Production of high-density microplasma by microwave excitation and its application to ultra-short-wavelength light
微波激发制备高密度微等离子体及其在超短波长光中的应用
基本信息
- 批准号:15075205
- 负责人:
- 金额:$ 23.62万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research on Priority Areas
- 财政年份:2003
- 资助国家:日本
- 起止时间:2003 至 2007
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Research was carried out to inject microwave power into small space and thereby to produce a high-density microplasma continuously, aiming at applying the plasma to a high-brightness ultra-short-wavelength light source. The effect of microwave frequency on the plasma production was also studied. Two types of plasmas were studied: one is "microgap plasma" produced around atmospheric pressure in the microgap (100 μm wide) between two knife-edge electrodes and the other is "micro ECR plasma" produced at low pressures (〜1 Pa) in a microwave stripline with the aid of magnetic field. To study the fundamental properties of plasmas produced, a laser Thomson scattering technique for measuring electron temperature and density in small space was developed. For Ar microgap plasma, a plasma with an electron temperature of 1.2 eV and a high density of 3x10^<14>cm^<-3> was realized with a gas temperature as low as near room temperature. The density of metastable Ar atoms, which are the precursor of VUV light emitting Ar_2 excimer, was measure using laser absorption spectroscopy and the effect of plasma conditions on the Ar_2 excimer formation was clarified; this gives a guide into optimization of the plasma as a VUV excimer light source. Experiments on producing microgap plasma using 10-GHz microwave excitation indicated that reducing the microwave radiation loss is crucial for increasing the electron density, though increasing electron density is expected on the theoretical basis. For micro ECR plasma, 10-GHz excitation showed better plasma localization characteristics, and most measurements were carried out using 10-GHz excitation. Strong Ar^+ emission as well as He^+ emission was observed, indicating the existence of high-energy electrons in the plasma. To increase the plasma density and thereby to obtain variety of short-wavelength emissions from multiply ionized species, improvement of microwave power injection scheme is necessary and is in progress.
为了将等离子体应用于高亮度超短波长光源,进行了将微波功率注入小空间从而连续产生高密度微等离子体的研究。研究了微波频率对等离子体产生的影响。研究了两种类型的等离子体:一种是在大气压下在两个刀口电极之间的微间隙(100 μm宽)中产生的“微间隙等离子体”,另一种是在磁场辅助下在微波带状线中在低气压(~ 1 Pa)下产生的“微ECR等离子体”。为了研究等离子体的基本性质,发展了一种测量小空间电子温度和密度的激光汤姆逊散射技术。对于Ar微间隙等离子体,在气体温度低至接近室温的情况下,实现了具有1.2eV的电子温度和3 X 10 ^ cm 2的高密度的等离子体<14><-3>。本文用激光吸收光谱法测量了真空紫外发光准分子Ar_2的前体亚稳态Ar原子的密度,阐明了等离子体条件对Ar_2准分子形成的影响,为优化等离子体作为真空紫外准分子光源提供了指导。利用10 GHz微波激发产生微间隙等离子体的实验表明,尽管理论上期望提高电子密度,但降低微波辐射损耗是提高电子密度的关键。对于微型ECR等离子体,10-GHz的激励表现出更好的等离子体局域化特性,大多数测量进行了使用10-GHz的激励。观察到了强的Ar^+发射和He^+发射,表明等离子体中存在高能电子。为了提高等离子体密度,从而获得各种短波长的发射从多重电离物种,微波功率注入方案的改进是必要的,并正在进行中。
项目成果
期刊论文数量(125)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Is it possible for steady state convection to exist in the absence of volume force?
在没有体积力的情况下是否可能存在稳态对流?
- DOI:
- 发表时间:2006
- 期刊:
- 影响因子:0
- 作者:A. Kono
- 通讯作者:A. Kono
Excimer emission characteristics in high-pressure microgap Discharge excited by microwave
高压微间隙准分子发射特性 微波激发放电
- DOI:
- 发表时间:2005
- 期刊:
- 影响因子:0
- 作者:J.Wang;M.Aramaki;A.Kono
- 通讯作者:A.Kono
高密度マイクロプラズマの連続生成とその真空紫外光源への応用
高密度微等离子体的连续产生及其在真空紫外光源中的应用
- DOI:
- 发表时间:2004
- 期刊:
- 影响因子:0
- 作者:NAKATANI;Hiroyasu;T. Sakurai;平田孝道;K. Tachibana;河野明廣
- 通讯作者:河野明廣
Production of 10 GHz micro ECR plasma and its diagnostics
10 GHz 微型 ECR 等离子体的生产及其诊断
- DOI:
- 发表时间:2008
- 期刊:
- 影响因子:0
- 作者:Y. Kawamura;T. Kuroki;M. Aramaki;A. Kono
- 通讯作者:A. Kono
Production of 1OGHz micro ECR plasma and its diagnosis
1OGHz微ECR等离子体的产生及其诊断
- DOI:
- 发表时间:2008
- 期刊:
- 影响因子:0
- 作者:Mikio Uruichi;Kyuya Yakushi;Tomoyuki Mochida;Y. Kawamura
- 通讯作者:Y. Kawamura
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KONO Akihiro其他文献
KONO Akihiro的其他文献
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{{ truncateString('KONO Akihiro', 18)}}的其他基金
Study of reliability in laser Thomson scatturing diagnostics oflow-temperature plasmas
低温等离子体激光汤姆逊散射诊断的可靠性研究
- 批准号:
18540491 - 财政年份:2006
- 资助金额:
$ 23.62万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Study of negative-ion kinetics in processing plasmas
等离子体处理中的负离子动力学研究
- 批准号:
05452187 - 财政年份:1993
- 资助金额:
$ 23.62万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
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