Atomic Layer Deposition System

该提案要求提供资金，用于购买原子层沉积（ALD）系统，该系统能够处理直径高达200 mm的衬底。ALD系统将用于存款功能（例如多铁性或忆阻性）氧化物和氮化物以及催化活性金属。这些材料将成为新型电子器件和电路的组成部分，用于信息技术，光子学，微流体学以及微和纳米技术。ALD是唯一一种提供特定沉积特性（包括精确控制厚度和化学计量、保形沉积以及低沉积温度和能量）的技术，可用于执行计划中的尖端研究项目。该系统将由物理、电气工程和信息技术以及生物化学工程学院的用户操作。因此，ALD将在各学院的创新研究项目中发挥关键作用，并为未来的跨学科协同作用奠定基础。

This proposal requests funding for purchasing an atomic layer deposition (ALD) system that is capable to handle substrates with a diameter of up to 200 mm. The ALD system will be used to deposit functional (e.g. multiferroic or memristive) oxides and nitrides, and catalytically active metals. These materials will be integral parts in novel electronic devices and circuits for application in information technology, photonics, micro-fluidics, and micro- and nanotechnology. ALD is the only technology that provides the specific deposition properties (including precise control of thickness and stoichiometry, conformal deposition, and low deposition temperature and energy) required to perform the planned cutting-edge research projects. The system will be operated by users based in the physics, electrical engineering and information technology, and bio-chemical engineering faculties. The ALD will thus take a key role in innovative research projects across faculties, and will lay the foundation for future interdisciplinary synergies.