Development of Novel Materials Assembling Method Based on Nano-space Chemical Reactions

We have succeeded in fabricating micropatterned TiO D22 films on self-assembled monolayers （SAM） of phenyltrichlorosilane （PTCS） through the precipitation from an aqueous solution containing TiF D26 D12-D1ions。PTCS单体是第一种在硅水和紫外线上被辐射到一个带有两个维度交替的羟基/羟基表面的隐蔽单体上的SAM。This patterned substrate was immersed in an aqueous solution to directly deposit TiO D22（anatase）。Sonication treatment after the deposition resulted in a micropatterned TiO D22 thin film.We also succeeded in fabricating micropatterns of titanium dioxide thin films on SAMs。OTS的SAMs（octadecyltrichloro-silane）是在硅晶圆上形成的，并通过紫外线辐射进行了修改，使用光掩膜来生成甲基/硅醇图案。They were used as templates to deposit titanium dioxide thin films by the use of TDD （titanium dichloride diethoxide）。带有近似组合物的非对称电影Ti ： O ： Cl ： C = 1 ： 2.2 ： 0.17 ： 0.37选择存放在硅醇区域。一部被存放的电影模式的线宽度变化已改进，以改善电子设计规则以下的5%。在SAMs开发的两个维度上安排精细硅芯片的新颖工艺。SiO-D22 sphere surfaces were modified to have CN groups by the use of trichlorocyanoethysilane， and CN groups were oxidized to COOH groups with t-BuOK。A SAM of PTCS with a phenyl/silanol-group pattern was used as a template to arrange fine SiO-D22-D2 spheres。SiO D22 spheres were selectively attached to silanol surfaces possibly forming ester bonds， which enabled the fabrication of micropatterned arrangement of SiO D22 spheres。

We have succeeded in fabricating micropatterned TiOィイD22ィエD2 films on self-assembled monolayers (SAM) of phenyltrichlorosilane (PTCS) through the precipitation from an aqueous solution containing TiFィイD26ィエD2ィイD12-ィエD1 ions. A PTCS monolayers was first formed on a silicon water and UV light was irradiated onto the masked monolayer to obtain the SAM with two-dimensionally patterned hydrophilic/hydrophobic surfaces. This patterned substrate was immersed in an aqueous solution to directly deposit TiOィイD22ィエD2 (anatase). Sonication treatment after the deposition resulted in a micropatterned TiOィイD22ィエD2 thin film.We also succeeded in fabricating micropatterns of titanium dioxide thin films on SAMs. SAMs of OTS (octadecyltrichloro-silane) were formed on Si wafers, and were modified by UV irradiation using a photomask to generate methyl/silanol-pattern. They were used as templates to deposit titanium dioxide thin films by the use of TDD (titanium dichloride diethoxide). Amorphous films with approximate compositions Ti : O : Cl : C = 1 : 2.2 : 0.17 : 0.37 were selectively deposited on silanol regions. Line width variation of the pattern of an as-deposited film was improved to be well below the electronics design rule, 5%.Novel processes to arrange fine silica spheres two-dimensionally on SAMs were developed. SiOィイD22ィエD2 sphere surfaces were modified to have CN groups by the use of trichlorocyanoethysilane, and CN groups were oxidized to COOH groups with t-BuOK. A SAM of PTCS with a phenyl/silanol-group pattern was used as a template to arrange fine SiOィイD22ィエD2 spheres. SiOィイD22ィエD2 spheres were selectively attached to silanol surfaces possibly forming ester bonds, which enabled the fabrication of micropatterned arrangement of SiOィイD22ィエD2 spheres.