Development of Novel Materials Assembling Method Based on Nano-space Chemical Reactions

我们succeeded in fabricating micropatterned TiO D22 D2 films on self-assembled monolayers（SAM） of phenyltrichlorosilane (PTCS) through the precipitation from an aqueous solution containingTiF - D26 - D2 - D12- D1 ions. A PTCS monolayers was first formed on A silicon water and UV light wasirradiated onto the masked monolayer to obtain the SAM with two-dimensionally patternedhydrophilic/hydrophobic surfaces. This patterned substrate was immersed in an aqueous solution todirectly deposit TiO D22 - D2 (anatase). Sonication treatment after the deposition resulted in amicropatterned TiO - D22 - D2 thin film.We also succeeded in fabricating micropatterns of titaniumdioxide thin films on SAMs. SAMs of OTS (octadecyltrichloro-silane) formed on Si wafers，and were modified by UV irradiation using a photomask to generate methyl/silano -pattern. They wereused as templates to deposit titanium dioxide thin films by the use of TDD (titanium dichloridediethoxide). Amorphous films with approximate compositions Ti: O: Cl: C = 1:2.2: 0.17：0.37 were selectively deposited on silanol区域. Line width variation of the pattern of anas-deposited film was improved to be below the electronics design rule5%.Novel processes to arrange fine silica spheres two-dimensionally on SAMs were developed.22ィエsioィイd d 2 sphere surfaces were modified to have cn groups by the use of trichlorocyanoethysilane,CN groups oxidized to COOH groups with t-BuOK. A SAM of PTCS with A phenyl/silanol-grouppattern used as a template to arrange fine SiO - D22 - D2 spheres. SiO - D22 - D2 spheres wereselectively attached to silanol surfaces possibly forming ester bondswhich enabled the fabrication of micropatterned arrangement of SiO D22 D2 spheres。

We have succeeded in fabricating micropatterned TiOィイD22ィエD2 films on self-assembled monolayers (SAM) of phenyltrichlorosilane (PTCS) through the precipitation from an aqueous solution containing TiFィイD26ィエD2ィイD12-ィエD1 ions. A PTCS monolayers was first formed on a silicon water and UV light was irradiated onto the masked monolayer to obtain the SAM with two-dimensionally patterned hydrophilic/hydrophobic surfaces. This patterned substrate was immersed in an aqueous solution to directly deposit TiOィイD22ィエD2 (anatase). Sonication treatment after the deposition resulted in a micropatterned TiOィイD22ィエD2 thin film.We also succeeded in fabricating micropatterns of titanium dioxide thin films on SAMs. SAMs of OTS (octadecyltrichloro-silane) were formed on Si wafers, and were modified by UV irradiation using a photomask to generate methyl/silanol-pattern. They were used as templates to deposit titanium dioxide thin films by the use of TDD (titanium dichloride diethoxide). Amorphous films with approximate compositions Ti : O : Cl : C = 1 : 2.2 : 0.17 : 0.37 were selectively deposited on silanol regions. Line width variation of the pattern of an as-deposited film was improved to be well below the electronics design rule, 5%.Novel processes to arrange fine silica spheres two-dimensionally on SAMs were developed. SiOィイD22ィエD2 sphere surfaces were modified to have CN groups by the use of trichlorocyanoethysilane, and CN groups were oxidized to COOH groups with t-BuOK. A SAM of PTCS with a phenyl/silanol-group pattern was used as a template to arrange fine SiOィイD22ィエD2 spheres. SiOィイD22ィエD2 spheres were selectively attached to silanol surfaces possibly forming ester bonds, which enabled the fabrication of micropatterned arrangement of SiOィイD22ィエD2 spheres.