Dynamic and high precision sensor and tool positioning in large measuring volume with the aid of an inverse measurement concept - transfer project

测量对象越来越大，同时对分辨率和精度的要求也越来越高，这是当前纳米测量技术面临的挑战。全球趋势是在纳米范围内提高精度，在几百毫米的更大的测量和加工范围内测量更复杂的结构，这是毋庸置疑的。主要驱动力当然是纳米光刻技术，其市场潜力几乎难以想象。满足这些技术发展要求的纳米测量机的概念可以在DFG标准程序“使用逆测量概念在大测量体积中动态和高度精确的传感器定位”的框架内制定。为构建大体积纳米定位和纳米测量系统奠定了科学基础。将测量对象的大质量和参考面镜按照逆概念固定在测量机上，采用可移动、光纤耦合、紧凑的干涉式传感器头实现三维精密测量。这最大限度地减少了移动质量，并实现了高测量动态。实现纳米测量机器的反向方法从根本上说是新的，一方面，更高精度范围的渗透，另一方面，实现具有非常大范围运动的机器。通过六自由度的干涉测量，实现了最小的阿贝误差。通过另外六个干涉仪轴，参考镜的表面形貌可以准永久地确定，机器本身具有纳米精度。这种方法的最大优点是可以及时检测到镜面形貌的任何变化，从而可以不断更新校正矩阵。基于在dfg项目中获得的知识，现在将与应用合作伙伴SIOS Meßtechnik GmbH一起在转让项目的框架内开发基于逆概念的测量机原型。尽管测量对象和运动范围很大，但为了在可接受的范围内实现测量时间，开发的重点不仅在于可实现的精度，还在于定位的高动态。此外，需要证明的是，逆概念可以以一种明显更紧凑的方式实现，具有更大的长期稳定性，提供更好的测量不确定性，尽管有大量的12个激光轴（和主从配置的两个氦氖激光器），可以比根据经典的移动阶段原理制造测量机更经济。最后一步是测量机的计量鉴定，其核心是对定位可实现精度的验证。

Increasingly large measurement objects and at the same time increasing demands on resolution and precision represent a current challenge in nanomeasurement technology. The global trend towards increasing precision in the nanometre range, greater complexity of structures to be measured in ever larger measuring and processing ranges of several hundred millimetres is unmistakable. The main driver is certainly nanolithography with an almost unimaginable market potential. The concept for a nanomeasuring machine that meets the requirements of these technological developments could be worked out within the framework of the DFG standard procedure "Dynamic and highly accurate sensor positioning in large measuring volumes using an inverse measuring concept". Furthermore, the scientific basics for the construction of such a large-volume nanopositioning and nanomeasuring system have been created. The large and heavy masses of the measuring object and the reference surface mirror are fixed in measuring machines according to the inverse concept, and a movable, fibre-optic-coupled, compact, interferometric sensor head realises the 3-dimensional precision measurement. This minimises the moving mass and enables high measurement dynamics. The inverse approach for the implementation of nanomeasuring machines is fundamentally new and opens up, on the one hand, the penetration of higher accuracy ranges and, on the other hand, the realisation of machines with very large ranges of motion. Through the interferometric measurement of six degrees of freedom, a minimal Abbe error is achieved. With a further six interferometer axes, the surface topography of the reference mirrors can be determined quasi-permanently, with nanometre precision in the machine itself. The great advantage of this approach is that any changes in the topography of the mirrors can be detected promptly and thus the correction matrices can be constantly updated. Based on the knowledge gained in the underlying DFG-project a prototype of a measuring machine based on the inverse concept is now to be developed within the framework of the transfer project together with the application partner SIOS Meßtechnik GmbH. In order to realise measuring times within an acceptable range despite large measuring objects and ranges of motion, the focus of the development is not only on the achievable precision but also on a high dynamic of the positioning. Furthermore, it is to be proven that the inverse concept can be realised in a significantly more compact manner, with greater long-term stability, provides better measurement uncertainty and, despite the large number of 12 laser axes (and two HeNe lasers in a master-slave configuration), can be manufactured significantly more economically than measuring machines according to the classic moving-stage principle. The final step is the metrological qualification of the measuring machine, the core of which is the verification of the achievable precision of the positioning.