Low-temperature plasma processes for high-quality graphene films

高品质石墨烯薄膜的低温等离子体工艺

• 批准号: DP160103116
• 负责人: Prof Kostya (Ken) Ostrikov
• 金额: $ 30.11万
• 依托单位: Queensland University of Technology
• 依托单位国家: 澳大利亚
• 项目类别: Discovery Projects
• 财政年份: 2016
• 资助国家: 澳大利亚
• 起止时间: 2016-05-01 至 2020-06-30
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/DP160103116
• 关键词: Low; temperature; plasma; processes; quality

The project aims to develop novel plasma-enabled processes for low-cost, energy-efficient, and scalable growth of high-quality graphene films for applications in touch screen, solar cell and other devices. It aims to discover non-equilibrium plasma-surface interactions enabling nucleation and growth of graphene films with large and low-defect domains on metal catalysts at low temperatures, and then develop energy-efficient, environment-friendly, and scalable fabrication and device transfer processes. These processes are designed to retain high quality of graphene films upon scale-up and will be compatible with the existing and emerging applications in touch screens and other devices. The expected outcomes include fundamental understanding and novel practical approaches to control synthesis and device integration of two-dimensional atomically-thin materials.

该项目旨在开发新型等离子体工艺，以低成本、高能效和可扩展的方式生长高质量石墨烯薄膜，用于触摸屏、太阳能电池和其他设备。它的目的是发现非平衡等离子体表面相互作用，使石墨烯薄膜在低温下在金属催化剂上成核和生长，具有大的、低缺陷的域，然后开发节能、环境友好、可扩展的制造和器件转移工艺。这些工艺旨在在放大时保持石墨烯薄膜的高质量，并将与触摸屏和其他设备中现有和新兴的应用兼容。预期成果包括对二维原子薄材料的控制合成和设备集成的基本理解和新颖的实用方法。