and Composition and Morphology Control of Prepared Thin Films
Development of Ceramics Than Films Preparation Equipment by Electrostatic Spray Deposition Method and Composition and Morphology Control of Prepared Thin Films
批准号:
11555206
负责人:
OTANI Yoshio
金额:
$8.7万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2001
中文摘要
采用静电喷雾沉积(EDS)技术对LiCoO_2和羟基磷灰石薄层的沉积进行了研究。将锂和乙酸钴溶解在50 mol%乙醇和50 mol%正丁醇的混合物中,制备LiCoC_2薄膜。将硝酸钙和磷酸溶解于10%乙醇和90%正丁醇的混合物中,制备羟基磷灰石薄膜。采用扫描电子显微镜(SEM)研究了沉积温度、进料液浓度和沉积时间等工艺条件对薄膜表面形貌和微观结构的影响。制备的LiCoO_2层在不同的工艺条件下可制备出网状、分形或褶皱等不同的表面结构,而制备羟基磷灰石层的样品均具有分形结构。在200℃的沉积温度下,沉积的LiCoC_2和羟基磷灰石薄膜均为非晶或纳米晶。然后分别在700℃加热1h和900℃加热2h,用x射线衍射仪(XRD)对样品进行研究。样品的晶体结构转变为所需的相。
英文摘要
The deposition of thin LiCoO_2 and hydroxyapatite layers was studied using the electrostatic spray deposition (EDS) technique. Lithium and cobalt acetate were dissolved in a mixture of 50 mol% ethanol and 50 mol% butyl carbitol for the preparation of LiCoC_2 thin films. Also, Calcium nitrate and phosphoric acid were dissolved in a mixture of 10 vol% ethanol and 90vol% butyl carbitol for the preparation of hydroxyapatite thin films. The effect of process condition such as deposition temperature, concentration of feed solution and deposition time on the surface morphology and microstructure of thin films were examined with scanning electron microscopy (SEM). For the deposited LiCoO_2 layers, various surface structure, such as reticular, fractal or fold one, was fabricated at various process conditions, while all the samples have a fractal structure for the preparation of hydroxyapatite layers. The deposited thin-film LiCoC_2 and hydroxyapatite, were amorphous or nanocrystalline at the used deposition temperature(200℃). Subsequently, the samples were heated at 700℃ for 1h or 900℃ for 2h, respectively and were studied using X-ray diffractometry(XRD). The crystal structure of samples transformed to the desired phase.
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依托单位:
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