Fabrication of noble nano-reaction field by synchrotron radiation etching and characterization by STM
Fabrication of noble nano-reaction field by synchrotron radiation etching and characterization by STM
批准号:
12440202
负责人:
URISU Tsuneo
金额:
$9.79万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2003
中文摘要
这项研究的主要目标是:(A)同步辐射(SR)刻蚀激发能量依赖的测量,(B)利用同步辐射刻蚀的纳米结构制造技术的发展,以及(C)这些技术的适当应用的发展。(1)STM现场观测专用实验站的建设:在IMS-UVSOR机更新换代的过程中,设计并建造了波荡器束线BL-7U和超高真空STM装置。开发工作于2003年完成,并投入试验使用。结果表明,SR辐照后,Si-H键被切断。这是很有趣的,因为已知Si(100)表面的Si-H对于SR辐射是惰性的。(2)提出生物-纳米反应领域的新概念和新的科学技术领域--分子共生…我们提出了一种新型的支撑膜生物传感器,它是将硅表面含有通道蛋白的脂质双层与纳米结构相结合而制成的,以及制作该传感器所需的几项基本工艺技术;硅表面的纳米结构制备技术、-CH3和-COOH修饰等区域选择性表面化学修饰技术、基于囊泡融合的脂质双层沉积技术等已经基本成熟。该装置被认为是生命信息传输系统中携带信号的分子的接收器。(3)金属埋层红外反射吸收光谱技术的发展与应用我们将埋层红外反射吸收光谱技术应用于H原子和H_2O氧化Si(100)表面的研究,发现了3对双重态的新的振动带,它们归属于几个不同程度的Si背键氧化的SiH_2物种。基于这些结果,首次明确了BML-IRRAS的重要独特特性:包括指纹区域在内的宽频带的高灵敏度和高分辨率,以及垂直于表面的过渡矩的选择规则。我们还发现,BML-IRRAS特别适用于观察固定在固体表面的生物材料。较少
英文摘要
The research was carried out considering the following items as the main targets; (a) measurements of the excitation energy dependence of the synchrotron radiation (SR) etching, (b) development of nano-structure fabrication techniques using SR-etching, and (c) development of the suitable application of these techniques. The following results have been obtained.(1)Construction of undulator beam line as the special experimental station for in-situ STM observations.:During the remodeling of IMS-UVSOR machine for improving to the higher generation, the STM-undulator beam line BL-7U and the ultra high vacuum STM apparatous were designed and constructed. The developments were completed at 2003 and opened to the experimental use. It was found that Si-H bonds are cut by the SR irradiation. This is interesting since the Si-H on Si(100) surface is known to be inert for the SR irradiations.(2)Proposal of new idea of bio-nano-reaction field and new science and technology field of "molecular commun … More ication".We proposed a new supported membrane bio-sensor, which are made by integrating the lipid bilayer containing channel proteins on the Si surface with nano-structure, and several elementary process techniques necessary to fabricate this device ; nano-structure fabrication technique of Si surface, area selective surface chemical modification techniques such as -CH_3 and -COOH modifications, deposition technique of lipid bilayer using vesicle fusion, etc. have been almost completely developed. This device is considered as the receiver of the signal-carrying molecules in the life information transmission system. Based on this idea, we proposed a new science and technology field "molecular communication".(3)Development and application of the technique of infrared reflection absorption spectroscopy using a buried metal layer substrate (BML-IRRASS),We applied the BML-IRRAS to the investigation of oxidation reactions of Si(100) surface using H atoms and H_2O, and found new vibration bands of 3 pairs of doublet, which are assigned to several SiH_2 species with different level of Si back bond oxidations. Based on these results, important unique characteristics of BML-IRRAS ; high sensitivity and high resolution in the wide frequency region including the finger print regions, and selection rule for the transition moment perpendicular to the surface, were clearly certified for the first time. We also found that the BML-IRRAS is especially useful for the observation of bio-materials immobilized on the solid surfaces. Less
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Yan-Jun Li: "Deposition of undecenoic acid self-assembled monolayers on H-Si (111) surfaces studied by AFM"Appl.Surf.Sci.. in printing. (2004)
Yan-Jun Li:“通过 AFM 研究十一碳烯酸自组装单层在 H-Si (111) 表面上的沉积”Appl.Surf.Sci.. 在印刷中。
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通讯作者:
Noritaka Takezoe: "Design and construction of UVSOR-BL4A2 beam line for nano-structure processing"Nucl.Instrum.Methods. A467. 1279-1281 (2001)
Noritaka Takezoe:“用于纳米结构加工的 UVSOR-BL4A2 光束线的设计和构造”Nucl.Instrum.Methods。
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Zhi-Hong Wang: "Three pairs of doublet bands assigned to SiH_2 scissoring modes observed in H_2O-induced oxidation of Si(100) surfaces"Phys.Rev.. B69. 045309-045315 (2004)
王志宏:“在H_2O诱导的Si(100)表面氧化中观察到的三对双峰带分配给SiH_2剪切模式”Phys.Rev..B69。
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通讯作者:
Yan-Jun Li: "Deposition of 10-undecenoic acid self-assembled layers on H-Si(111) surfaces studied with AFM and FT-IR"Appl.Surf.Sci.. (in printing). (2004)
Yan-Jun Li:“用 AFM 和 FT-IR 研究在 H-Si(111) 表面上沉积 10-十一碳烯酸自组装层”Appl.Surf.Sci..(印刷中)。
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Yan Jun Li: "Structure and Deposition Mechanism of 10-Undecenoic Acid Self-assembled Layers on H-Si(111) Surfaces Studied by AFM and FT-IR"Jpn.J.Appl.Phys.. 43(in printing). (2004)
李彦军:“通过AFM和FT-IR研究H-Si(111)表面10-十一烯酸自组装层的结构和沉积机制”Jpn.J.Appl.Phys.. 43(印刷中)。
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