Kinetics and spectroscopy of fluorine-silicon compounds

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This project studies the thermal dissociation of simple silicon-fluorine compounds by employing the shock wave method. Theoretical modeling accompanies the experiments. The considered reactions are of relevance for practical applications such as plasma-etching in microelectronics or thin-film deposition of silicon. In spite of this, kinetic and spectroscopic data are known only to a limited extent. First experiments in this project showed evidence for unusual autocatalytic mechanisms which may also play some role in fluorocarbon chemistry.