Atomic Layer Deposition System

原子层沉积系统

• 批准号: 471301649
• 金额: --
• 依托单位: Technische Universität Dortmund
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2022
• 资助国家: 德国
• 起止时间: 2021-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/471301649?language=en
• 关键词: Atomic; Layer; Deposition; System

This proposal requests funding for purchasing an atomic layer deposition (ALD) system that is capable to handle substrates with a diameter of up to 200 mm. The ALD system will be used to deposit functional (e.g. multiferroic or memristive) oxides and nitrides, and catalytically active metals. These materials will be integral parts in novel electronic devices and circuits for application in information technology, photonics, micro-fluidics, and micro- and nanotechnology. ALD is the only technology that provides the specific deposition properties (including precise control of thickness and stoichiometry, conformal deposition, and low deposition temperature and energy) required to perform the planned cutting-edge research projects. The system will be operated by users based in the physics, electrical engineering and information technology, and bio-chemical engineering faculties. The ALD will thus take a key role in innovative research projects across faculties, and will lay the foundation for future interdisciplinary synergies.

该提案要求为购买原子层沉积(ALD)系统提供资金，该系统能够处理直径达200毫米的衬底。ALD系统将用于沉积功能性(如多铁性或记忆性)氧化物和氮化物以及催化活性金属。这些材料将成为用于信息技术、光子学、微流体以及微和纳米技术的新型电子设备和电路的组成部分。ALD是唯一一种提供执行计划中的尖端研究项目所需的特定沉积特性(包括精确控制厚度和化学计量比、保形沉积以及低沉积温度和能量)的技术。该系统将由物理、电气工程和信息技术以及生物化学工程系的用户操作。因此，ALD将在各系的创新研究项目中发挥关键作用，并将为未来的跨学科协同效应奠定基础。