Fabrication of functhinal cermic devices using biomimetic processes

我们succeeded in fabricating micropatterns of titanium dioxide thin films on SAMsmonolayers). SAMs of OTS (octadecyltrichloro-silane) formed on Si wafers并将紫外线辐射用于普通methyl / silano -pattern. Theyused as templates to deposit titanium dioxide thin films by the use of TDD (titanium dichloridediethoxide). Amorphous TiO2 films were selectively deposited on silanol regions. Line widthvariation of the-pattern of an -deposited film was improved to be below the electronicsdesign rule, 5% . Furthermore，Patterned OTS-SAM was kept in a air tight container with TDD solution under N2 atmosphere at 90cfor 2h . TiO2 was deposited on silanol regions selectively and micropattern of TiO2 thin film wasthus fabricated from a gaseous phase. We have succeeded in low- temperature (55 - C) fabrication ofZnO micropatterns, which show patterned cathodoluminescence images. A photo-patterned，self-assembled monolayer (SAM) with phenyl/OH-surface功能组was used as the template. .the selective,electroless deposition of ZnO was achieved on a Pd catalyst that had been adhered to thephenyl-surfaces only. The micropattern of hydroxyapatite has also been successfully fabricated byuse of site-selective adhesion of the charged hydroxyapatite microparticles （negative）homogeneously formed in a supersaturated solution onto the charged surfaces modified with the charged surfacesself-assembled monolayers (positive: NH2-SAM；negative:OH-SAM). After a further growth of microparticles a dense of hydroxyapatite thin film wasformed only on the positive nh_2 -SAM。

We succeeded in fabricating micropatterns of titanium dioxide thin films on SAMs (self-assembled monolayers). SAMs of OTS (octadecyltrichloro-silane) were formed on Si wafers, and were modified by UV irradiation using a photomask to generate methyl / silanol-pattern. They were used as templates to deposit titanium dioxide thin films by the use of TDD (titanium dichloride diethoxide). Amorphous TiO2 films were selectively deposited on silanol regions. Line width variation of the-pattern of an as-deposited film was improved to be well below the electronics design rule, 5 %. Furthermore, Patterned OTS-SAM was kept in a air tight container with TDD solution under N2 atmosphere at 90゜C for 2 h. TiO2 was deposited on silanol regions selectively and micropattern of TiO2 thin film was thus fabricated from a gaseous phase. We have succeeded in low- temperature (55゜C) fabrication of ZnO micropatterns, which show patterned cathodoluminescence images. A photo-patterned, self-assembled monolayer (SAM) with phenyl/OH-surface functional groups was used as the template. The selective, electroless deposition of ZnO was achieved on a Pd catalyst that had been adhered to the phenyl-surfaces only. The micropattern of hydroxyapatite has also been successfully fabricated by the use of site-selective adhesion of the charged hydroxyapatite microparticles (negative) homogeneously formed in a supersaturated solution onto the charged surfaces modified with self-assembled monolayers (positive : NH2-SAM ; negative :OH-SAM). After a further growth of microparticles a dense of hydroxyapatite thin film was formed only on the positive NH_2-SAM.