LOW TEMPERATURE OF PLASMA TREATMENT FOR STERILIZATION
LOW TEMPERATURE OF PLASMA TREATMENT FOR STERILIZATION
批准号:
12557159
负责人:
TAMAZAWA Kaoru
金额:
$6.34万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001
中文摘要
这项研究的目的是在一个高频率的等离子体国家快速退化和去除气体大气中的有机体。1)光子学家被应用于晶圆片,而等离子体治疗被用氧气进行性能。《抵抗者的电影厚度》是用电影厚度量表来衡量的。电影的厚度更有市场意义地解释用于垂直放置在石英机架中的芯片比那些水平放置的芯片,在一个更高的输出,并使用相反的电极而不是同轴电极作为一种释放方法。2)光谱用于任何细菌孢子应用于由等离子体处理的电极方法和三聚氰胺培养基中的培养。使用更长的治疗时间、更高的产出和更高的温度来表现出明显的症状。所有10种经等离子体处理的物质(温度, 60-C)至10^4 B。Stearothemophilus被认为是一种对文化的负面影响。所有非等离子体处理的物质(加热温度, 60 ° C、100 ° C和140 ° C)对文化都有积极作用。(3)氢过氧化物/低温度等离子体类固醇系统的机制(ST系统: STERRAD* 100 R,强生公司)已被评估。一个生物指标(BI, Johnson & Johnson)和一个电源被放置在房间里。电源供应在治疗完成时间指示器跳过等离子体治疗过程前25分钟被临时终止。所有10种文化BI制剂都是阴性的。这些结果建议说,在等离子体治疗过程之前,类固醇化主要取决于等离子体,但对ST系统中氢过氧化物的药物影响,我们的设备只允许类固醇化,而等离子体没有药物影响。
英文摘要
The purpose of this study was to rapidly degrade and remove organisms in a gas atmosphere in a high frequency plasma state.1) Photoresist was applied to wafers, and plasma treatment was performed with oxygen gas. The film thickness of the resist was measured using a film thickness scale. The film thickness more markedly decreased for wafers vertically placed in the quartz rack than for those horizontally placed, at a higher output, and using opposed electrodes than coaxial electrodes as a discharge method.2 ) Specimens to which bacterial spores were applied were plasma-treated by the opposed electrode method and cultured in Triptocase medium. The sporicidal effects were more marked using a longer treatment time, higher output , and a higher heater temperature. All 10 plasma-treated specimens for ten min (heater temperature, 60ーC) to which 10^4 B. Stearothemophilus was applied were negative for culture. All non-plasma-treated specimens (heater temperature, 60℃, 100℃, and 140℃) were positive for culture.3 ) The mechanism of hydrogen peroxide/low temperature plasma sterilization system (ST system : STERRAD*100R, Johnson & Johnson) was evaluated. A biological indicator (BI, Johnson & Johnson) and a power source were placed in the chamber. The power supply was deliberately terminated 25 minutes before the treatment completion time indicated by the display panel to skip the plasma treatment process. All 10 cultured BI specimens were negative. These results suggest that sterilization has been already completed before the plasma treatment process , and sterilization primarily depends not on plasma but on the pharmaceutical effects of hydrogen peroxide in the ST system.Our apparatus allows sterilization only with plasma without the pharmaceutical effects of hydrogen peroxide.
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玉澤 かほる: "過酸化水素・低温プラズマ滅菌装置における滅菌機序に関する検討"日本医科器械学雑誌. 71・6. 44 (2001)
Kahoru Tamazawa:“过氧化氢/低温等离子体灭菌器的灭菌机理研究”日本医疗器械杂志 71, 6. 44 (2001)。
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通讯作者:
玉澤かほる, 那谷由美, 玉澤佳純, 米田栄吉, 島内英俊: "過酸素水素・低温プラズマ滅菌装置における滅菌機序に関する検討"日本医科器械学雑誌. 71. 527-528 (2001)
Kahoru Tamazawa、Yumi Natani、Kasumi Tamazawa、Eikichi Yoneda、Hidetoshi Shimauchi:“过氧氢/低温等离子体灭菌器的灭菌机理研究”日本医疗器械杂志 71. 527-528 (2001)。
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TAMAZAWA K, NATA Y, TAMAZAWA Y, MAITA E and SHIMAUCHI H: "A Study on low temperature plasma sterilization system (STERRAD*100R)"The Japanese Journal of Medical Instrumentation. 71(10). 527-528 (2001)
TAMAZAWA K、NATA Y、TAMAZAWA Y、MAITA E 和 SHIMAUCHI H:“低温等离子体灭菌系统 (STERRAD*100R) 的研究”《日本医疗器械杂志》。
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通讯作者:
玉澤かほる: "過酸素水素・低温プラズマ滅菌装置における滅菌機序に関する検討"日本医科器械学雑誌. 71. 44-44 (2001)
Kahoru Tamazawa:“过氧氢/低温等离子体灭菌器的灭菌机理研究”日本医疗器械杂志71. 44-44 (2001)。
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作者:
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通讯作者:
TAMAZAWA K: "A study on low temperature plasma sterilization system (STERRAD*100R)"The Japanese Journal of Medical Instrumentation. 71(6). 44 (2001)
玉泽 K:“低温等离子体灭菌系统(STERRAD*100R)的研究”《日本医疗器械杂志》。
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共 7 条
Development of safe and clean low-temperature sterilization usingwater vapor plasma
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批准号:22390356
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.07万
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财政年份:2010
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负责人:TAMAZAWA Kaoru
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依托单位:
RELTION BETWEEN PERIODONTAL STATUS AND CARDIOVASCULAR RISK FACTORS
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批准号:13671995
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.56万
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财政年份:2001
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负责人:TAMAZAWA Kaoru
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依托单位:
THE EFFECT OF THE STERILIZATION OF THE AIR-TURBINE HANDPIECES
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批准号:07672067
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.34万
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财政年份:1995
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负责人:TAMAZAWA Kaoru
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依托单位:
海外基金