权益分类	功能权益	普通用户	{{item.name}}会员
{{category.name}}	{{benefitItem.name}}

LOW TEMPERATURE OF PLASMA TREATMENT FOR STERILIZATION

低温等离子体处理灭菌

基本信息

批准号：
12557159
负责人：
TAMAZAWA Kaoru
金额：
$ 6.34万
依托单位：
TOHOKU UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2000
资助国家：
日本
起止时间：
2000 至 2001
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-12557159/
关键词：
plasma sterilization oxygen gas ash effect hydrogen oxide STERRAD

项目摘要

The purpose of this study was to rapidly degrade and remove organisms in a gas atmosphere in a high frequency plasma state.1) Photoresist was applied to wafers, and plasma treatment was performed with oxygen gas. The film thickness of the resist was measured using a film thickness scale. The film thickness more markedly decreased for wafers vertically placed in the quartz rack than for those horizontally placed, at a higher output, and using opposed electrodes than coaxial electrodes as a discharge method.2 ) Specimens to which bacterial spores were applied were plasma-treated by the opposed electrode method and cultured in Triptocase medium. The sporicidal effects were more marked using a longer treatment time, higher output , and a higher heater temperature. All 10 plasma-treated specimens for ten min (heater temperature, 60ーC) to which 10^4 B. Stearothemophilus was applied were negative for culture. All non-plasma-treated specimens (heater temperature, 60℃, 100℃, and 140℃) were positive for culture.3 ) The mechanism of hydrogen peroxide/low temperature plasma sterilization system (ST system : STERRAD*100R, Johnson ＆ Johnson) was evaluated. A biological indicator (BI, Johnson ＆ Johnson) and a power source were placed in the chamber. The power supply was deliberately terminated 25 minutes before the treatment completion time indicated by the display panel to skip the plasma treatment process. All 10 cultured BI specimens were negative. These results suggest that sterilization has been already completed before the plasma treatment process , and sterilization primarily depends not on plasma but on the pharmaceutical effects of hydrogen peroxide in the ST system.Our apparatus allows sterilization only with plasma without the pharmaceutical effects of hydrogen peroxide.

本研究的目的是在高频等离子体状态下的气体气氛中快速降解和去除有机物。1）将光刻胶施加到晶片上，并使用氧气进行等离子体处理。抗蚀剂的膜厚使用膜厚标尺来测定。垂直放置在石英架上的晶片比水平放置的晶片的膜厚度更显著地减小，在较高的输出下，并且使用相对电极而不是同轴电极作为放电方法。2）施加细菌孢子的样品通过相对电极方法进行等离子体处理，并在Triptocase培养基中培养。处理时间越长、产量越高、加热器温度越高，杀孢子效果越显著。所有10个等离子体处理试样10分钟（加热器温度，60 ℃），其中10^4 B。应用嗜硬脂酸杆菌培养阴性。所有未经等离子体处理的标本（加热器温度、60℃、100℃和140℃）培养均为阳性。3）评价过氧化氢/低温等离子体灭菌系统（ST系统：STERRAD* 100 R，约翰逊&约翰逊）的机理。将生物指示剂（BI，约翰逊和约翰逊）和电源置于室内。故意在显示面板指示的处理完成时间之前25分钟终止电源，以跳过等离子体处理过程。所有10份培养的BI标本均为阴性。这些结果表明，在等离子体处理过程之前，灭菌已经完成，灭菌主要不依赖于等离子体，而是依赖于ST系统中过氧化氢的药物作用。我们的设备允许仅使用等离子体进行灭菌，而不具有过氧化氢的药物作用。