Synthesis of Functional Ceramics Thin Films by Dual Ion Beam Sputtering Method

双离子束溅射法合成功能陶瓷薄膜

• 批准号: 02453071
• 负责人: KAMIJO Eiji
• 金额: $ 3.97万
• 依托单位: Ryukoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1990
• 资助国家: 日本
• 起止时间: 1990 至 1991
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-02453071/
• 关键词: Ion Beam Sputtring; Ion Beam Assisted Deposition; Ceramics Thin Film; TiN Thin Film; TiO_2 Thin Film; AIN Thin Film; Crystal Orientation; AlN薄膜; イオンアシスト成膜; 光透過性AIN薄膜

Dual ion beam sputtering method for deposition of functional ceramics thin films is described. The metal atom flux was supplied on substrate by sputtering a metal target wi th an Ar ion beam, while the reactive gas ion flux was supplied directly on the growing film surface by a reactive ion beam. The present research aims at elucidating the effects and the mechanisms of ion beam bombardment to the growing film surface. In this research, it is clear that the ton beam bombardment is useful for controlling the crystallization and the crystal orientation of ceramics thin film formed on low temperature substrate. On basis of the experimental results, we have suggested a simple theoretical model which can predict a synthesis, growth and etching behavior on growing film surface by ion beam bombardment. This model must be verified by the further study. We have also reported on the properties and the crystal orientation of ion beam synthesized TIOL, TiN, (TiAIV) N, AIN ceramics thin films.

介绍了一种双离子束溅射沉积功能陶瓷薄膜的方法。金属原子流是通过溅射金属靶向衬底提供的，而反应气体离子流则是通过反应离子束直接向生长膜表面提供的。本研究旨在阐明离子束轰击对生长薄膜表面的影响及其机理。在本研究中，我们发现离子束轰击对于控制低温基底上所形成的陶瓷薄膜的结晶及晶向是有用的。在实验结果的基础上，我们提出了一个简单的理论模型，可以用来预测离子束轰击生长膜表面的合成、生长和刻蚀行为。该模型有待于进一步的研究验证。本文还报道了离子束合成TIOL、TiN、（TiAIV）N、AlN陶瓷薄膜的性能和晶体取向。

项目成果

上條 栄治: "イオンビ-ムスパッタ-法によるAlN薄膜の合成" 粉体および粉末冶金. 39ー2. 119-121 (1992)

Eiji Kamijo：“离子束溅射合成 AlN 薄膜”粉末和粉末冶金 39-121 (1992)。

神代 善正: "イオンビ-ムスパッタ法によるTiO_2薄膜の作成" 粉体および粉末冶金. 38ー3. (1991)

Yoshimasa Kamishiro：“离子束溅射制备TiO_2薄膜”粉末与粉末冶金（1991）。

上條 栄治: "イオンビ-ムスパッタ-法によるAIN薄膜の合成" 粉体および粉末冶金. 39ー2. 119-121 (1992)

Eiji Kamijo：“离子束溅射合成 AIN 薄膜”粉末与粉末冶金 39-121 (1992)。

E. KAMIJO: "Synthesis of Complex TiN Thin Films by Ion Beam Sputtering Method." Journal of the Japan Society of Powder and Powder Metallurgy.38-3. 447-449 (1991)

E. KAMIJO：“通过离子束溅射法合成复杂的 TiN 薄膜。”

神代 善正: "イオンビ-ムスパッタ-法によるTiO_2薄膜の作成" 粉体および粉末冶金. 38ー3. 444-446 (1991)

Yoshimasa Kamishiro：“离子束溅射制备TiO_2薄膜”粉末与粉末冶金38-3（1991）。