Development of high energy-resolution soft-X-ray emission spectroscopy microscope
高能量分辨率软X射线发射光谱显微镜的研制
基本信息
- 批准号:13554010
- 负责人:
- 金额:$ 8.58万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (B)
- 财政年份:2001
- 资助国家:日本
- 起止时间:2001 至 2003
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
A new grating for a grazing incidence flat-field spectrograph was designed from 400eV to 1200eV with a groove density of 2400 lines/mm. The grating has a two times larger energy dispersion than that of a commercial grating. A new spectrometer chamber was designed to used not only for the new grating but also for commercial gratings. As energy region of 60-1200 eV is accessible by using the new and commercial gratings.X-ray reflection mirrors were designed to improve X-ray intensity to go into the grating. The mirrors have elliptical curvatures. The material for the mirrors was tungsten of about 100 nm thickness, which was formed on a cleaved natural mica crystal. The length and the width of the mirror were 135 mm and about 10 mm, respectively. Two mirrors were put between the grating and the specimen. Spectral intensity was improved by four times compared with those obtained without the mirror. The effective collection angle 2.8x10^<-3>sr.The developed soft-X-ray spectrometer attached to a transmission electron microscope (TEM) of JEM-2000FX. Energy dispersions per CCD detector channel (13.5 μm) of this spectrometer are about 0.1eV for Si L-emission (〜100eV), 0.2eV for B K-emission (〜180eV) and 0.7eV for Cu L-emission (〜930 eV). Cu L-emission spectra were obtained with a probe current of 10 nA at an acquisition time of 20 min. A VLS grating with line density of 24001/mm was used. The spectra clearly showed four L-emission peaks of L_α(M_y(3d)→L_<III>(2p)), L_β(M_<IV>(3d)→L_<II>(2p)), L_1(M_I(3s)→L_<III>(2p)) and Lη(M_I(3s)→L_<II>(2p)).The density of states of boron nano-belts and bundles of carbon nanotubes were obtained by using the X-ray emission spectroscopy microscope.
设计了一种适用于400 ~ 1200 eV的掠入射平场光谱仪的新型光栅,其槽密度为2400线/mm,能量色散比普通光栅大一倍。设计了一种既可用于新型光栅又可用于商用光栅的新型光谱仪腔。由于新型光栅和商用光栅的能量范围在60-1200 eV之间,因此设计了X射线反射镜以提高进入光栅的X射线强度。镜子有椭圆形的曲率。用于反射镜的材料是约100 nm厚的钨,其形成在裂开的天然云母晶体上。反射镜的长度和宽度分别为135 mm和约10 mm。在光栅和样品之间放置两个反射镜。与没有反射镜的情况相比,光谱强度提高了四倍。有效收集角为2.8 × 10 ~(10)Sr<-3>。研制的软X射线能谱仪与JEM-2000 FX透射电子显微镜(TEM)相连。该谱仪每个CCD探测器通道(13.5 μm)的能量色散分别为:Si的L发射(~ 100 eV)0.1eV,B的K发射(~ 180 eV)0.2eV,Cu的L发射(~ 930 eV)0.7eV。铜L-发射光谱,获得了10 nA的探测电流在20分钟的采集时间。使用线密度为24001/mm的VLS光栅。光谱清晰地显示出L_α(M_y(3d)→L_<III>(2 p))、L_β(M_<IV>(3d)→L_<II>(2 p))、L_1(M_I(3s)→L_<III>(2 p))和L_η(M_I(3s)→L_<II>(2 p))四个L发射峰。
项目成果
期刊论文数量(62)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
M.Tanaka: "Convergent-Beam Electron Diffraction IV"JEOL-Maruzen, Tokyo. 352 (2002)
M.Tanaka:“会聚束电子衍射 IV”JEOL-Maruzen,东京。
- DOI:
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- 影响因子:0
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- 通讯作者:
A.Ohtake: "Strain-induced surface segregation in In0.5Ga0.5As/GaAs heteroepitaxy"Applied Physics Letters. 80・21. 3931-3933 (2002)
A.Ohtake:“In0.5Ga0.5As/GaAs异质外延中的应变引起的表面偏析”应用物理快报80・21 3931-3933(2002)。
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- 影响因子:0
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M.Terauchi: "Detection of characteristic signals from As doped (less than 1 at.%) regions of silicon by transmission electron microscopy and convergent-beam election diffraction"Journal of Electron Microscopy. vol.52(5). 441-448 (2003)
M.Terauchi:%20"检测%20of%20characteristic%20signals%20from%20As%20ulated%20(少于%20%201%20at.%)%20regions%20of%20silicon%20by%20transmission%20电子%20microscopy%20and%
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S.-K.Hong: "Control of crystal polarity in a wurtzite crystal : Zn0 films grown by plasma-assisted molecular-beam epitaxy on GaN"Phys. Rev. B. 65. 115331-1-115331-10 (2002)
S.-K.Hong:“纤锌矿晶体中晶体极性的控制:通过等离子体辅助分子束外延在 GaN 上生长的 Zn0 薄膜”Phys。
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- 影响因子:0
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M.Terauchi: "A sub-eV resolution soft-X-ray spectrometer for a transmission electron microscope to obtain the density of states of the valence band"Microscopy & Microanalysis. 7・suppl.2. 228-229 (2001)
M. Terauchi:“用于透射电子显微镜获得价带态密度的亚 eV 分辨率软 X 射线光谱仪”Microscopy & Microanalysis 7·suppl.2 (2001)。
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TERAUCHI Masami其他文献
TERAUCHI Masami的其他文献
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{{ truncateString('TERAUCHI Masami', 18)}}的其他基金
Development of nm-scale soft-X-ray spectroscopy electron microscope and its application to BN materials
纳米级软X射线能谱电子显微镜的研制及其在BN材料中的应用
- 批准号:
12440079 - 财政年份:2000
- 资助金额:
$ 8.58万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
High energy-resolution EELS study of the electronic structure of nanotubes
纳米管电子结构的高能量分辨率 EELS 研究
- 批准号:
10640295 - 财政年份:1998
- 资助金额:
$ 8.58万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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