Low-temperature plasma processes for high-quality graphene films

该项目旨在开发新型等离子体工艺，用于低成本，节能和可扩展的高质量石墨烯薄膜生长，用于触摸屏，太阳能电池和其他设备。它旨在发现非平衡等离子体-表面相互作用，使石墨烯薄膜在低温下在金属催化剂上具有大而低缺陷域的成核和生长，然后开发节能，环保和可扩展的制造和器件转移工艺。这些工艺旨在扩大规模后保持高质量的石墨烯薄膜，并将与触摸屏和其他设备中现有和新兴的应用兼容。预期的成果包括基本的理解和新的实用方法来控制二维原子薄材料的合成和器件集成。

The project aims to develop novel plasma-enabled processes for low-cost, energy-efficient, and scalable growth of high-quality graphene films for applications in touch screen, solar cell and other devices. It aims to discover non-equilibrium plasma-surface interactions enabling nucleation and growth of graphene films with large and low-defect domains on metal catalysts at low temperatures, and then develop energy-efficient, environment-friendly, and scalable fabrication and device transfer processes. These processes are designed to retain high quality of graphene films upon scale-up and will be compatible with the existing and emerging applications in touch screens and other devices. The expected outcomes include fundamental understanding and novel practical approaches to control synthesis and device integration of two-dimensional atomically-thin materials.